AU2003208427A8 - Indirectly heated button cathode for an ion source - Google Patents
Indirectly heated button cathode for an ion sourceInfo
- Publication number
- AU2003208427A8 AU2003208427A8 AU2003208427A AU2003208427A AU2003208427A8 AU 2003208427 A8 AU2003208427 A8 AU 2003208427A8 AU 2003208427 A AU2003208427 A AU 2003208427A AU 2003208427 A AU2003208427 A AU 2003208427A AU 2003208427 A8 AU2003208427 A8 AU 2003208427A8
- Authority
- AU
- Australia
- Prior art keywords
- ion source
- indirectly heated
- button cathode
- heated button
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/091,351 US20030168609A1 (en) | 2002-03-06 | 2002-03-06 | Indirectly heated button cathode for an ion source |
US10/091,351 | 2002-03-06 | ||
US10/259,827 | 2002-09-30 | ||
US10/259,827 US6878946B2 (en) | 2002-09-30 | 2002-09-30 | Indirectly heated button cathode for an ion source |
PCT/GB2003/000733 WO2003075305A2 (en) | 2002-03-06 | 2003-02-20 | Indirectly heated button cathode for an ion source |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003208427A8 true AU2003208427A8 (en) | 2003-09-16 |
AU2003208427A1 AU2003208427A1 (en) | 2003-09-16 |
Family
ID=27791187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003208427A Abandoned AU2003208427A1 (en) | 2002-03-06 | 2003-02-20 | Indirectly heated button cathode for an ion source |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1481413A2 (en) |
JP (1) | JP4271584B2 (en) |
AU (1) | AU2003208427A1 (en) |
WO (1) | WO2003075305A2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6878946B2 (en) | 2002-09-30 | 2005-04-12 | Applied Materials, Inc. | Indirectly heated button cathode for an ion source |
US6984831B2 (en) | 2004-03-05 | 2006-01-10 | Varian Semiconductor Equipment Associates, Inc. | Gas flow restricting cathode system for ion implanter and related method |
KR101726185B1 (en) * | 2014-11-20 | 2017-04-13 | 주식회사 밸류엔지니어링 | Cathode for ion implanter |
TWI725384B (en) | 2019-02-22 | 2021-04-21 | 力晶積成電子製造股份有限公司 | Ion source head structure of semiconductor ion implanter |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2242986C3 (en) * | 1972-09-01 | 1981-05-07 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Hot cathode |
JPS5853460B2 (en) * | 1981-12-14 | 1983-11-29 | 株式会社東芝 | Hollow cathode discharge device |
US5374828A (en) * | 1993-09-15 | 1994-12-20 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Electron reversal ionizer for detection of trace species using a spherical cathode |
US5703372A (en) * | 1996-10-30 | 1997-12-30 | Eaton Corporation | Endcap for indirectly heated cathode of ion source |
US7276847B2 (en) * | 2000-05-17 | 2007-10-02 | Varian Semiconductor Equipment Associates, Inc. | Cathode assembly for indirectly heated cathode ion source |
-
2003
- 2003-02-20 AU AU2003208427A patent/AU2003208427A1/en not_active Abandoned
- 2003-02-20 WO PCT/GB2003/000733 patent/WO2003075305A2/en not_active Application Discontinuation
- 2003-02-20 EP EP03706715A patent/EP1481413A2/en not_active Withdrawn
- 2003-02-20 JP JP2003573666A patent/JP4271584B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1481413A2 (en) | 2004-12-01 |
JP4271584B2 (en) | 2009-06-03 |
WO2003075305A3 (en) | 2003-11-27 |
JP2005519433A (en) | 2005-06-30 |
AU2003208427A1 (en) | 2003-09-16 |
WO2003075305A2 (en) | 2003-09-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |