JP2005512151A - カタジオプトリック縮小対物レンズ - Google Patents

カタジオプトリック縮小対物レンズ Download PDF

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Publication number
JP2005512151A
JP2005512151A JP2003551585A JP2003551585A JP2005512151A JP 2005512151 A JP2005512151 A JP 2005512151A JP 2003551585 A JP2003551585 A JP 2003551585A JP 2003551585 A JP2003551585 A JP 2003551585A JP 2005512151 A JP2005512151 A JP 2005512151A
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JP
Japan
Prior art keywords
lens
region
projection objective
image
light
Prior art date
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Pending
Application number
JP2003551585A
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English (en)
Japanese (ja)
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JP2005512151A5 (enExample
Inventor
アール シェイファー デイヴィッド
エプレ アレキサンダー
ウルリッヒ ヴィルヘルム
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Application filed by カール・ツァイス・エスエムティー・アーゲー filed Critical カール・ツァイス・エスエムティー・アーゲー
Publication of JP2005512151A publication Critical patent/JP2005512151A/ja
Publication of JP2005512151A5 publication Critical patent/JP2005512151A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
JP2003551585A 2001-12-10 2002-07-19 カタジオプトリック縮小対物レンズ Pending JP2005512151A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33927501P 2001-12-10 2001-12-10
PCT/EP2002/008037 WO2003050587A2 (de) 2001-12-10 2002-07-19 Katadioptrisches reduktionsobjektiv

Publications (2)

Publication Number Publication Date
JP2005512151A true JP2005512151A (ja) 2005-04-28
JP2005512151A5 JP2005512151A5 (enExample) 2006-01-05

Family

ID=23328263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003551585A Pending JP2005512151A (ja) 2001-12-10 2002-07-19 カタジオプトリック縮小対物レンズ

Country Status (4)

Country Link
EP (1) EP1456705A2 (enExample)
JP (1) JP2005512151A (enExample)
AU (1) AU2002317875A1 (enExample)
WO (1) WO2003050587A2 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2008545153A (ja) * 2005-07-01 2008-12-11 カール・ツァイス・エスエムティー・アーゲー 複数の投影対物レンズを備えた投影露光装置
JP2013042155A (ja) * 2009-08-13 2013-02-28 Carl Zeiss Smt Gmbh 反射屈折投影対物系
JP2017102481A (ja) * 2004-05-17 2017-06-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 中間像を有するカタジオプトリック投影対物レンズ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
EP1690139B1 (en) 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581379A (en) * 1993-02-15 1996-12-03 Omron Corporation Rectangular based convex microlenses surrounded within a frame and method of making
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
KR0179138B1 (ko) * 1995-12-01 1999-04-15 구자홍 대물렌즈
DE69720641T2 (de) * 1996-10-23 2004-04-08 Konica Corp. Verfahren zur Aufzeichnung und Wiedergabe eines optischen Aufzeichnungsträgers, Objektivlinse sowie Herstellungsmethode der Objektivlinse
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
JP3967851B2 (ja) * 1999-08-11 2007-08-29 フジノン株式会社 フライアイレンズの位置決め構造
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP4116224B2 (ja) * 2000-03-23 2008-07-09 ローム株式会社 レンズアレイの製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017102481A (ja) * 2004-05-17 2017-06-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 中間像を有するカタジオプトリック投影対物レンズ
JP2007013179A (ja) * 2005-07-01 2007-01-18 Carl Zeiss Smt Ag リソグラフィ投影対物レンズの補正方法およびリソグラフィ投影対物レンズ
JP2008545153A (ja) * 2005-07-01 2008-12-11 カール・ツァイス・エスエムティー・アーゲー 複数の投影対物レンズを備えた投影露光装置
JP2012168550A (ja) * 2005-07-01 2012-09-06 Carl Zeiss Smt Gmbh 複数の投影対物レンズを備えた投影露光装置
JP2013042155A (ja) * 2009-08-13 2013-02-28 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective

Also Published As

Publication number Publication date
EP1456705A2 (de) 2004-09-15
WO2003050587A3 (de) 2003-11-13
WO2003050587A2 (de) 2003-06-19
AU2002317875A1 (en) 2003-06-23
AU2002317875A8 (en) 2003-06-23

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