AU2002317875A1 - Catadioptrical reduction lens - Google Patents

Catadioptrical reduction lens

Info

Publication number
AU2002317875A1
AU2002317875A1 AU2002317875A AU2002317875A AU2002317875A1 AU 2002317875 A1 AU2002317875 A1 AU 2002317875A1 AU 2002317875 A AU2002317875 A AU 2002317875A AU 2002317875 A AU2002317875 A AU 2002317875A AU 2002317875 A1 AU2002317875 A1 AU 2002317875A1
Authority
AU
Australia
Prior art keywords
catadioptrical
reduction lens
lens
reduction
catadioptrical reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002317875A
Other languages
English (en)
Other versions
AU2002317875A8 (en
Inventor
Alexander Epple
David R. Shafer
Wilhelm Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2002317875A1 publication Critical patent/AU2002317875A1/en
Publication of AU2002317875A8 publication Critical patent/AU2002317875A8/xx
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
AU2002317875A 2001-12-10 2002-07-19 Catadioptrical reduction lens Abandoned AU2002317875A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33927501P 2001-12-10 2001-12-10
US60/339,275 2001-12-10
PCT/EP2002/008037 WO2003050587A2 (de) 2001-12-10 2002-07-19 Katadioptrisches reduktionsobjektiv

Publications (2)

Publication Number Publication Date
AU2002317875A1 true AU2002317875A1 (en) 2003-06-23
AU2002317875A8 AU2002317875A8 (en) 2003-06-23

Family

ID=23328263

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002317875A Abandoned AU2002317875A1 (en) 2001-12-10 2002-07-19 Catadioptrical reduction lens

Country Status (4)

Country Link
EP (1) EP1456705A2 (enExample)
JP (1) JP2005512151A (enExample)
AU (1) AU2002317875A1 (enExample)
WO (1) WO2003050587A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
EP1690139B1 (en) 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
KR20170129271A (ko) * 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
DE102005030839A1 (de) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581379A (en) * 1993-02-15 1996-12-03 Omron Corporation Rectangular based convex microlenses surrounded within a frame and method of making
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
KR0179138B1 (ko) * 1995-12-01 1999-04-15 구자홍 대물렌즈
DE69720641T2 (de) * 1996-10-23 2004-04-08 Konica Corp. Verfahren zur Aufzeichnung und Wiedergabe eines optischen Aufzeichnungsträgers, Objektivlinse sowie Herstellungsmethode der Objektivlinse
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
JP3967851B2 (ja) * 1999-08-11 2007-08-29 フジノン株式会社 フライアイレンズの位置決め構造
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP4116224B2 (ja) * 2000-03-23 2008-07-09 ローム株式会社 レンズアレイの製造方法

Also Published As

Publication number Publication date
EP1456705A2 (de) 2004-09-15
JP2005512151A (ja) 2005-04-28
WO2003050587A3 (de) 2003-11-13
WO2003050587A2 (de) 2003-06-19
AU2002317875A8 (en) 2003-06-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase