JP2005510860A5 - - Google Patents

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Publication number
JP2005510860A5
JP2005510860A5 JP2003548035A JP2003548035A JP2005510860A5 JP 2005510860 A5 JP2005510860 A5 JP 2005510860A5 JP 2003548035 A JP2003548035 A JP 2003548035A JP 2003548035 A JP2003548035 A JP 2003548035A JP 2005510860 A5 JP2005510860 A5 JP 2005510860A5
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JP
Japan
Prior art keywords
radiation
detection means
image
projection
image detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003548035A
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English (en)
Japanese (ja)
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JP4290553B2 (ja
JP2005510860A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/EP2002/013399 external-priority patent/WO2003046662A1/en
Publication of JP2005510860A publication Critical patent/JP2005510860A/ja
Publication of JP2005510860A5 publication Critical patent/JP2005510860A5/ja
Application granted granted Critical
Publication of JP4290553B2 publication Critical patent/JP4290553B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003548035A 2001-11-27 2002-11-27 画像化装置 Expired - Fee Related JP4290553B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01204567 2001-11-27
PCT/EP2002/013399 WO2003046662A1 (en) 2001-11-27 2002-11-27 Imaging apparatus

Publications (3)

Publication Number Publication Date
JP2005510860A JP2005510860A (ja) 2005-04-21
JP2005510860A5 true JP2005510860A5 (https=) 2006-01-05
JP4290553B2 JP4290553B2 (ja) 2009-07-08

Family

ID=8181314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003548035A Expired - Fee Related JP4290553B2 (ja) 2001-11-27 2002-11-27 画像化装置

Country Status (7)

Country Link
US (1) US7379579B2 (https=)
EP (1) EP1449032B1 (https=)
JP (1) JP4290553B2 (https=)
KR (1) KR100674245B1 (https=)
CN (1) CN1294455C (https=)
DE (1) DE60230663D1 (https=)
WO (1) WO2003046662A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4929444B2 (ja) * 2004-09-27 2012-05-09 国立大学法人東北大学 パターン描画装置および方法
US7177012B2 (en) * 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7403865B2 (en) * 2004-12-28 2008-07-22 Asml Netherlands B.V. System and method for fault indication on a substrate in maskless applications
US7233384B2 (en) * 2005-06-13 2007-06-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
KR20080103564A (ko) * 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US9645502B2 (en) * 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
DE102011076083A1 (de) 2011-05-18 2012-11-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsdisplay und Verfahren zum Anzeigen eines Gesamtbildes für Projektionsfreiformflächen oder verkippte Projektionsflächen
JP6676942B2 (ja) * 2015-12-01 2020-04-08 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
TWI724642B (zh) * 2019-11-20 2021-04-11 墨子光電有限公司 微製像設備及其加工方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2049964A (en) * 1979-05-01 1980-12-31 Agfa Gevaert Nv Simultaneously projecting two images of a subject in register
DE3406677A1 (de) * 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim Einrichtung zur kompensation der auswanderung eines laserstrahls
JP2501436B2 (ja) * 1986-10-31 1996-05-29 富士通株式会社 パタ−ンデ−タ検査装置
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JPH03265815A (ja) * 1990-03-16 1991-11-26 Kobe Steel Ltd レーザビームによる描画装置
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
WO1992011567A1 (en) * 1990-12-21 1992-07-09 Eastman Kodak Company Method and apparatus for selectively varying the exposure of a photosensitive medium
US5229889A (en) * 1991-12-10 1993-07-20 Hughes Aircraft Company Simple adaptive optical system
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP2710527B2 (ja) * 1992-10-21 1998-02-10 大日本スクリーン製造株式会社 周期性パターンの検査装置
JPH06250108A (ja) * 1993-02-22 1994-09-09 Hitachi Ltd 補償光学装置とこれを用いた天体望遠鏡，光データリンク，レーザ加工機
JPH088161A (ja) * 1994-06-20 1996-01-12 Mitsubishi Electric Corp 転写シミュレータ装置
WO1997034171A2 (en) * 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
JPH10177589A (ja) * 1996-12-18 1998-06-30 Mitsubishi Electric Corp パターン比較検証装置、パターン比較検証方法およびパターン比較検証プログラムを記録した媒体
JP4159139B2 (ja) * 1998-05-14 2008-10-01 リコーマイクロエレクトロニクス株式会社 光像形成装置、光加工装置並びに露光装置
SE519397C2 (sv) * 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
JP3315658B2 (ja) * 1998-12-28 2002-08-19 キヤノン株式会社 投影装置および露光装置
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP4364459B2 (ja) * 2000-12-07 2009-11-18 富士通株式会社 光信号交換器の制御装置および制御方法
JP2002367900A (ja) * 2001-06-12 2002-12-20 Yaskawa Electric Corp 露光装置および露光方法
CN1582407A (zh) * 2001-09-12 2005-02-16 麦克罗尼克激光系统公司 使用空间光调制器的改进方法和装置

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