JP2008116909A5 - - Google Patents
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- Publication number
- JP2008116909A5 JP2008116909A5 JP2007201013A JP2007201013A JP2008116909A5 JP 2008116909 A5 JP2008116909 A5 JP 2008116909A5 JP 2007201013 A JP2007201013 A JP 2007201013A JP 2007201013 A JP2007201013 A JP 2007201013A JP 2008116909 A5 JP2008116909 A5 JP 2008116909A5
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- image
- polarization
- exposure process
- correction function
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 28
- 230000010287 polarization Effects 0.000 claims 11
- 238000003384 imaging method Methods 0.000 claims 9
- 230000003595 spectral effect Effects 0.000 claims 9
- 230000001419 dependent effect Effects 0.000 claims 4
- 238000011156 evaluation Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 1
- 210000001747 pupil Anatomy 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82105606P | 2006-08-01 | 2006-08-01 | |
| US60/821056 | 2006-08-01 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008116909A JP2008116909A (ja) | 2008-05-22 |
| JP2008116909A5 true JP2008116909A5 (https=) | 2010-09-16 |
| JP5308639B2 JP5308639B2 (ja) | 2013-10-09 |
Family
ID=39340500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007201013A Expired - Fee Related JP5308639B2 (ja) | 2006-08-01 | 2007-08-01 | 欠陥検出のための方法及びシステム |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5308639B2 (https=) |
| KR (1) | KR101235171B1 (https=) |
| CN (1) | CN101451963B (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102253595B (zh) * | 2010-05-20 | 2013-04-10 | 北大方正集团有限公司 | 一种查找缺陷掩膜版的方法 |
| KR20150099853A (ko) * | 2012-12-27 | 2015-09-01 | 가부시키가이샤 니콘 | 검사 장치, 검사 방법, 노광 시스템 및 노광 방법, 및 디바이스 제조 방법 |
| TWI630453B (zh) * | 2017-11-22 | 2018-07-21 | 牧德科技股份有限公司 | 投影式複檢機及其校正方法 |
| US11546508B1 (en) * | 2021-07-21 | 2023-01-03 | Black Sesame Technologies Inc. | Polarization imaging system with super resolution fusion |
| CN117055307B (zh) * | 2023-10-11 | 2023-12-15 | 光科芯图(北京)科技有限公司 | 一种应用于掩模成像的数据处理方法、装置及曝光设备 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60220940A (ja) * | 1983-05-20 | 1985-11-05 | Hitachi Ltd | 異物自動検査装置 |
| JP3998334B2 (ja) | 1997-09-22 | 2007-10-24 | 株式会社東芝 | 欠陥検査方法 |
| JP2000206329A (ja) * | 1999-01-12 | 2000-07-28 | Toshiba Corp | 位相測定方法及びその装置 |
| IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
| US7035448B2 (en) * | 2001-08-20 | 2006-04-25 | Hoya Corporation | Method of defect inspection of graytone mask and apparatus doing the same |
| US6828542B2 (en) * | 2002-06-07 | 2004-12-07 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
| JP2004061915A (ja) * | 2002-07-30 | 2004-02-26 | Nikon Corp | マスク検査方法及び露光装置 |
| US9002497B2 (en) * | 2003-07-03 | 2015-04-07 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of wafers and reticles using designer intent data |
| JP2005026527A (ja) * | 2003-07-03 | 2005-01-27 | Sony Corp | 露光方法および半導体装置の製造方法 |
| US7265364B2 (en) * | 2004-06-10 | 2007-09-04 | Asml Netherlands B.V. | Level sensor for lithographic apparatus |
| KR101248674B1 (ko) | 2004-06-16 | 2013-03-28 | 가부시키가이샤 니콘 | 표면 검사 장치 및 표면 검사 방법 |
| US7397552B2 (en) * | 2004-09-27 | 2008-07-08 | Applied Materials, Israel, Ltd. | Optical inspection with alternating configurations |
| JP4778755B2 (ja) * | 2005-09-09 | 2011-09-21 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びこれを用いた装置 |
-
2007
- 2007-08-01 KR KR1020070077450A patent/KR101235171B1/ko not_active Expired - Fee Related
- 2007-08-01 CN CN2007101428793A patent/CN101451963B/zh not_active Expired - Fee Related
- 2007-08-01 JP JP2007201013A patent/JP5308639B2/ja not_active Expired - Fee Related
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