JP2008116909A5 - - Google Patents

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Publication number
JP2008116909A5
JP2008116909A5 JP2007201013A JP2007201013A JP2008116909A5 JP 2008116909 A5 JP2008116909 A5 JP 2008116909A5 JP 2007201013 A JP2007201013 A JP 2007201013A JP 2007201013 A JP2007201013 A JP 2007201013A JP 2008116909 A5 JP2008116909 A5 JP 2008116909A5
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JP
Japan
Prior art keywords
reticle
image
polarization
exposure process
correction function
Prior art date
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Granted
Application number
JP2007201013A
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English (en)
Japanese (ja)
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JP2008116909A (ja
JP5308639B2 (ja
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Publication of JP2008116909A publication Critical patent/JP2008116909A/ja
Publication of JP2008116909A5 publication Critical patent/JP2008116909A5/ja
Application granted granted Critical
Publication of JP5308639B2 publication Critical patent/JP5308639B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007201013A 2006-08-01 2007-08-01 欠陥検出のための方法及びシステム Expired - Fee Related JP5308639B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82105606P 2006-08-01 2006-08-01
US60/821056 2006-08-01

Publications (3)

Publication Number Publication Date
JP2008116909A JP2008116909A (ja) 2008-05-22
JP2008116909A5 true JP2008116909A5 (https=) 2010-09-16
JP5308639B2 JP5308639B2 (ja) 2013-10-09

Family

ID=39340500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007201013A Expired - Fee Related JP5308639B2 (ja) 2006-08-01 2007-08-01 欠陥検出のための方法及びシステム

Country Status (3)

Country Link
JP (1) JP5308639B2 (https=)
KR (1) KR101235171B1 (https=)
CN (1) CN101451963B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102253595B (zh) * 2010-05-20 2013-04-10 北大方正集团有限公司 一种查找缺陷掩膜版的方法
CN104884945A (zh) * 2012-12-27 2015-09-02 株式会社尼康 检查装置、检查方法、曝光系统及曝光方法、以及元件制造方法
TWI630453B (zh) * 2017-11-22 2018-07-21 牧德科技股份有限公司 投影式複檢機及其校正方法
US11546508B1 (en) * 2021-07-21 2023-01-03 Black Sesame Technologies Inc. Polarization imaging system with super resolution fusion
CN117055307B (zh) * 2023-10-11 2023-12-15 光科芯图(北京)科技有限公司 一种应用于掩模成像的数据处理方法、装置及曝光设备

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60220940A (ja) * 1983-05-20 1985-11-05 Hitachi Ltd 異物自動検査装置
JP3998334B2 (ja) 1997-09-22 2007-10-24 株式会社東芝 欠陥検査方法
JP2000206329A (ja) * 1999-01-12 2000-07-28 Toshiba Corp 位相測定方法及びその装置
IL130874A (en) * 1999-07-09 2002-12-01 Nova Measuring Instr Ltd System and method for measuring pattern structures
CN1218171C (zh) * 2001-08-20 2005-09-07 Hoya株式会社 灰调掩模的缺陷检查方法及缺陷检查装置
US6828542B2 (en) * 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
JP2004061915A (ja) * 2002-07-30 2004-02-26 Nikon Corp マスク検査方法及び露光装置
JP2005026527A (ja) * 2003-07-03 2005-01-27 Sony Corp 露光方法および半導体装置の製造方法
US9002497B2 (en) * 2003-07-03 2015-04-07 Kla-Tencor Technologies Corp. Methods and systems for inspection of wafers and reticles using designer intent data
US7265364B2 (en) * 2004-06-10 2007-09-04 Asml Netherlands B.V. Level sensor for lithographic apparatus
KR101248674B1 (ko) 2004-06-16 2013-03-28 가부시키가이샤 니콘 표면 검사 장치 및 표면 검사 방법
US7397552B2 (en) * 2004-09-27 2008-07-08 Applied Materials, Israel, Ltd. Optical inspection with alternating configurations
JP4778755B2 (ja) * 2005-09-09 2011-09-21 株式会社日立ハイテクノロジーズ 欠陥検査方法及びこれを用いた装置

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