CN1218171C - 灰调掩模的缺陷检查方法及缺陷检查装置 - Google Patents
灰调掩模的缺陷检查方法及缺陷检查装置 Download PDFInfo
- Publication number
- CN1218171C CN1218171C CN021082499A CN02108249A CN1218171C CN 1218171 C CN1218171 C CN 1218171C CN 021082499 A CN021082499 A CN 021082499A CN 02108249 A CN02108249 A CN 02108249A CN 1218171 C CN1218171 C CN 1218171C
- Authority
- CN
- China
- Prior art keywords
- defective
- tone portion
- shielding part
- light shielding
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000007689 inspection Methods 0.000 claims abstract description 14
- 230000002950 deficient Effects 0.000 claims description 96
- 230000005540 biological transmission Effects 0.000 claims description 51
- 239000000284 extract Substances 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 14
- 238000000605 extraction Methods 0.000 claims description 7
- 238000012550 audit Methods 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001845 chromium compounds Chemical group 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Quality & Reliability (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP248650/2001 | 2001-08-20 | ||
JP2001248650A JP3879904B2 (ja) | 2000-09-29 | 2001-08-20 | グレートーンマスクの欠陥検査方法及び欠陥検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1401994A CN1401994A (zh) | 2003-03-12 |
CN1218171C true CN1218171C (zh) | 2005-09-07 |
Family
ID=19077780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN021082499A Expired - Lifetime CN1218171C (zh) | 2001-08-20 | 2002-03-28 | 灰调掩模的缺陷检查方法及缺陷检查装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7035448B2 (zh) |
CN (1) | CN1218171C (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9002497B2 (en) | 2003-07-03 | 2015-04-07 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of wafers and reticles using designer intent data |
JP2005077955A (ja) * | 2003-09-02 | 2005-03-24 | Sanyo Electric Co Ltd | エッチング方法およびそれを用いた回路装置の製造方法 |
JP2006030320A (ja) * | 2004-07-12 | 2006-02-02 | Hoya Corp | グレートーンマスク及びグレートーンマスクの製造方法 |
JP5308639B2 (ja) * | 2006-08-01 | 2013-10-09 | アプライド マテリアルズ イスラエル リミテッド | 欠陥検出のための方法及びシステム |
KR101403965B1 (ko) | 2012-07-23 | 2014-06-10 | 케이맥(주) | 주기격자 대상물의 분석 방법 |
AU2015271133B2 (en) | 2014-06-06 | 2018-07-05 | Dexcom, Inc. | Fault discrimination and responsive processing based on data and context |
CN115641329B (zh) * | 2022-11-15 | 2023-04-07 | 武汉惠强新能源材料科技有限公司 | 一种锂电池隔膜缺陷检测方法及系统 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6714670B1 (en) * | 1998-05-20 | 2004-03-30 | Cognex Corporation | Methods and apparatuses to determine the state of elements |
US6436802B1 (en) * | 1998-11-30 | 2002-08-20 | Adoamtest Corp. | Method of producing contact structure |
US6529621B1 (en) * | 1998-12-17 | 2003-03-04 | Kla-Tencor | Mechanisms for making and inspecting reticles |
-
2002
- 2002-03-28 US US10/107,820 patent/US7035448B2/en not_active Expired - Fee Related
- 2002-03-28 CN CN021082499A patent/CN1218171C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20030035575A1 (en) | 2003-02-20 |
US7035448B2 (en) | 2006-04-25 |
CN1401994A (zh) | 2003-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: HOYA CO., LTD. Free format text: FORMER OWNER: HOYA CORP. Effective date: 20040430 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20040430 Address after: Tokyo, Japan Applicant after: HOYA Corporation Address before: Tokyo, Japan Applicant before: Hoya Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP02 | Change in the address of a patent holder |
Address after: Japan Tokyo 160-8347 Shinjuku Shinjuku six chome 10 No. 1 Patentee after: HOYA Corporation Address before: Tokyo, Japan Patentee before: HOYA Corporation |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20050907 |