JP2005509710A - フォトリソグラフィ用のスピンオングラス反射防止性コーティング - Google Patents

フォトリソグラフィ用のスピンオングラス反射防止性コーティング Download PDF

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Publication number
JP2005509710A
JP2005509710A JP2003545711A JP2003545711A JP2005509710A JP 2005509710 A JP2005509710 A JP 2005509710A JP 2003545711 A JP2003545711 A JP 2003545711A JP 2003545711 A JP2003545711 A JP 2003545711A JP 2005509710 A JP2005509710 A JP 2005509710A
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JP
Japan
Prior art keywords
siloxane polymer
anthracenecarboxy
spin
concave
family
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2003545711A
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English (en)
Japanese (ja)
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JP2005509710A5 (cg-RX-API-DMAC7.html
Inventor
ボールドウィン−ヘンドリックス，テレサ
ケネディー，ジョー
リッチー，メアリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of JP2005509710A publication Critical patent/JP2005509710A/ja
Publication of JP2005509710A5 publication Critical patent/JP2005509710A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
JP2003545711A 2001-11-16 2001-11-16 フォトリソグラフィ用のスピンオングラス反射防止性コーティング Pending JP2005509710A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2001/043831 WO2003044077A1 (en) 2001-11-16 2001-11-16 Spin-on-glass anti-reflective coatings for photolithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009158887A Division JP2009280822A (ja) 2009-07-03 2009-07-03 フォトリソグラフィ用のスピンオングラス反射防止性コーティング

Publications (2)

Publication Number Publication Date
JP2005509710A true JP2005509710A (ja) 2005-04-14
JP2005509710A5 JP2005509710A5 (cg-RX-API-DMAC7.html) 2005-12-22

Family

ID=21743007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003545711A Pending JP2005509710A (ja) 2001-11-16 2001-11-16 フォトリソグラフィ用のスピンオングラス反射防止性コーティング

Country Status (5)

Country Link
US (1) US20090275694A1 (cg-RX-API-DMAC7.html)
EP (1) EP1478681A4 (cg-RX-API-DMAC7.html)
JP (1) JP2005509710A (cg-RX-API-DMAC7.html)
KR (1) KR100818678B1 (cg-RX-API-DMAC7.html)
WO (1) WO2003044077A1 (cg-RX-API-DMAC7.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006528999A (ja) * 2003-05-23 2006-12-28 ダウ コーニング コーポレイシヨン 高い湿式エッチング速度を持つシロキサン樹脂系反射防止被覆組成物
WO2007105538A1 (ja) * 2006-03-10 2007-09-20 Tokyo Ohka Kogyo Co., Ltd. レジスト下層膜用組成物及びこれを用いたレジスト下層膜
JP2009540085A (ja) * 2006-06-13 2009-11-19 ブラゴーン オサケ ユキチュア 反射防止被膜用のカルボシラン重合体組成物
JP2012057081A (ja) * 2010-09-10 2012-03-22 Toyota Central R&D Labs Inc 表面に微細な凹凸構造を有するフィルムおよびその製造方法
CN1826391B (zh) * 2003-06-23 2012-12-12 苏黎世大学 超疏水涂层

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (en) 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
DE10227807A1 (de) * 2002-06-21 2004-01-22 Honeywell Specialty Chemicals Seelze Gmbh Silylalkylester von Anthracen- und Phenanthrencarbonsäuren
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
JP4541080B2 (ja) * 2004-09-16 2010-09-08 東京応化工業株式会社 反射防止膜形成用組成物およびこれを用いた配線形成方法
ATE486098T1 (de) 2004-12-17 2010-11-15 Dow Corning Siloxanharzbeschichtung
JP4688882B2 (ja) 2004-12-17 2011-05-25 ダウ・コーニング・コーポレイション 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法及び電子デバイスの製造方法
JP4692540B2 (ja) 2005-03-01 2011-06-01 Ｊｓｒ株式会社 レジスト下層膜用組成物およびその製造方法
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US8318258B2 (en) 2008-01-08 2012-11-27 Dow Corning Toray Co., Ltd. Silsesquioxane resins
JP2011510133A (ja) 2008-01-15 2011-03-31 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
KR101546222B1 (ko) 2008-02-25 2015-08-20 허니웰 인터내셔널 인코포레이티드 공정가능한 무기 및 유기 중합체 배합물, 이의 제조방법 및 이의 용도
KR20100134578A (ko) 2008-03-04 2010-12-23 다우 코닝 코포레이션 실세스퀴옥산 수지
JP5581224B2 (ja) 2008-03-05 2014-08-27 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN103832968B (zh) * 2014-03-17 2016-04-13 上海华虹宏力半导体制造有限公司 Mems器件的制造方法
CN104497034B (zh) * 2014-12-09 2018-04-13 山东大学 一种α‑取代丙烯酰氧基甲基三烷氧基硅烷的制备方法
JP6470079B2 (ja) * 2015-03-16 2019-02-13 株式会社東芝 パターン形成方法
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0629382B2 (ja) * 1987-04-07 1994-04-20 信越化学工業株式会社 紫外線硬化性ハードコーティング剤
US6040053A (en) * 1996-07-19 2000-03-21 Minnesota Mining And Manufacturing Company Coating composition having anti-reflective and anti-fogging properties
CN100341166C (zh) * 1998-09-01 2007-10-03 大赛璐化学工业株式会社 有机场致发光器件的材料及其制造方法
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) * 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006528999A (ja) * 2003-05-23 2006-12-28 ダウ コーニング コーポレイシヨン 高い湿式エッチング速度を持つシロキサン樹脂系反射防止被覆組成物
JP4796498B2 (ja) * 2003-05-23 2011-10-19 ダウ コーニング コーポレーション 高い湿式エッチング速度を持つシロキサン樹脂系反射防止被覆組成物
CN1826391B (zh) * 2003-06-23 2012-12-12 苏黎世大学 超疏水涂层
WO2007105538A1 (ja) * 2006-03-10 2007-09-20 Tokyo Ohka Kogyo Co., Ltd. レジスト下層膜用組成物及びこれを用いたレジスト下層膜
JP2009540085A (ja) * 2006-06-13 2009-11-19 ブラゴーン オサケ ユキチュア 反射防止被膜用のカルボシラン重合体組成物
JP2012057081A (ja) * 2010-09-10 2012-03-22 Toyota Central R&D Labs Inc 表面に微細な凹凸構造を有するフィルムおよびその製造方法

Also Published As

Publication number Publication date
KR100818678B1 (ko) 2008-04-01
EP1478681A4 (en) 2006-10-11
EP1478681A1 (en) 2004-11-24
WO2003044077A1 (en) 2003-05-30
KR20040066822A (ko) 2004-07-27
US20090275694A1 (en) 2009-11-05

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