JP2005354085A5 - - Google Patents

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Publication number
JP2005354085A5
JP2005354085A5 JP2005176063A JP2005176063A JP2005354085A5 JP 2005354085 A5 JP2005354085 A5 JP 2005354085A5 JP 2005176063 A JP2005176063 A JP 2005176063A JP 2005176063 A JP2005176063 A JP 2005176063A JP 2005354085 A5 JP2005354085 A5 JP 2005354085A5
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JP
Japan
Prior art keywords
electron beam
electrons
region
backscattered
secondary electrons
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Application number
JP2005176063A
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English (en)
Japanese (ja)
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JP2005354085A (ja
JP4625376B2 (ja
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Priority to JP2005176063A priority Critical patent/JP4625376B2/ja
Priority claimed from JP2005176063A external-priority patent/JP4625376B2/ja
Publication of JP2005354085A publication Critical patent/JP2005354085A/ja
Publication of JP2005354085A5 publication Critical patent/JP2005354085A5/ja
Application granted granted Critical
Publication of JP4625376B2 publication Critical patent/JP4625376B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005176063A 2000-02-22 2005-06-16 電子ビームによる検査方法 Expired - Fee Related JP4625376B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005176063A JP4625376B2 (ja) 2000-02-22 2005-06-16 電子ビームによる検査方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000050501 2000-02-22
JP2005176063A JP4625376B2 (ja) 2000-02-22 2005-06-16 電子ビームによる検査方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000276640A Division JP4015352B2 (ja) 2000-02-22 2000-09-07 荷電粒子ビームを用いた検査方法

Publications (3)

Publication Number Publication Date
JP2005354085A JP2005354085A (ja) 2005-12-22
JP2005354085A5 true JP2005354085A5 (https=) 2006-11-24
JP4625376B2 JP4625376B2 (ja) 2011-02-02

Family

ID=35588213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005176063A Expired - Fee Related JP4625376B2 (ja) 2000-02-22 2005-06-16 電子ビームによる検査方法

Country Status (1)

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JP (1) JP4625376B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4891036B2 (ja) * 2006-11-16 2012-03-07 ルネサスエレクトロニクス株式会社 半導体装置の製造方法および半導体検査装置
JP5103050B2 (ja) * 2007-04-06 2012-12-19 株式会社日立ハイテクノロジーズ 電子線応用装置
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0743433A (ja) * 1993-07-30 1995-02-14 Advantest Corp 電子ビームテスタ及びそれを使ったｉｃ試験装置
US6504393B1 (en) * 1997-07-15 2003-01-07 Applied Materials, Inc. Methods and apparatus for testing semiconductor and integrated circuit structures
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

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