JP2004157135A5 - - Google Patents

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Publication number
JP2004157135A5
JP2004157135A5 JP2004010030A JP2004010030A JP2004157135A5 JP 2004157135 A5 JP2004157135 A5 JP 2004157135A5 JP 2004010030 A JP2004010030 A JP 2004010030A JP 2004010030 A JP2004010030 A JP 2004010030A JP 2004157135 A5 JP2004157135 A5 JP 2004157135A5
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JP
Japan
Prior art keywords
electron beam
substrate surface
pattern
sample
image
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Pending
Application number
JP2004010030A
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English (en)
Japanese (ja)
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JP2004157135A (ja
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Priority to JP2004010030A priority Critical patent/JP2004157135A/ja
Priority claimed from JP2004010030A external-priority patent/JP2004157135A/ja
Publication of JP2004157135A publication Critical patent/JP2004157135A/ja
Publication of JP2004157135A5 publication Critical patent/JP2004157135A5/ja
Pending legal-status Critical Current

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JP2004010030A 2004-01-19 2004-01-19 回路パターンの検査方法及び検査装置 Pending JP2004157135A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004010030A JP2004157135A (ja) 2004-01-19 2004-01-19 回路パターンの検査方法及び検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004010030A JP2004157135A (ja) 2004-01-19 2004-01-19 回路パターンの検査方法及び検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11122565A Division JP2000314710A (ja) 1999-04-28 1999-04-28 回路パターンの検査方法及び検査装置

Publications (2)

Publication Number Publication Date
JP2004157135A JP2004157135A (ja) 2004-06-03
JP2004157135A5 true JP2004157135A5 (https=) 2006-06-15

Family

ID=32821956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004010030A Pending JP2004157135A (ja) 2004-01-19 2004-01-19 回路パターンの検査方法及び検査装置

Country Status (1)

Country Link
JP (1) JP2004157135A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006261162A (ja) * 2005-03-15 2006-09-28 Hitachi High-Technologies Corp レビュー装置及びレビュー装置における検査方法
JP2009117541A (ja) * 2007-11-05 2009-05-28 Tokyo Electron Ltd 基板検査方法、基板検査装置及び記憶媒体
JP5277008B2 (ja) * 2009-02-06 2013-08-28 株式会社日立ハイテクノロジーズ パターン測定条件設定方法、及びパターン測定条件設定装置
JP5400882B2 (ja) 2009-06-30 2014-01-29 株式会社日立ハイテクノロジーズ 半導体検査装置及びそれを用いた半導体検査方法
CN112098498B (zh) * 2020-06-29 2024-05-03 平高集团有限公司 绝缘材料表面缺陷检测方法及装置

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