JP2005353141A - 遮光膜を備えた光学素子の製造方法 - Google Patents
遮光膜を備えた光学素子の製造方法 Download PDFInfo
- Publication number
- JP2005353141A JP2005353141A JP2004171025A JP2004171025A JP2005353141A JP 2005353141 A JP2005353141 A JP 2005353141A JP 2004171025 A JP2004171025 A JP 2004171025A JP 2004171025 A JP2004171025 A JP 2004171025A JP 2005353141 A JP2005353141 A JP 2005353141A
- Authority
- JP
- Japan
- Prior art keywords
- light
- grating
- shielding
- opening
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims description 31
- 230000008569 process Effects 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011358 absorbing material Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 238000011161 development Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 14
- 239000011521 glass Substances 0.000 abstract description 11
- 238000005530 etching Methods 0.000 abstract description 3
- 238000004528 spin coating Methods 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Images
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Head (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004171025A JP2005353141A (ja) | 2004-06-09 | 2004-06-09 | 遮光膜を備えた光学素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004171025A JP2005353141A (ja) | 2004-06-09 | 2004-06-09 | 遮光膜を備えた光学素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005353141A true JP2005353141A (ja) | 2005-12-22 |
| JP2005353141A5 JP2005353141A5 (https=) | 2007-07-05 |
Family
ID=35587502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004171025A Withdrawn JP2005353141A (ja) | 2004-06-09 | 2004-06-09 | 遮光膜を備えた光学素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005353141A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007223869A (ja) * | 2006-02-27 | 2007-09-06 | Epson Toyocom Corp | ダイシングラインの膜構造、光学基板のウェハ、光学部品、及び光学部品の製造方法 |
-
2004
- 2004-06-09 JP JP2004171025A patent/JP2005353141A/ja not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007223869A (ja) * | 2006-02-27 | 2007-09-06 | Epson Toyocom Corp | ダイシングラインの膜構造、光学基板のウェハ、光学部品、及び光学部品の製造方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3248526B2 (ja) | 回折光学素子及びそれを有した光学系 | |
| JP3513236B2 (ja) | X線マスク構造体、x線マスク構造体の製造方法、該x線マスク構造体を用いたx線露光装置及びx線露光方法、並びに該x線露光方法を用いて製造される半導体装置 | |
| US6825898B2 (en) | Lens array substrate and liquid crystal display apparatus | |
| JP2010205351A (ja) | 光検出器、光検出器の製造方法及び光検出システム | |
| US10768349B2 (en) | Reflective diffraction grating and fabrication method | |
| JP2000321962A (ja) | マスタホログラム及びこれを用いたホログラムフィルタの製造方法 | |
| JP3500963B2 (ja) | マスタホログラム | |
| US4764441A (en) | Photo-mask for production of substrate for optical memory element | |
| JP5125271B2 (ja) | 反射スクリーンの製造方法および反射スクリーン | |
| CN100406930C (zh) | 全息元件 | |
| JP2006317737A (ja) | 露光用マスク | |
| JPS61502426A (ja) | フォトリソグラフィに関する改良 | |
| US20090059189A1 (en) | Pellicle for use in a microlithographic exposure apparatus | |
| JPH0453015B2 (https=) | ||
| JP2005353141A (ja) | 遮光膜を備えた光学素子の製造方法 | |
| JP4900656B2 (ja) | 反射型マスクブランク、反射型フォトマスク、及び反射型フォトマスクの製造方法 | |
| JP2889062B2 (ja) | X線マスクおよびその製造方法 | |
| JP4095791B2 (ja) | パターンの転写方法とそのフォトマスク | |
| JPS6034171B2 (ja) | 光学記録方式によるビデオデイスク原盤 | |
| US20070134563A1 (en) | Photomask and method of manufacturing semiconductor device | |
| JP2007334975A (ja) | 回折格子とその製造方法及び光ピックアップ装置 | |
| JP3301711B2 (ja) | 光記録検査ディスク及びその製造方法 | |
| JP2674318B2 (ja) | ホログラムの製造方法 | |
| JP2924146B2 (ja) | X線露光用マスク及びその製造方法 | |
| JP4318073B2 (ja) | 光学素子およびこの光学素子を用いた光ファイバ光学系 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20070402 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070523 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070523 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20070523 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090625 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090630 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20090826 |