JP2005333129A - 半導体レーザーダイオード - Google Patents
半導体レーザーダイオード Download PDFInfo
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- JP2005333129A JP2005333129A JP2005137574A JP2005137574A JP2005333129A JP 2005333129 A JP2005333129 A JP 2005333129A JP 2005137574 A JP2005137574 A JP 2005137574A JP 2005137574 A JP2005137574 A JP 2005137574A JP 2005333129 A JP2005333129 A JP 2005333129A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000005253 cladding Methods 0.000 claims description 76
- 150000001875 compounds Chemical class 0.000 claims description 26
- 238000005530 etching Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 238000005036 potential barrier Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
- A01K61/00—Culture of aquatic animals
- A01K61/70—Artificial fishing banks or reefs
- A01K61/78—Arrangements for sinking or mooring thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02B—HYDRAULIC ENGINEERING
- E02B3/00—Engineering works in connection with control or use of streams, rivers, coasts, or other marine sites; Sealings or joints for engineering works in general
- E02B3/04—Structures or apparatus for, or methods of, protecting banks, coasts, or harbours
- E02B3/043—Artificial seaweed
-
- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02B—HYDRAULIC ENGINEERING
- E02B3/00—Engineering works in connection with control or use of streams, rivers, coasts, or other marine sites; Sealings or joints for engineering works in general
- E02B3/04—Structures or apparatus for, or methods of, protecting banks, coasts, or harbours
- E02B3/046—Artificial reefs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34326—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on InGa(Al)P, e.g. red laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/18—Semiconductor lasers with special structural design for influencing the near- or far-field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3213—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities asymmetric clading layers
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ocean & Marine Engineering (AREA)
- Environmental Sciences (AREA)
- Structural Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Civil Engineering (AREA)
- Electromagnetism (AREA)
- Biophysics (AREA)
- Marine Sciences & Fisheries (AREA)
- Biodiversity & Conservation Biology (AREA)
- Animal Husbandry (AREA)
- Zoology (AREA)
- Semiconductor Lasers (AREA)
Abstract
【解決手段】 活性層130と、活性層130の上部に形成される上部クラッド層121と、活性層130の下部に形成される第1下部クラッド層111aと、第1下部クラッド層111aの下部に形成される第2下部クラッド層111bと、第2下部クラッド層111bの下部に形成される基板110と、を備え、第1下部クラッド層111aの屈折率は上部クラッド層121の屈折率と同じであり、第2下部クラッド層111bの屈折率より小さいことを特徴とする半導体レーザーダイオードである。
【選択図】図3
Description
111 下部クラッド層、
130 活性層、
121 上部クラッド層、
111a 第1下部クラッド層、
111b 第2下部クラッド層、
112 下部導波層、
122 上部導波層、
140 第1電極層、
150 第2電極層。
Claims (9)
- 活性層と、
前記活性層の上部に形成される上部クラッド層と、
前記活性層の下部に形成される第1下部クラッド層と、
前記第1下部クラッド層の下部に形成される第2下部クラッド層と、
前記第2下部クラッド層の下部に形成される基板と、を備え、
前記第1下部クラッド層の屈折率は、前記上部クラッド層の屈折率と同じであり、前記第2下部クラッド層の屈折率より小さいことを特徴とする半導体レーザーダイオード。 - 前記上部クラッド層内には、エッチング阻止層が形成されることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記上部クラッド層の上面及び前記基板の下面には、各々第1電極層及び第2電極層が備えられることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記活性層は、多重量子ウェル構造または単一量子ウェル構造を有することを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記活性層は、GaInP系列の化合物半導体よりなることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記上部クラッド層は、p−AlGaInP系列の化合物半導体よりなることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記第1下部クラッド層及び第2下部クラッド層は、n−AlGaInP系列の化合物半導体よりなることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記活性層と上部クラッド層との間、及び前記活性層と第1下部クラッド層との間には、各々上部導波層及び下部導波層がさらに形成されることを特徴とする請求項1に記載の半導体レーザーダイオード。
- 前記上部導波層及び下部導波層は、各々p−AlGaInP及びn−AlGaInP系列の化合物半導体よりなることを特徴とする請求項8に記載の半導体レーザーダイオード。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040035864A KR20050110902A (ko) | 2004-05-20 | 2004-05-20 | 반도체 레이저 다이오드 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2005333129A true JP2005333129A (ja) | 2005-12-02 |
Family
ID=35375109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005137574A Pending JP2005333129A (ja) | 2004-05-20 | 2005-05-10 | 半導体レーザーダイオード |
Country Status (4)
Country | Link |
---|---|
US (1) | US7263114B2 (ja) |
JP (1) | JP2005333129A (ja) |
KR (1) | KR20050110902A (ja) |
CN (1) | CN100463314C (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7781777B2 (en) * | 2004-03-08 | 2010-08-24 | Showa Denko K.K. | Pn junction type group III nitride semiconductor light-emitting device |
US8183498B2 (en) * | 2006-05-01 | 2012-05-22 | Tcz, Llc | Systems and method for optimization of laser beam spatial intensity profile |
US7830938B2 (en) * | 2008-12-15 | 2010-11-09 | Jds Uniphase Corporation | Laser diode |
JP2010278136A (ja) * | 2009-05-27 | 2010-12-09 | Sony Corp | 半導体レーザ |
CN104466675B (zh) * | 2014-12-15 | 2017-08-29 | 中国电子科技集团公司第十三研究所 | 窄发散角脊波导半导体激光器 |
DE102015119226A1 (de) * | 2015-11-09 | 2017-05-11 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
US11025031B2 (en) * | 2016-11-29 | 2021-06-01 | Leonardo Electronics Us Inc. | Dual junction fiber-coupled laser diode and related methods |
TWI721167B (zh) * | 2017-05-11 | 2021-03-11 | 光環科技股份有限公司 | 具小垂直發射角的邊射型雷射元件 |
CN112290382B (zh) * | 2020-12-23 | 2021-04-02 | 武汉敏芯半导体股份有限公司 | 一种半导体激光器及其制作方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07170011A (ja) * | 1993-10-22 | 1995-07-04 | Sharp Corp | 半導体レーザ素子およびその自励発振強度の調整方法 |
JPH1126868A (ja) * | 1997-07-04 | 1999-01-29 | Sony Corp | 半導体レーザおよびその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5811839A (en) * | 1994-09-01 | 1998-09-22 | Mitsubishi Chemical Corporation | Semiconductor light-emitting devices |
US6072817A (en) * | 1995-03-31 | 2000-06-06 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device and optical disk apparatus using the same |
JP3045104B2 (ja) * | 1997-05-21 | 2000-05-29 | 日本電気株式会社 | 半導体レーザ |
JPH1187831A (ja) * | 1997-09-02 | 1999-03-30 | Sony Corp | 半導体発光素子、光ピックアップ装置ならびに光記録および/または再生装置 |
EP0908988A3 (en) * | 1997-10-06 | 2001-10-17 | Sharp Kabushiki Kaisha | Light-emitting device and fabricating method thereof |
US6614821B1 (en) * | 1999-08-04 | 2003-09-02 | Ricoh Company, Ltd. | Laser diode and semiconductor light-emitting device producing visible-wavelength radiation |
US7801194B2 (en) * | 2002-07-01 | 2010-09-21 | Sharp Kabushiki Kaisha | Semiconductor laser device and optical disk unit using the same |
JP4089446B2 (ja) * | 2003-01-23 | 2008-05-28 | ソニー株式会社 | 半導体レーザ素子の製造方法 |
JP3926313B2 (ja) * | 2003-09-26 | 2007-06-06 | シャープ株式会社 | 半導体レーザおよびその製造方法 |
-
2004
- 2004-05-20 KR KR1020040035864A patent/KR20050110902A/ko not_active Application Discontinuation
- 2004-11-17 US US10/989,434 patent/US7263114B2/en not_active Expired - Fee Related
- 2004-12-24 CN CNB2004101049172A patent/CN100463314C/zh not_active Expired - Fee Related
-
2005
- 2005-05-10 JP JP2005137574A patent/JP2005333129A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07170011A (ja) * | 1993-10-22 | 1995-07-04 | Sharp Corp | 半導体レーザ素子およびその自励発振強度の調整方法 |
JPH1126868A (ja) * | 1997-07-04 | 1999-01-29 | Sony Corp | 半導体レーザおよびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20050110902A (ko) | 2005-11-24 |
US7263114B2 (en) | 2007-08-28 |
US20050259707A1 (en) | 2005-11-24 |
CN1700542A (zh) | 2005-11-23 |
CN100463314C (zh) | 2009-02-18 |
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