JP2005260138A - Board device - Google Patents

Board device Download PDF

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Publication number
JP2005260138A
JP2005260138A JP2004072567A JP2004072567A JP2005260138A JP 2005260138 A JP2005260138 A JP 2005260138A JP 2004072567 A JP2004072567 A JP 2004072567A JP 2004072567 A JP2004072567 A JP 2004072567A JP 2005260138 A JP2005260138 A JP 2005260138A
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Prior art keywords
substrate
electrode
rigid
protruding electrode
adhesive resin
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JP2004072567A
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Japanese (ja)
Inventor
Junichi Nishida
純一 西田
Toshifumi Morita
敏文 森田
Motonori Shoda
元紀 庄田
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Priority to JP2004072567A priority Critical patent/JP2005260138A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that the reliability of connection between wired rigid boards is not constant when the boards are connected electrically to each other. <P>SOLUTION: The rigid board 21 on which a semiconductor integrated circuit 23 is mounted, and a rigid board 26 on which a semiconductor integrated circuit 28 is mounted, are stuck together in face to face with each other, and are connected electrically via connection 32 to form a board device. The board device has a protrusion electrode 25 formed on the rigid board 21, and an electrode 30 formed at a specific position on the rigid board 26 so as to be faced to the projecting electrode 25. A thermosetting adhesive resin 31 is inserted between the electrodes 25, 30, and is heated and pressurized to glue the rigid boards 21, 26 together. In this manner, the reliability of connection between the boards 21, 26 is improved. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、半導体集積回路等の電子回路を実装した基板装置に関するものである。   The present invention relates to a substrate device on which an electronic circuit such as a semiconductor integrated circuit is mounted.

以下、従来の基板装置について説明する。図6において、1は凹部(キャビティ)2が形成されたリジット基板であり、この凹部2内には半導体集積回路3が装着されている。そして、この凹部2の外周を形成する凸部4には電極5が形成されている。同様に、このリジット基板1に対向して貼り合されているリジット基板6にも、凹部7が形成されており、この凹部7内には半導体集積回路8が装着されている。そして、この凹部7の外周を形成する凸部9には電極10が形成されている。図7は、図6の基板1側を下面からみた図である。   Hereinafter, a conventional substrate apparatus will be described. In FIG. 6, reference numeral 1 denotes a rigid substrate in which a recess (cavity) 2 is formed, and a semiconductor integrated circuit 3 is mounted in the recess 2. And the electrode 5 is formed in the convex part 4 which forms the outer periphery of this recessed part 2. As shown in FIG. Similarly, a recess 7 is also formed in the rigid substrate 6 bonded to the rigid substrate 1, and a semiconductor integrated circuit 8 is mounted in the recess 7. And the electrode 10 is formed in the convex part 9 which forms the outer periphery of this recessed part 7. FIG. FIG. 7 is a view of the substrate 1 side of FIG. 6 as viewed from below.

そして、この電極5と電極10とは異方性導電膜11で電気的・機械的に接続されて、半導体集積回路3と半導体集積回路8との間の信号のやりとりを行っていた。   The electrodes 5 and 10 are electrically and mechanically connected by an anisotropic conductive film 11 to exchange signals between the semiconductor integrated circuit 3 and the semiconductor integrated circuit 8.

なお、この出願の発明に関連する先行技術文献情報としては、例えば、特許文献1が知られている。
特開平11−284030号公報
As prior art document information related to the invention of this application, for example, Patent Document 1 is known.
JP-A-11-284030

しかしながら、特許文献1の技術は、接続用電極上の異方性導電膜にあらかじめ凹部を
もくける必要があり、工程が追加され、タクトおよびコストの面で不利であった。また、
凹部の位置および高さ制御にも高度な実装精度が要求され、実用面で困難な問題があった。
However, the technique of Patent Document 1 is disadvantageous in terms of tact and cost because it is necessary to provide a recess in the anisotropic conductive film on the connection electrode in advance, and a process is added. Also,
A high degree of mounting accuracy is also required to control the position and height of the recess, and there is a problem in practical use.

基板同士を電気的に接続する際に、接続信頼性を高めるために導電性接着層(異方性導電膜や異方性導電ペースト)を厚くすると、接続の際に異方性導電膜自体が押し圧に対して反発力を持ち、過剰な押し圧力が必要となる。また、場合によっては圧力不足が発生し、接続不良(オープン/高抵抗)が発生する。さらに余分な異方性導電膜が基板の端面からはみ出し、基板端面を汚染する恐れがある。一方、導電層が薄くなると、導電膜不足による基板同士の接着力不足による接続不良が生じ信頼性が低下する。   If the conductive adhesive layer (anisotropic conductive film or anisotropic conductive paste) is thickened to increase the connection reliability when the substrates are electrically connected to each other, the anisotropic conductive film itself is connected at the time of connection. It has a repulsive force against the pressing force, and an excessive pressing force is required. In some cases, pressure shortage occurs, resulting in poor connection (open / high resistance). Furthermore, an excess anisotropic conductive film may protrude from the end face of the substrate and contaminate the end face of the substrate. On the other hand, when the conductive layer becomes thin, poor connection occurs due to insufficient adhesion between the substrates due to insufficient conductive film, and reliability decreases.

そこで本発明は、安価で、より実用的で信頼性の高い基板接続装置を提供することを目的としたものである。   Accordingly, an object of the present invention is to provide an inexpensive, more practical and highly reliable substrate connecting apparatus.

この目的を達成するために本発明の基板装置の接続部は、少なくとも一方のリジット基板に設けられた突起電極と、この突起電極に対向して他方のリジット基板の対応する位置に設けられた電極とを有し、前記電極間に熱硬化性接着樹脂を挿入して、加熱するとともに圧力を加えて前記リジット基板同士を接着したものである。これにより、基板装置の狭ピッチ化が可能となるので、基板装置の小型化が実現できる。   In order to achieve this object, the connecting portion of the substrate device of the present invention includes a protruding electrode provided on at least one rigid substrate and an electrode provided at a corresponding position on the other rigid substrate so as to face the protruding electrode. The rigid substrates are bonded to each other by inserting a thermosetting adhesive resin between the electrodes, heating and applying pressure. As a result, the pitch of the substrate device can be reduced, so that the substrate device can be reduced in size.

本発明の請求項1に記載の発明は、第1の回路が形成された第1のリジット基板と、第2の回路が形成された第2のリジット基板とが対向して設けられるとともに、前記第1と第2のリジッド基板同士を接続部を介して電気的に接続された基板装置であって、前記接続部は、少なくとも一方のリジット基板に設けられた突起電極と、この突起電極に対向して他方のリジット基板の対応する位置に設けられた電極とを有し、前記電極間に熱硬化性接着樹脂を挿入して、加熱するとともに圧力を加えて前記リジット基板同士を接着した基板装置であり、電極間を加熱して圧力を加えることによる接着であり、固体同士の接触接合により接続されるものであるので、従来のように半田が溶融して液状となって隣の電極と接続することはない。従って、電極間の距離を小さくすることができ、電極の狭ピッチ化が実現できる。即ち、基板装置の小型化を図ることができる。   According to a first aspect of the present invention, a first rigid substrate on which a first circuit is formed and a second rigid substrate on which a second circuit is formed are provided to face each other, and A substrate device in which first and second rigid substrates are electrically connected to each other via a connecting portion, wherein the connecting portion is opposed to the protruding electrode provided on at least one rigid substrate. And an electrode provided at a corresponding position of the other rigid substrate, and a thermosetting adhesive resin is inserted between the electrodes, heated, and pressure is applied to bond the rigid substrates together It is adhesion by heating and applying pressure between the electrodes, and it is connected by contact bonding between solids, so that the solder melts and becomes liquid as in the past and connects to the adjacent electrode Never do. Therefore, the distance between the electrodes can be reduced, and the pitch of the electrodes can be reduced. That is, the substrate device can be downsized.

請求項2に記載の発明は、熱硬化性接着樹脂として、異方性導電膜を用いた請求項1に記載の基板装置であり、異方性導電膜を用いているので、導電粒子の働きで電極間の接続が確実にできる。また、異方性導電膜(フィルム状)を用いることにより、作業が容易となる。   Invention of Claim 2 is a board | substrate apparatus of Claim 1 which used the anisotropic conductive film as a thermosetting adhesive resin, and since the anisotropic conductive film is used, the function of conductive particles This ensures connection between the electrodes. Moreover, work becomes easy by using an anisotropic conductive film (film shape).

請求項3に記載の発明は、熱硬化性接着樹脂として、異方性導電ペーストを用いた請求項1に記載の基板装置であり、異方性導電ペーストを用いているので、導電粒子の働きで電極間の接続が確実にできる。また、異方性導電ペーストを用いているので、印刷が可能となり、製造工数が削減できる。   Invention of Claim 3 is a board | substrate apparatus of Claim 1 which used anisotropic conductive paste as a thermosetting adhesive resin, and since anisotropic conductive paste is used, the function of conductive particles This ensures connection between the electrodes. Further, since the anisotropic conductive paste is used, printing becomes possible and the number of manufacturing steps can be reduced.

請求項4に記載の発明は、接続部を形成する突起電極の初期の高さは、接続部を形成する電極敷設面の表面粗さの和に10μmを加えた値より大くした請求項1に記載の基板装置であり、例え、電極敷設面に反りやうねりがあっても、確実に電極同士が接続される。   According to a fourth aspect of the present invention, the initial height of the protruding electrode forming the connecting portion is set to be larger than a value obtained by adding 10 μm to the sum of the surface roughness of the electrode laying surface forming the connecting portion. The electrodes are surely connected to each other even if the electrode laying surface is warped or wavy.

請求項5に記載の発明の突起電極は、一定の圧力を加えることで変形する請求項4に記載の基板装置であり、例え、電極敷設面に反りやうねりがあっても、一定の圧力で電極が変形するので、全ての電極同士を確実に接続させることができ、接続不良を生ずることは無い。   The protruding electrode of the invention described in claim 5 is the substrate device according to claim 4 which is deformed by applying a constant pressure. For example, even if the electrode laying surface is warped or wavy, the protruding electrode is maintained at a constant pressure. Since the electrodes are deformed, all the electrodes can be reliably connected to each other, and connection failure does not occur.

請求項6に記載の発明は、熱硬化性接着樹脂の初期の厚みは、圧接後の突起電極の高さに10μmを加えた値より大きく、圧接後の突起電極の高さに30μmを加えた値より小さい値とした請求項1に記載の基板装置であり、例え、電極敷設面に反りやうねりがあっても、熱硬化性接着樹脂で確実に接着させることができ、接触不良や接続強度の低下はない。また、熱硬化性接着樹脂の過多によるはみ出し等の不具合もない。   In the invention described in claim 6, the initial thickness of the thermosetting adhesive resin is larger than the value obtained by adding 10 μm to the height of the bump electrode after pressure contact, and 30 μm is added to the height of the bump electrode after pressure contact. The substrate device according to claim 1, wherein the substrate device is smaller than the value, and even if there is warping or waviness on the electrode laying surface, it can be securely bonded with a thermosetting adhesive resin, resulting in poor contact and connection strength. There is no decline. In addition, there is no problem such as protrusion due to excessive thermosetting adhesive resin.

請求項7に記載の発明は、少なくとも第1のリジット基板と第2のリジット基板の何れか一方に凹部を形成するとともに、この凹部内に半導体集積回路を装着し、前記凹部の外周を形成する凸部に接続部が設けられた請求項1に記載の基板装置であり、半導体集積回路の端子数が多くとも、接続の狭ピッチ化が図れるので、小型の基板装置が実現できる。   According to a seventh aspect of the present invention, a recess is formed in at least one of the first rigid substrate and the second rigid substrate, and a semiconductor integrated circuit is mounted in the recess to form an outer periphery of the recess. 2. The substrate device according to claim 1, wherein the connecting portion is provided on the convex portion, and the connection pitch can be narrowed even if the number of terminals of the semiconductor integrated circuit is large, so that a small substrate device can be realized.

以上のように本発明によれば、基板の反りやうねりに対して、適切な高さの突起電極を選択し、また、電極間に適切な厚みの導電性接着樹脂を選択し、熱および圧力を加えることで接着するものであり、基板同士の接続の信頼性を高め、また基板端面に不要な導電膜がはみ出ることがない。従って、基板装置の電極の狭ピッチ化、小型化が可能で、しかも、高信頼性の接続を得ることができ、また基板端面への導電膜の余分なはみ出しによる汚染も無い装置を提供することができる。   As described above, according to the present invention, a protruding electrode having an appropriate height is selected with respect to warping and undulation of the substrate, and a conductive adhesive resin having an appropriate thickness is selected between the electrodes, and heat and pressure are selected. Is added to increase the reliability of connection between the substrates, and an unnecessary conductive film does not protrude from the end surfaces of the substrates. Accordingly, it is possible to reduce the pitch and size of electrodes of a substrate device, and to obtain a device that can obtain a highly reliable connection and that is not contaminated by excessive protrusion of the conductive film to the end surface of the substrate. Can do.

以下、本発明の一実施の形態について、図面を用いて説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

図1は、本発明の実施例1における基板装置の断面図である。図1において、21は一方のリジット基板であり、セラミック多層基板から構成されている。このリジッド基板21の外周にさらにセラミック多層基板を積層して凸部24を形成している。そのため、リジッド基板21の中央部には、凹部22が形成される。この凹部22内に半導体集積回路(IC)23が装着されており、凸部24に突起電極25が設けられ、半導体集積回路23の端子からリジット基板21と凸部24を介して配線パターンとインナービアで接続されている。   FIG. 1 is a cross-sectional view of a substrate device in Embodiment 1 of the present invention. In FIG. 1, reference numeral 21 denotes one rigid substrate, which is composed of a ceramic multilayer substrate. A convex portion 24 is formed by further laminating a ceramic multilayer substrate on the outer periphery of the rigid substrate 21. Therefore, a recess 22 is formed in the central portion of the rigid substrate 21. A semiconductor integrated circuit (IC) 23 is mounted in the concave portion 22, a protruding electrode 25 is provided on the convex portion 24, and a wiring pattern and an inner side are connected from a terminal of the semiconductor integrated circuit 23 through the rigid substrate 21 and the convex portion 24. Connected with vias.

また、同様に、26は他方のリジット基板であり、このリジット基板26が積層されて中央部に凹部27が形成されている。そして、この凹部27内に半導体集積回路28が装着されている。29は、凹部27の外周を形成する凸部であり、この凸部29に平板の電極(受け電極)30が設けられ、半導体集積回路28の端子からリジット基板26と凸部29を介して配線パターンとインナービアで接続されている。   Similarly, reference numeral 26 denotes the other rigid substrate, and this rigid substrate 26 is laminated to form a recess 27 in the central portion. A semiconductor integrated circuit 28 is mounted in the recess 27. Reference numeral 29 denotes a convex portion that forms the outer periphery of the concave portion 27, and a flat electrode (receiving electrode) 30 is provided on the convex portion 29, and wiring is provided from the terminal of the semiconductor integrated circuit 28 through the rigid substrate 26 and the convex portion 29. It is connected to the pattern with an inner via.

31は、熱硬化性を持つ導電接着樹脂であり、突起電極25と電極30とで接続部32を形成し、突起電極25と電極30とを接続している。また、この接続部32で突起電極25と電極30とが電気的・機械的に接続されることにより、凹部22,27同士が合わさって閉空間(キャビティ)33を形成し、この閉空間33の中に半導体集積回路23,28が実装される。そして、この半導体集積回路23,28の端子信号はリジット基板21,26や凸部24,29内の配線パターンや層間を接続するインナービアで接続部32に導かれ接続される。   31 is a thermosetting conductive adhesive resin, and the protruding electrode 25 and the electrode 30 form a connection portion 32 to connect the protruding electrode 25 and the electrode 30. Further, the protruding electrode 25 and the electrode 30 are electrically and mechanically connected at the connection portion 32, so that the concave portions 22 and 27 are joined together to form a closed space (cavity) 33. Semiconductor integrated circuits 23 and 28 are mounted therein. The terminal signals of the semiconductor integrated circuits 23 and 28 are guided to and connected to the connection portions 32 by the wiring patterns in the rigid substrates 21 and 26 and the convex portions 24 and 29 and the inner vias connecting the layers.

次に、接続部32について、図2に基づいて説明する。図2において、突起電極25は金(Au)、銀(Ag)等の一定の圧力で変形し易い材料を使用している。また、この突起電極25は、端子径を500μm以下の小径にし、一定の圧力を加わえて変形させることにより、対向して設けられた電極30と接続させるようにするためである。
本実施の形態では、熱硬化性を持つ導電接着樹脂31として、金、銀、銅等の導電粒子を接着樹脂内に分散させてフィルム状にした異方性導電膜(ACF)31aを用いている。これは、導電粒子を有しているので、電極25,30間の電気的な接続を確実にすることができる。また、異方性導電膜31aはフィルム状であり作業が容易となる。
また、この熱硬化性接着樹脂31として異方性導電ペースト(ACP)31bを用いることもできる。この場合も導電粒子を有しているので、電極25,30間の電気的な接続が確実にできる。また、異方性導電ペースト31bはペースト状であり、印刷が可能となるので製造工数が削減できる。
Next, the connection part 32 is demonstrated based on FIG. In FIG. 2, the protruding electrode 25 is made of a material that is easily deformed by a certain pressure, such as gold (Au) or silver (Ag). Further, the protruding electrode 25 has a terminal diameter of 500 μm or less, and is deformed by applying a certain pressure, so that the protruding electrode 25 is connected to the opposing electrode 30.
In this embodiment, an anisotropic conductive film (ACF) 31a in which conductive particles such as gold, silver, and copper are dispersed in an adhesive resin to form a film is used as the thermosetting conductive adhesive resin 31. Yes. Since this has conductive particles, the electrical connection between the electrodes 25 and 30 can be ensured. Further, the anisotropic conductive film 31a is in the form of a film, and the work becomes easy.
An anisotropic conductive paste (ACP) 31b can also be used as the thermosetting adhesive resin 31. Also in this case, since the conductive particles are included, the electrical connection between the electrodes 25 and 30 can be ensured. Further, since the anisotropic conductive paste 31b is in a paste form and can be printed, the number of manufacturing steps can be reduced.

なお、この熱硬化性接着樹脂31として、導電粒子を含まないフィルム状のNCFやペースト状のNCPを用いることもできる。この場合は、導電粒子を含まないので更なる狭ピッチ化を図ることができる。本実施の形態では、異方性導電膜31aを用いて隣の電極との距離37を100μmに設定している。しかし、異方性導電膜31aや異方性導電ペースト31bでは、隣の電極との距離37を60μm程度まで狭ピッチに設定することも可能である。また、導電性粒子を含まないNCFやNCPを用いれば、隣の電極との距離37を更に40μm程度まで狭ピッチに設定することが可能であり、更なる小型化が実現できる。   The thermosetting adhesive resin 31 may be a film-like NCF or a paste-like NCP that does not contain conductive particles. In this case, since the conductive particles are not included, it is possible to further reduce the pitch. In the present embodiment, the distance 37 between adjacent electrodes is set to 100 μm using the anisotropic conductive film 31a. However, in the anisotropic conductive film 31a and the anisotropic conductive paste 31b, the distance 37 between adjacent electrodes can be set to a narrow pitch of about 60 μm. If NCF or NCP that does not contain conductive particles is used, the distance 37 between adjacent electrodes can be set to a narrow pitch of about 40 μm, and further miniaturization can be realized.

図3は、突起電極25および電極30の接着時における突起電極25、電極30および熱硬化性接着樹脂31に加える温度と圧力の関係図である。横軸41は時間であり、左側の縦軸42は温度、右側の縦軸45は圧力である。そして、43は温度曲線であり、44は圧力の変化を示す曲線である。   FIG. 3 is a relationship diagram of temperature and pressure applied to the protruding electrode 25, the electrode 30, and the thermosetting adhesive resin 31 when the protruding electrode 25 and the electrode 30 are bonded. The horizontal axis 41 is time, the left vertical axis 42 is temperature, and the right vertical axis 45 is pressure. Reference numeral 43 is a temperature curve, and 44 is a curve showing a change in pressure.

加熱する温度は、60℃から開始し、30秒かけて200℃にする(43a)。次に、30秒間この状態を保ち(43b)、加熱を終える。その後は室温まで自然冷却する。また、そのときの圧力は点線44で示すように、加圧は一気(約2〜3秒)に75g(1電極当り)に加圧して(44a)、この状態で約80〜90秒保ち(44b)、その後、加圧を終える(44c)。 なお、本実施の形態では、1電極あたり75gの圧力としたが、これは一例であり、1電極あたり50gから150gの圧力であれば良好な接続ができる。   The heating temperature starts at 60 ° C. and reaches 200 ° C. over 30 seconds (43a). Next, this state is maintained for 30 seconds (43b), and the heating is finished. After that, naturally cool to room temperature. Further, as indicated by the dotted line 44, the pressure at that time is pressurized to 75 g (per electrode) at a stroke (about 2 to 3 seconds) (44a) and kept in this state for about 80 to 90 seconds ( 44b), and then pressurization is terminated (44c). In this embodiment, the pressure is 75 g per electrode. However, this is only an example, and a good connection can be achieved if the pressure is 50 g to 150 g per electrode.

凹部24や29は、セラミック多層基板を焼成して作成するので、焼成後に反りやうねりが生じる。図4は、凸部24や29に形成された電極敷設面35,36が焼成時に反りやうねりが生じたときの電極敷設面35,36の表面粗さ度合(平坦度)と電極(この場合は突起電極25)との関係、および熱硬化性接着樹脂31との関係を示している。   Since the recesses 24 and 29 are formed by firing a ceramic multilayer substrate, warping and undulation occur after firing. FIG. 4 shows the degree of surface roughness (flatness) of the electrode laying surfaces 35 and 36 when the electrode laying surfaces 35 and 36 formed on the protrusions 24 and 29 are warped or swelled during firing, and the electrodes (in this case). Shows the relationship with the protruding electrode 25) and the relationship with the thermosetting adhesive resin 31.

51を突起電極25の高さH1とし、52、53を夫々電極敷設面35,36の表面粗さの最大値Ry1、Ry2として(数1)に示す関係が成り立つようにすることが重要である。   It is important that 51 be the height H1 of the protruding electrode 25 and 52 and 53 be the maximum surface roughness values Ry1 and Ry2 of the electrode laying surfaces 35 and 36, respectively, so that the relationship shown in (Equation 1) holds. .

Figure 2005260138
Figure 2005260138

もし、突起電極の高さがそれぞれのリジット基板の表面粗さの最大値以下であれば、両基板の接続端子同士は接触出来ないので、接続不良となる。また、最大値より高い場合では、端子30に対して突起電極25が、押し込まれていない状態がある。その場合、突起電極25が樹脂31の膜を突き破れず、界面に薄い樹脂の膜が介在し、信頼性の低下が発生する。従って、接続部32を形成する初期の突起電極25の高さH1が、(数1)の関係を満たすときは、リジット基板21,26の電極敷設面35,36に反りやうねりがあったとしても、確実に電極25,30同士が接続され、突起電極の十分な押し込みが得られ、理想的な圧接状態を得ることができる。
また、54は熱硬化性接着樹脂31の初期の厚みTであり、図2に示すように圧接後の突起電極25の高さH2と(数2)に示す関係が成り立つようにすることが重要である。
If the height of the protruding electrode is less than or equal to the maximum value of the surface roughness of each rigid substrate, the connection terminals of both substrates cannot contact each other, resulting in poor connection. When the value is higher than the maximum value, the protruding electrode 25 may not be pushed into the terminal 30. In this case, the protruding electrode 25 does not break through the resin 31 film, and a thin resin film is interposed at the interface, resulting in a decrease in reliability. Therefore, when the height H1 of the initial protruding electrode 25 forming the connection portion 32 satisfies the relationship of (Equation 1), it is assumed that the electrode laying surfaces 35 and 36 of the rigid substrates 21 and 26 have warpage and undulation. However, the electrodes 25 and 30 are reliably connected to each other, and the protrusion electrode can be sufficiently pushed in, so that an ideal pressure contact state can be obtained.
Reference numeral 54 denotes an initial thickness T of the thermosetting adhesive resin 31, and it is important to satisfy the relationship shown in (Expression 2) with the height H2 of the protruding electrode 25 after press contact as shown in FIG. It is.

Figure 2005260138
Figure 2005260138

もし、Tが10umより薄い場合には、基板と導電膜との間で樹脂不足による接着力が低下して接続の導通不良(オープン/高抵抗)が発生する。また、Tが30umより厚い場合には、導電膜自体が抵抗となり圧力不足による導通不良、また、樹脂の基板端面へのはみ出しによる汚染が発生する。
従って、熱硬化性接着樹脂31の初期の厚みTが、(数2)の関係を満たすときは、例え、敷設電極面35,36に反りやうねりがあったとしても、熱硬化性接着樹脂31で確実に接着することができる。従って、接触不良や接続強度の低下はない。また、熱硬化性接着樹脂31の過多による圧力不足やはみ出し等の不具合もない。
If T is thinner than 10 μm, the adhesive force due to insufficient resin is reduced between the substrate and the conductive film, resulting in poor connection conduction (open / high resistance). On the other hand, when T is thicker than 30 μm, the conductive film itself becomes a resistance, resulting in poor conduction due to insufficient pressure, and contamination due to protrusion of the resin to the end face of the substrate.
Therefore, when the initial thickness T of the thermosetting adhesive resin 31 satisfies the relationship of (Equation 2), even if the laying electrode surfaces 35 and 36 are warped or wavy, the thermosetting adhesive resin 31 is used. Can be securely bonded. Therefore, there is no contact failure or connection strength reduction. In addition, there is no problem such as insufficient pressure or protrusion due to excessive thermosetting adhesive resin 31.

また、図1に示したように、本実施の形態における基板装置は、リジット基板21とリジット基板26の双方に凹部22,27を形成し、この凹部22,27で形成される閉空間33内に半導体集積回路23,28を夫々装着している。また、凹部22,27の外周を形成する凸部24,29に接続部32を設け、突起電極25と電極30とを電気的に接続するとともに、熱硬化性接続樹脂31で夫々貼り合せて基板装置を構成している。このように構成することにより、半導体集積回路23,28の端子数が多くなっても、接続の狭ピッチ化を図ることができるので、小型の基板装置を実現することができる。   As shown in FIG. 1, the substrate apparatus according to the present embodiment forms recesses 22 and 27 in both the rigid substrate 21 and the rigid substrate 26, and the inside of the closed space 33 formed by the recesses 22 and 27. In addition, the semiconductor integrated circuits 23 and 28 are mounted, respectively. Further, the connection portions 32 are provided on the projections 24 and 29 that form the outer circumferences of the recesses 22 and 27, and the protruding electrodes 25 and the electrodes 30 are electrically connected and bonded together with a thermosetting connection resin 31, respectively. Configure the device. With this configuration, even when the number of terminals of the semiconductor integrated circuits 23 and 28 is increased, the connection pitch can be reduced, so that a small substrate device can be realized.

本発明にかかる基板装置は、狭ピッチ接続が可能となるので、半導体集積回路を内臓したモジュール部品等の小型化に特に有用である。   Since the substrate device according to the present invention can be connected at a narrow pitch, it is particularly useful for downsizing a module component or the like incorporating a semiconductor integrated circuit.

本発明の一実施の形態における基板装置の断面図Sectional drawing of the board | substrate apparatus in one embodiment of this invention 同、要部断面図Same part cross section 同、温度と圧力の関係図Same figure of temperature and pressure 同、電極と平坦度の関係を示した断面図Cross section showing the relationship between electrode and flatness 同、電極と熱硬化性接着樹脂の関係を示した断面図Cross section showing the relationship between electrode and thermosetting adhesive resin 従来の基板装置の断面図Sectional view of a conventional substrate device 同、平面図Same as above, top view

符号の説明Explanation of symbols

21 リジット基板
23 半導体集積回路
25 突起電極
26 リジット基板
28 半導体集積回路
30 電極
31 異方性導電樹脂
32 接続部


DESCRIPTION OF SYMBOLS 21 Rigid board | substrate 23 Semiconductor integrated circuit 25 Projection electrode 26 Rigid board | substrate 28 Semiconductor integrated circuit 30 Electrode 31 Anisotropic conductive resin 32 Connection part


Claims (7)

第1の回路が形成された第1のリジット基板と、第2の回路が形成された第2のリジット基板とが対向して設けられるとともに、前記第1と第2のリジッド基板同士を接続部を介して電気的に接続された基板装置であって、前記接続部は、少なくとも一方のリジット基板に設けられた突起電極と、この突起電極に対向して他方のリジット基板の対応する位置に設けられた電極とを有し、前記電極間に熱硬化性接着樹脂を挿入して、加熱するとともに圧力を加えて前記リジット基板同士を接着した基板装置。 A first rigid substrate on which a first circuit is formed and a second rigid substrate on which a second circuit is formed are provided to face each other, and the first and second rigid substrates are connected to each other. The connection device is provided with a protruding electrode provided on at least one rigid substrate and a corresponding position on the other rigid substrate facing the protruding electrode. A substrate device in which the rigid substrates are bonded to each other by inserting a thermosetting adhesive resin between the electrodes, heating and applying pressure. 熱硬化性接着樹脂として、異方性導電膜を用いた請求項1に記載の基板装置。 The substrate device according to claim 1, wherein an anisotropic conductive film is used as the thermosetting adhesive resin. 熱硬化性接着樹脂として、異方性導電ペーストを用いた請求項1に記載の基板装置。 The substrate apparatus according to claim 1, wherein an anisotropic conductive paste is used as the thermosetting adhesive resin. 接続部を形成する突起電極の初期の高さは、接続部を形成する電極載置面の表面粗さの和に10μmを加えた値より大きくした請求項1に記載の基板装置。 The substrate apparatus according to claim 1, wherein the initial height of the protruding electrode forming the connection portion is larger than a value obtained by adding 10 μm to the sum of the surface roughness of the electrode mounting surface forming the connection portion. 突起電極は、一定の圧力を加えることで変形する請求項4に記載の基板装置。 The substrate device according to claim 4, wherein the protruding electrode is deformed by applying a constant pressure. 熱硬化性接着樹脂の初期の厚みは、圧接後の突起電極の高さに10μmを加えた値より大きく、突起電極の高さに30μmを加えた値より小さい値とした請求項1に記載の基板装置。 The initial thickness of the thermosetting adhesive resin is set to a value larger than a value obtained by adding 10 μm to the height of the protruding electrode after press contact and smaller than a value obtained by adding 30 μm to the height of the protruding electrode. Board device. 少なくとも第1のリジット基板と第2のリジット基板の何れか一方の面に凹部を形成するとともに、この凹部内に半導体集積回路を装着し、前記凹部の外周を形成する凸部に接続部が設けられた請求項1に記載の基板装置。 A concave portion is formed on at least one surface of the first rigid substrate and the second rigid substrate, a semiconductor integrated circuit is mounted in the concave portion, and a connecting portion is provided on the convex portion forming the outer periphery of the concave portion. The substrate device according to claim 1.
JP2004072567A 2004-03-15 2004-03-15 Board device Pending JP2005260138A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01139451U (en) * 1988-03-18 1989-09-22
JPH11326935A (en) * 1998-05-08 1999-11-26 Matsushita Electric Ind Co Ltd Anisotropic conductive film and its connection method
JP2000012770A (en) * 1998-06-18 2000-01-14 Sony Corp Semiconductor device and manufacture thereof
JP2001144431A (en) * 1999-11-12 2001-05-25 Sony Corp Method for connecting flexible substrate for wiring
JP2003262882A (en) * 2002-03-07 2003-09-19 Advanced Display Inc Connection structure of electrode, and liquid crystal display device using the connected structure

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01139451U (en) * 1988-03-18 1989-09-22
JPH11326935A (en) * 1998-05-08 1999-11-26 Matsushita Electric Ind Co Ltd Anisotropic conductive film and its connection method
JP2000012770A (en) * 1998-06-18 2000-01-14 Sony Corp Semiconductor device and manufacture thereof
JP2001144431A (en) * 1999-11-12 2001-05-25 Sony Corp Method for connecting flexible substrate for wiring
JP2003262882A (en) * 2002-03-07 2003-09-19 Advanced Display Inc Connection structure of electrode, and liquid crystal display device using the connected structure

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