JP2003262882A - Connection structure of electrode, and liquid crystal display device using the connected structure - Google Patents

Connection structure of electrode, and liquid crystal display device using the connected structure

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Publication number
JP2003262882A
JP2003262882A JP2002061869A JP2002061869A JP2003262882A JP 2003262882 A JP2003262882 A JP 2003262882A JP 2002061869 A JP2002061869 A JP 2002061869A JP 2002061869 A JP2002061869 A JP 2002061869A JP 2003262882 A JP2003262882 A JP 2003262882A
Authority
JP
Japan
Prior art keywords
electrode
connection structure
metal
liquid crystal
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002061869A
Other languages
Japanese (ja)
Inventor
Hiroshi Ueda
上田  宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Display Inc
Original Assignee
Advanced Display Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Display Inc filed Critical Advanced Display Inc
Priority to JP2002061869A priority Critical patent/JP2003262882A/en
Publication of JP2003262882A publication Critical patent/JP2003262882A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide the connection structure of an electrode by which reliable conduction is obtained without deforming the electrode and shortcircuit never occurs between adjacent terminals though making of fine pitches of terminals is advanced. <P>SOLUTION: In the connection structure by which an adhesive is arranged between two insulated substrates having metallic electrodes provided on the surface of each and both of the metallic electrodes are position-adjusted and connected, the adhesive is nonconductive, and the surface of the metallic electrode of one insulated substrate of the two insulating substrates has a metallic projection part harder than the metallic electrode of the other insulating substrate formed by electrodeposition. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は電極の接続構造およ
び該接続構造を用いる液晶表示素子に関する。さらに詳
しくは、対向する位置に電極が設けられている二つの基
板間を電気的に接続する接続構造および該接続構造を用
いる液晶表示素子に関する。
TECHNICAL FIELD The present invention relates to an electrode connection structure and a liquid crystal display device using the connection structure. More specifically, the present invention relates to a connection structure for electrically connecting two substrates provided with electrodes at opposing positions, and a liquid crystal display element using the connection structure.

【0002】[0002]

【従来の技術】熱圧着による回路基板実装技術の例とし
て、液晶表示素子のICモジュールの実装技術があげら
れる。液晶表示素子は、2枚のガラス基板のあいだに液
晶を挟んだ液晶パネルに駆動回路が接続されている。一
般的にTFT液晶パネルモジュールの駆動回路は、TF
Tを駆動するためのLSIが搭載された回路基板である
テープ状のフィルムキャリア(TCP:Tape Carrier P
ackage)と、フィルムキャリアに電源や画像信号を送る
ための回路基板(PCB:Printed Circuit Board)と
から構成されている。
2. Description of the Related Art As an example of a circuit board mounting technique by thermocompression bonding, there is a mounting technique of an IC module of a liquid crystal display element. In the liquid crystal display element, a drive circuit is connected to a liquid crystal panel in which liquid crystal is sandwiched between two glass substrates. Generally, the driving circuit of the TFT liquid crystal panel module is TF
A tape-shaped film carrier (TCP: Tape Carrier P) which is a circuit board on which an LSI for driving the T is mounted.
ackage) and a circuit board (PCB: Printed Circuit Board) for sending power and image signals to the film carrier.

【0003】前記回路基板の接続方法として、導電粒子
を接着剤中に分散させた異方性導電膜(ACF:Anisot
oropic Conductive Film)を用いたものが広く知られて
いる。異方性導電膜を用いた接続方法は、ガラス基板お
よび回路基板のうち、いずれか一方に異方性導電膜を貼
り付け、他方をその上に位置決めをして重ね合わせした
のち、その上からツールを押し当てることにより、2つ
の基板の電極のあいだに導電粒子を挟み込むようにして
いる。これにより、この導電粒子を介して電気的に導通
が発現する。前記2つの基板の隣接する電極間は、導電
粒子が樹脂中に独立して存在するため、絶縁を保つこと
ができる。
As a method of connecting the circuit board, an anisotropic conductive film (ACF: Anisot) in which conductive particles are dispersed in an adhesive is used.
Those using oropic Conductive Film) are widely known. The connection method using the anisotropic conductive film is such that one of the glass substrate and the circuit board is attached with the anisotropic conductive film, and the other is positioned and superposed on the anisotropic conductive film. By pressing the tool, the conductive particles are sandwiched between the electrodes of the two substrates. As a result, electrical conduction is developed via the conductive particles. Since the conductive particles independently exist in the resin between the adjacent electrodes of the two substrates, insulation can be maintained.

【0004】つぎに図3に従来の技術である異方性導電
膜を用いた接続構造の断面を示す。表面上にイソジウム
錫酸化物(ITO)や酸化錫(SnO2)などからなる
透明電極52が形成されたガラス基板51と該ガラス基
板51に対向する回路基板53の表面に形成された金属
電極54とのあいだに、導電粒子56を接着剤55中に
分散させた異方性導電膜が挟まれている。対向する基板
51、53の電極52、54間に導電粒子56が挟まれ
ているため、導通を得ることができる。異方性導電膜に
用いられる接着剤55には、熱硬化性、熱可塑性または
紫外線硬化性の樹脂がある。熱硬化性または熱可塑性の
樹脂を用いる場合は回路基板53に押し当てるツールを
熱して基板の接続が行なわれる。異方性導電膜中の導電
粒子56は直径が3〜10μmであり、液晶表示素子の
場合、プラスチックの粒子の表面にNiめっきまたは該
Niめっきの表面上にAuめっきを施したものが用いら
れている。
Next, FIG. 3 shows a cross section of a connection structure using an anisotropic conductive film which is a conventional technique. A glass substrate 51 on the surface of which a transparent electrode 52 made of isodin tin oxide (ITO), tin oxide (SnO 2) or the like is formed, and a metal electrode 54 formed on the surface of a circuit substrate 53 facing the glass substrate 51. Between them, an anisotropic conductive film in which conductive particles 56 are dispersed in the adhesive 55 is sandwiched. Since the conductive particles 56 are sandwiched between the electrodes 52 and 54 of the substrates 51 and 53 facing each other, conduction can be obtained. The adhesive 55 used for the anisotropic conductive film includes a thermosetting resin, a thermoplastic resin, or an ultraviolet curable resin. When a thermosetting or thermoplastic resin is used, the tool pressed against the circuit board 53 is heated to connect the boards. The conductive particles 56 in the anisotropic conductive film have a diameter of 3 to 10 μm, and in the case of a liquid crystal display element, the surface of plastic particles is Ni-plated or the Ni-plated surface is Au-plated. ing.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記異
方性薄電膜を用いた接続構造において、隣接する端子間
に独立して存在するはずの導電粒子が製造誤差などで凝
集または連結することにより、電気的に短絡することが
ある。これは導電粒子径に対して端子間の間隔が大きい
場合、ほとんど問題にならないが、粒子径と隣接端子間
の距離によってはショートの発生率が増大する。たとえ
ば導電粒子の直径が5μmである場合、15μmよりも
端子間の間隔が小さくなると、ショートの発生率は無視
できない頻度で発生する。また、電気的接続の信頼性を
得るためには、回路基板の電極上に挟まれる導電粒子の
数は3〜5個以上必要であり、端子が微細ピッチ化が進
み、電極の面積が小さくなると、樹脂中に配合する導電
粒子の量を増やさなければならなくなる。しかしなが
ら、導電粒子の配合量を増やすと、導電粒子の凝集や連
結が多くなり隣接端子間のショートの発生率が増加す
る。このように、異方性導電膜を用いた接続構造は、微
細ピッチ化が進むと導通の信額性と端子間ショートの防
止を両立させることが困難になってくる。
However, in the connection structure using the anisotropic thin film, the conductive particles which should exist independently between the adjacent terminals are aggregated or connected due to manufacturing error or the like. , May be electrically short-circuited. This is not a problem when the distance between the terminals is large with respect to the conductive particle diameter, but the occurrence rate of short circuit increases depending on the particle diameter and the distance between the adjacent terminals. For example, when the diameter of the conductive particles is 5 μm and the distance between the terminals is smaller than 15 μm, the occurrence rate of short circuit occurs at a frequency that cannot be ignored. Further, in order to obtain the reliability of the electrical connection, the number of conductive particles sandwiched between the electrodes of the circuit board needs to be 3 to 5 or more, and when the fine pitch of the terminals is advanced and the area of the electrodes is reduced. Therefore, it becomes necessary to increase the amount of the conductive particles blended in the resin. However, when the blending amount of the conductive particles is increased, the aggregation and connection of the conductive particles are increased and the occurrence rate of short circuit between adjacent terminals is increased. As described above, in the connection structure using the anisotropic conductive film, it becomes difficult to achieve both the reliability of conduction and the prevention of short circuit between terminals as the pitch becomes finer.

【0006】これに対し、TAB面に所定の間隔をあけ
て形成され、かつ表面に凹凸を有する電極と液晶表示素
子の透明電極を硬化型接着剤により接合する接続構造が
ある(特開平11−52408号公報参照)。このTA
B電極の凸部分は加圧されることにより、透明電極に押
し当てられる。これにより、かかる接合構造では、異方
性導電膜を使用せずに、液晶表示素子の透明電極とTA
Bの電極との接続不良を低減させ、両電極の剥離抵抗値
を小さくしたTAB実装液晶表示素子を得ることができ
る。前記公報には、凹凸を形成する方法として、電極面
を紙やすりを用いて削る方法または凸部分を形成する方
法が記載されている。
On the other hand, there is a connection structure in which an electrode having irregularities on the TAB surface and a transparent electrode of a liquid crystal display element are bonded to each other by a curable adhesive. No. 52408). This TA
The convex portion of the B electrode is pressed against the transparent electrode by being pressed. As a result, in such a junction structure, the transparent electrode of the liquid crystal display element and the TA are not used without using the anisotropic conductive film.
It is possible to obtain a TAB-mounted liquid crystal display element in which the connection failure with the B electrode is reduced and the peeling resistance value of both electrodes is reduced. As a method for forming the unevenness, the publication describes a method of shaving the electrode surface with sandpaper or a method of forming a convex portion.

【0007】しかしながら、電極面を削る方法では、電
極を変形させやすい。また、凸部分を形成する方法とし
ては、明記されていないが、電極面に直接凸部を形成す
る方法であると考えられる。かかる凸部分を機械加工に
より形成する場合、電極を変形させやすいとともに、端
子の微細ピッチ化が進むと、凸部分を均一に形成するこ
とが難しくなるため、導通の信頼性が低下する。
However, the method of scraping the electrode surface easily deforms the electrode. Further, although the method of forming the convex portion is not specified, it is considered to be a method of directly forming the convex portion on the electrode surface. When such a convex portion is formed by machining, the electrodes are easily deformed, and if the fine pitch of the terminals progresses, it becomes difficult to form the convex portion uniformly, so that the reliability of conduction decreases.

【0008】本発明は、叙上の事情に鑑み、端子の微細
ピッチ化が進んでも、電極を変形させることなく、信頼
性の高い導通が得られ、かつ隣接端子間のショートが発
生しない電極の接続構造および該接続構造を用いる液晶
表示素子を提供することを目的とする。
In view of the above circumstances, the present invention provides an electrode having high reliability without deforming the electrode even if the pitch of the terminal is made finer and short circuit between adjacent terminals does not occur. An object is to provide a connection structure and a liquid crystal display device using the connection structure.

【0009】[0009]

【課題を解決するための手段】本発明の電極の接続構造
は、それぞれの表面に金属電極が設けられた2つの絶縁
性基坂のあいだに接着剤を配したのち、前記両金属電極
を位置合わせして接続する接続構造であって、前記接着
剤が非導電性であり、かつ前記2つの絶縁性基坂のう
ち、いずれか一方の絶縁性基坂の金属電極の表面に他方
の絶縁性基板の金属電極より硬質の金属製凸部が電着に
より形成されてなることを特徴とする。
In the electrode connection structure of the present invention, an adhesive is placed between two insulating base plates each having a metal electrode on each surface, and then both metal electrodes are positioned. A connection structure for connecting together, wherein the adhesive is non-conductive, and the surface of the metal electrode of one of the two insulating bases is insulated from the other of the insulating bases. It is characterized in that a metal convex portion harder than the metal electrode of the substrate is formed by electrodeposition.

【0010】また、本発明の液晶表示素子は、ソース電
極とゲート電極が形成されたTFTガラス基板とカラー
フィルターが形成されたガラス基板とのあいだに液晶を
挟んだ液晶パネルおよび前記TFTガラス基板の端面に
1列に並んだ複数の端子群に電極の接続構造により接続
される回路基板を備えてなる液晶表示素子であって、該
電極の接続構造が2つの絶縁性基坂上に設けられた金属
電極のあいだを接着剤により接続する接続構造であり、
該接着剤中に導電性の粒子を有しなく、かつ前記2つの
絶縁性基坂のうち、いずれか一方の絶縁性基坂の金属電
極の表面に他方の絶縁性基板の金属電極より硬質な金属
製凸部が電着により形成されてなることを特徴とする。
Further, the liquid crystal display device of the present invention comprises a liquid crystal panel in which a liquid crystal is sandwiched between a TFT glass substrate having a source electrode and a gate electrode and a glass substrate having a color filter, and the TFT glass substrate. What is claimed is: 1. A liquid crystal display device comprising a circuit board connected to a plurality of terminal groups arranged in a line on an end face by a connection structure of electrodes, wherein the connection structure of the electrodes is a metal provided on two insulating bases. It is a connection structure that connects the electrodes with an adhesive,
There is no conductive particle in the adhesive, and the surface of the metal electrode of one of the two insulating substrates is harder than the metal electrode of the other insulating substrate. It is characterized in that the metal convex portion is formed by electrodeposition.

【0011】さらに本発明の回路基板は、絶縁性基坂に
設けられる金属電極の表面上に硬質の金属製凸部が電着
により形成されてなることを特徴とする。
Further, the circuit board of the present invention is characterized in that a hard metal projection is formed on the surface of the metal electrode provided on the insulating substrate by electrodeposition.

【0012】[0012]

【発明の実施の形態】本発明の電極の接続構造は、接続
する二つの絶縁性基板のうち、一方の基板の電極端子の
表面は電着により形成された凸部を有しており、もう一
方の基板の電極端子が金属で形成され、異方性導電膜の
代わりに非導電性接着剤が用いられている。2つの基板
の一方に接着剤を転写し、その上にもう一方の基板を重
ね合わせ、位置決めしたのち、その上から、たとえばヒ
ートシール圧着機のツールにより加圧および加熱を行な
う。こうすることにより、一方の基板の金属電極上にあ
る凸部がもう一方の基板の金属電極に食い込み、電気的
導通を得ることができる。また、隣接する金属電極のあ
いだには導電粒子が存在しないため、高い絶縁性を得る
ことができる。電極端子の材料は銅(Cu)を用い、当
該端子の表面にニッケル(Ni)からなる凸部をめっき
などの電着により形成する。凸部の形成方法は、めっき
時のプロセス条件を変えることによって可能である。た
とえば電界めっきをする場合は金属電極に通常よりも大
きな電圧を掛け、Niを急速に成長させる。またはめっ
き液の温度を上げてめっきすることにより、Niを急速
に成長させ、凸部を形成することができる。無電界めっ
きの場合は、めっき液のpHを下げ、めっき液中のNi
イオン濃度または還元剤濃度を調整して、Ni成長速度
を速めることにより大きな凸部を形成することができ
る。めっき部の表面上にさらに金(Au)をめっきして
導通抵抗を下げることもできる。凸部の高さは、本発明
において、とくに限定されるものではないが、概ね0.
3〜1.5μmが目安である。凸部を形成した金属電極
に接続される金属電極の材料は、前記凸部を形成するめ
っきの材料よりも硬度の小さい(軟質)金属を用いる。
これにより、金属電極に形成しためっき部の凸部が対向
する金属電極に突き刺さりやすくする。液晶表示素子に
おいては、従来ITO電極が用いられているが、本発明
ではアルミニウム(Al)、クロム(Cr)、または銀
(Ag)などを用いる。本発明において、液晶表示素子
に用いる電極の主材料は、前述の材料に限定されるもの
ではなく、金属電極の表面がこれらの材料で形成されて
いればよい。AlまたはCuを電極の最表層に用いる
と、表面に薄い酸化膜ができるが、本発明によれば、酸
化膜の厚さよりもめっき部の凸部が大きければ、凸部が
酸化膜を突き破り、内部の金属電極に食い込んで導通さ
せることが可能である。2つの基板の接続に用いる接着
剤としては、熱硬化性樹脂、熱可塑性樹脂または紫外線
硬化性樹脂などを用いることができる。また、接着剤の
形態はテープ状のものまたはペースト状のものであって
もよい。なお、凸部の高さをできるだけ高くし、対向す
る電極の厚さを大きくすれば突き刺さる深さが深くなる
ので、接続の信頼性がより高くなる。
BEST MODE FOR CARRYING OUT THE INVENTION In the electrode connecting structure of the present invention, the surface of the electrode terminal of one of the two insulating substrates to be connected has a convex portion formed by electrodeposition. The electrode terminal of one of the substrates is made of metal, and a non-conductive adhesive is used instead of the anisotropic conductive film. The adhesive is transferred to one of the two substrates, the other substrate is superposed on it and positioned, and then pressure and heat are applied from above with a tool such as a heat seal crimping machine. By doing so, the convex portion on the metal electrode of one substrate bites into the metal electrode of the other substrate, and electrical conduction can be obtained. In addition, since there are no conductive particles between adjacent metal electrodes, high insulation can be obtained. Copper (Cu) is used as the material of the electrode terminal, and a convex portion made of nickel (Ni) is formed on the surface of the terminal by electrodeposition such as plating. The method of forming the convex portion can be performed by changing the process conditions during plating. For example, when performing electric field plating, a voltage higher than usual is applied to the metal electrode to rapidly grow Ni. Alternatively, by raising the temperature of the plating solution and performing plating, Ni can be grown rapidly and the convex portions can be formed. In the case of electroless plating, lower the pH of the plating solution and remove Ni in the plating solution.
A large convex portion can be formed by adjusting the ion concentration or the reducing agent concentration to accelerate the Ni growth rate. Gold (Au) may be further plated on the surface of the plated portion to reduce the conduction resistance. The height of the convex portion is not particularly limited in the present invention, but is about 0.
3 to 1.5 μm is a standard. As a material of the metal electrode connected to the metal electrode having the convex portion, a metal having a hardness (soft) smaller than that of the plating material forming the convex portion is used.
This facilitates the protrusion of the plated portion formed on the metal electrode to pierce the opposing metal electrode. Conventionally, ITO electrodes have been used in liquid crystal display elements, but in the present invention, aluminum (Al), chromium (Cr), silver (Ag) or the like is used. In the present invention, the main material of the electrode used for the liquid crystal display element is not limited to the above-mentioned materials, and the surface of the metal electrode may be formed of these materials. When Al or Cu is used for the outermost layer of the electrode, a thin oxide film is formed on the surface, but according to the present invention, if the projection of the plated portion is larger than the thickness of the oxide film, the projection breaks through the oxide film, It is possible to dig into the internal metal electrode to make it conductive. As the adhesive used for connecting the two substrates, a thermosetting resin, a thermoplastic resin, an ultraviolet curable resin, or the like can be used. The adhesive may be in the form of tape or paste. It should be noted that if the height of the convex portion is made as high as possible and the thickness of the opposing electrodes is made large, the piercing depth becomes deeper, so that the reliability of the connection becomes higher.

【0013】以下、添付図面に基づいて、本発明の電極
の接続構造および該接続構造を用いる液晶表示素子、な
らびに回路基板を説明する。
The electrode connection structure of the present invention, the liquid crystal display device using the connection structure, and the circuit board will be described below with reference to the accompanying drawings.

【0014】実施の形態1 図1は本発明の実施の形態1にかかわる液晶表示素子の
電極の接続構造を示す断面図である。
Embodiment 1 FIG. 1 is a sectional view showing a connection structure of electrodes of a liquid crystal display element according to Embodiment 1 of the present invention.

【0015】本発明の実施の形態1にかかわる液晶表示
素子は、ソース電極とゲート電極が形成されたTFTガ
ラス基板とカラーフィルターが形成されたガラス基板と
のあいだに液晶を挟んだ液晶パネル、および前記TFT
ガラス基板の端面に1列に並んだ複数の端子群に、本発
明の電極の接続構造により接続される回路基板から構成
されている。図1に示されるように、電極の接続構造
は、TFTガラス基板(以下、単にガラス基板という)
1上に形成された金属電極2と回路基板3上に形成され
た金属電極4とが該金属電極4の表面にめっきされため
っき部の凸部5がガラス基板1の金属電極2に食い込む
(突き刺さる)ことにより、導通を得ている。2つの基
板1、3間には、導電粒子が存在しない非導電性の接着
剤6が挟まれている。この接着剤6としては、熱硬化
性、熱可塑性および紫外線硬化性の樹脂のうち、いずれ
かの樹脂を用いることができる。前記金属電極4の材料
としては、たとえばCuまたはAuが用いられており、
表面にNiめっきが施されている。当該めっき部の凸部
5は、このNiめっき部の厚さのばらつきにより形成さ
れている。導通抵抗をさらに下げるために、Niのめっ
き部の表面上にAuめっきを施してもよい。ガラス基坂
1上の金属電極2は、たとえばAl、Au、Agまたは
Cuで形成されており、対向する回路基板3のめっき部
の凸部5が金属電極2に食い込んで二つの基板間が電気
的に導通している。ガラス基板1の金属電極2の厚さ
は、一般的に回路の仕様により100〜1500nmの
範囲で適切な値が選ばれている。前記回路基板3の金属
電極4の表面に形成されるめっき部の凸部5は、高さが
ガラス基板1の金属電極2の厚さと同程度である。前記
回路基板3としては、一般にTCP(Tape Carrier Pac
kage)またはCOF(Chip OnFilm)などが用いられ、
その原材料としては、ポリイミド樹脂が用いられてい
る。ガラス基板1は、一般にソーダガラスまたは無アル
カリガラスなどが用いられるが、フィルム液晶などの場
合はアクリル樹脂などの合成樹脂製基板を用いることが
できる。
The liquid crystal display element according to the first embodiment of the present invention is a liquid crystal panel in which liquid crystal is sandwiched between a TFT glass substrate having a source electrode and a gate electrode and a glass substrate having a color filter, and The TFT
A circuit board is connected to a plurality of terminal groups arranged in a line on the end surface of the glass substrate by the electrode connection structure of the present invention. As shown in FIG. 1, the connection structure of the electrodes has a TFT glass substrate (hereinafter simply referred to as a glass substrate).
The metal electrode 2 formed on the substrate 1 and the metal electrode 4 formed on the circuit board 3 are plated on the surface of the metal electrode 4, and the protrusions 5 of the plated portion bite into the metal electrode 2 of the glass substrate 1 ( By piercing), the continuity is obtained. A non-conductive adhesive 6 containing no conductive particles is sandwiched between the two substrates 1 and 3. As the adhesive 6, any one of thermosetting, thermoplastic and ultraviolet curable resins can be used. As the material of the metal electrode 4, for example, Cu or Au is used,
The surface is plated with Ni. The convex portion 5 of the plated portion is formed by the variation in the thickness of the Ni plated portion. In order to further reduce the conduction resistance, Au plating may be applied on the surface of the Ni plated portion. The metal electrode 2 on the glass substrate 1 is made of, for example, Al, Au, Ag, or Cu, and the convex portion 5 of the plated portion of the opposing circuit board 3 digs into the metal electrode 2 to electrically connect the two boards. Are electrically connected. An appropriate value is generally selected for the thickness of the metal electrode 2 of the glass substrate 1 within the range of 100 to 1500 nm according to the circuit specifications. The height of the protrusion 5 of the plated portion formed on the surface of the metal electrode 4 of the circuit board 3 is about the same as the thickness of the metal electrode 2 of the glass substrate 1. The circuit board 3 is generally a TCP (Tape Carrier Pac).
kage) or COF (Chip On Film) is used,
Polyimide resin is used as the raw material. As the glass substrate 1, soda glass or non-alkali glass is generally used, but in the case of film liquid crystal or the like, a synthetic resin substrate such as acrylic resin can be used.

【0016】実施の形態2 つぎに本発明の実施の形態2を説明する。本実施の形態
2においては、図2に示されるように、ガラス基板の代
わりにガラス繊維を含有させたエボキシ樹脂基板11が
用いられている。このエポキシ樹脂基板11の表面上に
は、Cuからなる金属電極12が形成されており、必要
に応じて金属電極12の表面上にAuめっきを施すこと
もできる。本実施の形態2は、前記実施の形態1と同様
に、対向する回路基板3の電極4の表面に形成されたN
iのめっき部の凸部5がCuからなる金属電極12に食
い込むことにより導通を得ている。本実施の形態2で
は、回路基板3の金属電極4にめっき部の凸部を形成し
ているが、本発明においては、これに限定されるもので
はなく、接続する2つの基板3、11がいずれも樹脂基
板であり、金属電極(端子)へのめっき処理が容易であ
るため、いずれの基板の金属電極にもめっき部の凸部を
形成することができる。また、前記実施の形態1と同様
に、2つの基板3、11間には、絶縁性の接着剤6が挟
まれており、導電粒子は存在しない。本発明において、
前記基板11は、ガラス繊維を含有させたエボキシ樹脂
基板に限定されるものではなく、アラミド繊維を含有さ
せたエボキシ樹脂の基板、ボリイミド基板またはセラミ
ック基板とすることもできる。
Second Embodiment Next, a second embodiment of the present invention will be described. In the second embodiment, as shown in FIG. 2, an epoxy resin substrate 11 containing glass fibers is used instead of the glass substrate. The metal electrode 12 made of Cu is formed on the surface of the epoxy resin substrate 11, and the surface of the metal electrode 12 may be Au-plated if necessary. In the second embodiment, as in the first embodiment, the N formed on the surface of the electrode 4 of the circuit board 3 facing each other.
The projection 5 of the plated portion of i bites into the metal electrode 12 made of Cu to obtain conduction. In the second embodiment, the convex portion of the plated portion is formed on the metal electrode 4 of the circuit board 3, but the present invention is not limited to this, and the two substrates 3 and 11 to be connected are Since both are resin substrates and the plating process on the metal electrodes (terminals) is easy, it is possible to form the protrusions of the plated portions on the metal electrodes of any of the substrates. Further, as in the first embodiment, the insulating adhesive 6 is sandwiched between the two substrates 3 and 11, and no conductive particles are present. In the present invention,
The substrate 11 is not limited to the epoxy resin substrate containing glass fiber, and may be an epoxy resin substrate containing aramid fiber, a polyimide substrate or a ceramic substrate.

【0017】[0017]

【発明の効果】以上説明したとおり、本発明によれば、
端子の微細ピッチ化が進んでも、電極を変形させること
なく、信頼性の高い導通が得られ、かつ隣接端子間のシ
ョートが発生しない。
As described above, according to the present invention,
Even if the pitch of terminals is made finer, highly reliable conduction can be obtained without deforming the electrodes, and a short circuit between adjacent terminals does not occur.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態1にかかわる液晶表示素子
の電極の接続構造を示す断面図である。
FIG. 1 is a cross-sectional view showing an electrode connection structure of a liquid crystal display element according to a first embodiment of the present invention.

【図2】本発明の実施の形態2にかかわる液晶表示素子
の電極の接続構造を示す断面図である。
FIG. 2 is a cross-sectional view showing a connection structure of electrodes of a liquid crystal display element according to Embodiment 2 of the present invention.

【図3】従来の液晶表示素子における異方性導電膜を用
いた接続構造の断面図である。
FIG. 3 is a cross-sectional view of a connection structure using an anisotropic conductive film in a conventional liquid crystal display element.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2、4、12 金属電極 3 回路基板 5 めっき部の凸部 6 接着剤 11 エポキシ樹脂基板 1 glass substrate 2, 4, 12 metal electrodes 3 circuit board 5 Convex part of plated part 6 adhesive 11 Epoxy resin substrate

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 それぞれの表面に金属電極が設けられた
2つの絶縁性基坂のあいだに接着剤を配したのち、前記
両金属電極を位置合わせして接続する接続構造であっ
て、前記接着剤が非導電性であり、かつ前記2つの絶縁
性基坂のうち、いずれか一方の絶縁性基坂の金属電極の
表面に他方の絶縁性基板の金属電極より硬質の金属製凸
部が電着により形成されてなる電極の接続構造。
1. A connection structure in which an adhesive is disposed between two insulating bases each having a metal electrode provided on each surface thereof, and then the two metal electrodes are aligned and connected to each other. The agent is non-conductive, and a metal convex portion that is harder than the metal electrode of the other insulating substrate is electrically conductive on the surface of the metal electrode of one of the two insulating substrates. An electrode connection structure formed by bonding.
【請求項2】 前記金属製凸部が前記他方の絶縁性基板
の金属電極に食い込んでいる請求項1記載の電極の接続
構造。
2. The electrode connection structure according to claim 1, wherein the metal convex portion bites into the metal electrode of the other insulating substrate.
【請求項3】 前記金属製凸部の材料がニッケルである
請求項1または2記載の電極の接続構造。
3. The electrode connection structure according to claim 1, wherein the material of the metal convex portion is nickel.
【請求項4】 前記他方の絶縁性基板の金属電極の材料
がアルミニウム、金、銀および銅のうち、いずれかであ
る請求項1、2または3記載の電極の接続構造。
4. The electrode connection structure according to claim 1, 2 or 3, wherein the material of the metal electrode of the other insulating substrate is any one of aluminum, gold, silver and copper.
【請求項5】 前記ニッケルの金属製凸部の表面上に金
が電着されている請求項3または4記載の電極の接続構
造。
5. The electrode connection structure according to claim 3, wherein gold is electrodeposited on the surface of the metallic projection of nickel.
【請求項6】 ソース電極とゲート電極が形成されたT
FTガラス基板とカラーフィルターが形成されたガラス
基板とのあいだに液晶を挟んだ液晶パネルおよび前記T
FTガラス基板の端面に1列に並んだ複数の端子群に電
極の接続構造により接続される回路基板を備えてなる液
晶表示素子であって、前記電極の接続構造が請求項1、
2、3、4または5記載の電極の接続構造である液晶表
示素子。
6. A T having a source electrode and a gate electrode formed thereon.
A liquid crystal panel in which liquid crystal is sandwiched between an FT glass substrate and a glass substrate on which a color filter is formed, and the above-mentioned T
A liquid crystal display device comprising a circuit board connected to a plurality of terminal groups arranged in a line on an end face of an FT glass substrate by a connection structure of electrodes, wherein the connection structure of the electrodes is
A liquid crystal display device having the electrode connection structure according to 2, 3, 4 or 5.
【請求項7】 絶縁性基坂に設けられる金属電極の表面
上に硬質の金属製凸部が電着により形成されてなる回路
基板。
7. A circuit board in which a hard metal projection is formed on a surface of a metal electrode provided on an insulating substrate by electrodeposition.
JP2002061869A 2002-03-07 2002-03-07 Connection structure of electrode, and liquid crystal display device using the connected structure Pending JP2003262882A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002061869A JP2003262882A (en) 2002-03-07 2002-03-07 Connection structure of electrode, and liquid crystal display device using the connected structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002061869A JP2003262882A (en) 2002-03-07 2002-03-07 Connection structure of electrode, and liquid crystal display device using the connected structure

Publications (1)

Publication Number Publication Date
JP2003262882A true JP2003262882A (en) 2003-09-19

Family

ID=29195936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002061869A Pending JP2003262882A (en) 2002-03-07 2002-03-07 Connection structure of electrode, and liquid crystal display device using the connected structure

Country Status (1)

Country Link
JP (1) JP2003262882A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005260138A (en) * 2004-03-15 2005-09-22 Matsushita Electric Ind Co Ltd Board device
JP2007041389A (en) * 2005-08-04 2007-02-15 Nec Lcd Technologies Ltd Display device and its manufacturing method
WO2011061989A1 (en) * 2009-11-20 2011-05-26 シャープ株式会社 Device substrate and method for manufacturing same
EP4002466A4 (en) * 2019-07-24 2022-07-06 BOE Technology Group Co., Ltd. Display substrate and preparation method therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005260138A (en) * 2004-03-15 2005-09-22 Matsushita Electric Ind Co Ltd Board device
JP2007041389A (en) * 2005-08-04 2007-02-15 Nec Lcd Technologies Ltd Display device and its manufacturing method
WO2011061989A1 (en) * 2009-11-20 2011-05-26 シャープ株式会社 Device substrate and method for manufacturing same
EP4002466A4 (en) * 2019-07-24 2022-07-06 BOE Technology Group Co., Ltd. Display substrate and preparation method therefor
US11817307B2 (en) 2019-07-24 2023-11-14 Boe Technology Group Co., Ltd. Display substrate and method for manufacturing the same

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