JP2005244197A5 - - Google Patents

Download PDF

Info

Publication number
JP2005244197A5
JP2005244197A5 JP2005015070A JP2005015070A JP2005244197A5 JP 2005244197 A5 JP2005244197 A5 JP 2005244197A5 JP 2005015070 A JP2005015070 A JP 2005015070A JP 2005015070 A JP2005015070 A JP 2005015070A JP 2005244197 A5 JP2005244197 A5 JP 2005244197A5
Authority
JP
Japan
Prior art keywords
electrode layer
forming
layer
region
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005015070A
Other languages
English (en)
Japanese (ja)
Other versions
JP4969041B2 (ja
JP2005244197A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005015070A priority Critical patent/JP4969041B2/ja
Priority claimed from JP2005015070A external-priority patent/JP4969041B2/ja
Publication of JP2005244197A publication Critical patent/JP2005244197A/ja
Publication of JP2005244197A5 publication Critical patent/JP2005244197A5/ja
Application granted granted Critical
Publication of JP4969041B2 publication Critical patent/JP4969041B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2005015070A 2004-01-26 2005-01-24 表示装置の作製方法 Expired - Fee Related JP4969041B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005015070A JP4969041B2 (ja) 2004-01-26 2005-01-24 表示装置の作製方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2004017382 2004-01-26
JP2004017448 2004-01-26
JP2004017382 2004-01-26
JP2004017448 2004-01-26
JP2005015070A JP4969041B2 (ja) 2004-01-26 2005-01-24 表示装置の作製方法

Publications (3)

Publication Number Publication Date
JP2005244197A JP2005244197A (ja) 2005-09-08
JP2005244197A5 true JP2005244197A5 (zh) 2008-03-13
JP4969041B2 JP4969041B2 (ja) 2012-07-04

Family

ID=35025556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005015070A Expired - Fee Related JP4969041B2 (ja) 2004-01-26 2005-01-24 表示装置の作製方法

Country Status (1)

Country Link
JP (1) JP4969041B2 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4678574B2 (ja) * 2004-08-23 2011-04-27 株式会社リコー 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置
EP1998373A3 (en) 2005-09-29 2012-10-31 Semiconductor Energy Laboratory Co, Ltd. Semiconductor device having oxide semiconductor layer and manufacturing method thereof
KR101197053B1 (ko) * 2005-09-30 2012-11-06 삼성디스플레이 주식회사 유기 박막 트랜지스터 표시판 및 그 제조 방법
WO2007044429A2 (en) * 2005-10-05 2007-04-19 Nanogram Corporation Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions
KR100766318B1 (ko) 2005-11-29 2007-10-11 엘지.필립스 엘시디 주식회사 유기 반도체 물질을 이용한 박막트랜지스터와 이를 구비한액정표시장치용 어레이 기판 및 그 제조방법
JP5167707B2 (ja) * 2006-08-04 2013-03-21 株式会社リコー 積層構造体、多層配線基板、アクティブマトリックス基板、並びに電子表示装置
JP5142831B2 (ja) 2007-06-14 2013-02-13 株式会社半導体エネルギー研究所 半導体装置及びその作製方法
JP5155059B2 (ja) * 2008-08-06 2013-02-27 株式会社アルバック 表面修飾基板の製造方法
KR102275487B1 (ko) * 2008-09-19 2021-07-12 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치
US8461582B2 (en) 2009-03-05 2013-06-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
KR101646783B1 (ko) * 2009-12-08 2016-08-08 엘지디스플레이 주식회사 휴대용 컴퓨터
EP2398086A1 (en) * 2010-06-17 2011-12-21 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Opto-electric device and method of manufacturing thereof
JP5811560B2 (ja) * 2011-03-25 2015-11-11 セイコーエプソン株式会社 回路基板の製造方法
JP5711585B2 (ja) * 2011-03-30 2015-05-07 株式会社アドテックエンジニアリング 薄膜トランジスタの製造装置およびその製造方法、ならびにプログラム
US20180053911A1 (en) * 2015-03-13 2018-02-22 Konica Minolta, Inc. Transparent electrode, method for manufacturing transparent electrode, and organic electroluminescence element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2791422B2 (ja) * 1990-12-25 1998-08-27 株式会社 半導体エネルギー研究所 電気光学装置およびその作製方法
GB9726511D0 (en) * 1997-12-13 1998-02-11 Philips Electronics Nv Thin film transistors and electronic devices comprising such
JP2002009287A (ja) * 2000-06-19 2002-01-11 Matsushita Electric Ind Co Ltd 半導体装置と半導体装置の製造方法
JP3967259B2 (ja) * 2001-12-11 2007-08-29 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2003241177A (ja) * 2002-02-14 2003-08-27 Dainippon Printing Co Ltd カラー液晶表示装置における電極基板の製造方法
JP4572501B2 (ja) * 2002-02-27 2010-11-04 コニカミノルタホールディングス株式会社 有機薄膜トランジスタの製造方法
JP2003318193A (ja) * 2002-04-22 2003-11-07 Seiko Epson Corp デバイス、その製造方法及び電子装置
JP2003318401A (ja) * 2002-04-22 2003-11-07 Seiko Epson Corp デバイスの製造方法、デバイス、表示装置、および電子機器

Similar Documents

Publication Publication Date Title
JP2005244197A5 (zh)
JP5268132B2 (ja) 酸化物半導体素子とその製造方法、薄膜センサおよび電気光学装置
TWI624050B (zh) 有機發光顯示裝置及其製造方法
TWI549289B (zh) 有機發光顯示面板及其製作方法
US20070108889A1 (en) Organic light emitting display device with trap for foreign substance and method of fabricating the same
JP2005328088A5 (zh)
JP2011044575A (ja) 半導体装置およびその製造方法
JP2005244204A5 (zh)
US9224868B2 (en) Pixel structure
JP2003273361A (ja) 半導体装置およびその製造方法
JP2007184601A (ja) 有機薄膜トランジスタ及びその製造方法
US11114630B2 (en) Display panel, manufacturing method thereof, display device
CN107039460A (zh) 薄膜晶体管基板
JP2004241770A5 (zh)
JP2005286320A5 (zh)
TWI495110B (zh) 顯示面板及其製作方法
JP2006013481A5 (zh)
US20110193089A1 (en) Pixel structure, method of fabricating the same, and method of fabricating electronic device
JP2005159327A5 (zh)
JP2005277323A5 (zh)
US20160079326A1 (en) Pixel structure of electroluminescent display panel and method of fabricating the same
JP2005303283A5 (zh)
JP2004522283A5 (zh)
KR20120043404A (ko) 표시장치 및 이의 제조방법
US8604579B2 (en) Semiconductor device, and method for manufacturing same