JP2005217064A - 露光システム - Google Patents

露光システム Download PDF

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Publication number
JP2005217064A
JP2005217064A JP2004020379A JP2004020379A JP2005217064A JP 2005217064 A JP2005217064 A JP 2005217064A JP 2004020379 A JP2004020379 A JP 2004020379A JP 2004020379 A JP2004020379 A JP 2004020379A JP 2005217064 A JP2005217064 A JP 2005217064A
Authority
JP
Japan
Prior art keywords
light source
exposure
maintenance
source device
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004020379A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005217064A5 (enExample
Inventor
Akira Kasai
亮 笠井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004020379A priority Critical patent/JP2005217064A/ja
Priority to US11/042,195 priority patent/US7212276B2/en
Publication of JP2005217064A publication Critical patent/JP2005217064A/ja
Publication of JP2005217064A5 publication Critical patent/JP2005217064A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
JP2004020379A 2004-01-28 2004-01-28 露光システム Withdrawn JP2005217064A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004020379A JP2005217064A (ja) 2004-01-28 2004-01-28 露光システム
US11/042,195 US7212276B2 (en) 2004-01-28 2005-01-26 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004020379A JP2005217064A (ja) 2004-01-28 2004-01-28 露光システム

Publications (2)

Publication Number Publication Date
JP2005217064A true JP2005217064A (ja) 2005-08-11
JP2005217064A5 JP2005217064A5 (enExample) 2007-03-15

Family

ID=34792606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004020379A Withdrawn JP2005217064A (ja) 2004-01-28 2004-01-28 露光システム

Country Status (2)

Country Link
US (1) US7212276B2 (enExample)
JP (1) JP2005217064A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007180452A (ja) * 2005-12-28 2007-07-12 Furukawa Electric Co Ltd:The 半導体レーザの駆動制御装置及び駆動制御方法
JP2021162612A (ja) * 2020-03-30 2021-10-11 キヤノン株式会社 光源装置、照明装置、及び露光装置。

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI562046B (en) * 2015-06-25 2016-12-11 Wistron Corp Optical touch apparatus and width detecting method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250797A (en) * 1990-10-05 1993-10-05 Canon Kabushiki Kaisha Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters
JP2902172B2 (ja) 1991-09-04 1999-06-07 キヤノン株式会社 露光装置
JP3125307B2 (ja) * 1991-01-28 2001-01-15 株式会社ニコン 露光装置及び露光方法
US5097291A (en) * 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device
JPH08167562A (ja) 1994-12-09 1996-06-25 Canon Inc 半導体製造装置およびデバイス製造方法
US5646954A (en) * 1996-02-12 1997-07-08 Cymer, Inc. Maintenance strategy control system and monitoring method for gas discharge lasers
JPH10275951A (ja) * 1997-03-28 1998-10-13 Nikon Corp レーザ光源の寿命判定方法
KR100548203B1 (ko) * 2003-12-24 2006-02-02 삼성전자주식회사 사용환경에 따라 부품교체시기를 결정하는 화상형성장치및 이를 이용한 화상형성방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007180452A (ja) * 2005-12-28 2007-07-12 Furukawa Electric Co Ltd:The 半導体レーザの駆動制御装置及び駆動制御方法
JP2021162612A (ja) * 2020-03-30 2021-10-11 キヤノン株式会社 光源装置、照明装置、及び露光装置。
JP7418128B2 (ja) 2020-03-30 2024-01-19 キヤノン株式会社 光源装置、照明装置、及び露光装置。

Also Published As

Publication number Publication date
US20050162633A1 (en) 2005-07-28
US7212276B2 (en) 2007-05-01

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