JP2005209645A5 - - Google Patents
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- Publication number
- JP2005209645A5 JP2005209645A5 JP2004376827A JP2004376827A JP2005209645A5 JP 2005209645 A5 JP2005209645 A5 JP 2005209645A5 JP 2004376827 A JP2004376827 A JP 2004376827A JP 2004376827 A JP2004376827 A JP 2004376827A JP 2005209645 A5 JP2005209645 A5 JP 2005209645A5
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- sample
- optical system
- sample surface
- observation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 45
- 230000003287 optical effect Effects 0.000 claims 22
- 238000000034 method Methods 0.000 claims 17
- 238000007689 inspection Methods 0.000 claims 10
- 230000007547 defect Effects 0.000 claims 8
- 230000001678 irradiating effect Effects 0.000 claims 8
- 230000002950 deficient Effects 0.000 claims 7
- 230000001133 acceleration Effects 0.000 claims 4
- 238000013507 mapping Methods 0.000 claims 4
- 239000000284 extract Substances 0.000 claims 3
- 238000001514 detection method Methods 0.000 claims 2
- 238000007493 shaping process Methods 0.000 claims 2
- 238000000605 extraction Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004376827A JP4384022B2 (ja) | 2003-12-25 | 2004-12-27 | 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003429926 | 2003-12-25 | ||
| JP2004376827A JP4384022B2 (ja) | 2003-12-25 | 2004-12-27 | 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005209645A JP2005209645A (ja) | 2005-08-04 |
| JP2005209645A5 true JP2005209645A5 (enrdf_load_stackoverflow) | 2007-04-26 |
| JP4384022B2 JP4384022B2 (ja) | 2009-12-16 |
Family
ID=34914124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004376827A Expired - Lifetime JP4384022B2 (ja) | 2003-12-25 | 2004-12-27 | 詳細観察の機能を備えた電子線装置、及びその電子線装置による試料の検査並びに試料観察方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4384022B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4603448B2 (ja) * | 2005-08-31 | 2010-12-22 | 株式会社日立ハイテクノロジーズ | 回路パターンの検査装置 |
| JP2007087639A (ja) * | 2005-09-20 | 2007-04-05 | Ebara Corp | 電子線装置及びパターン評価方法 |
| JP2007248360A (ja) * | 2006-03-17 | 2007-09-27 | Jeol Ltd | 荷電粒子ビーム検査方法および装置 |
| JP5525128B2 (ja) * | 2007-11-29 | 2014-06-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置及び試料観察方法 |
| WO2009152046A1 (en) | 2008-06-11 | 2009-12-17 | Kla-Tencor Corporation | Systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof |
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2004
- 2004-12-27 JP JP2004376827A patent/JP4384022B2/ja not_active Expired - Lifetime