JP2005101619A5 - - Google Patents
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- Publication number
- JP2005101619A5 JP2005101619A5 JP2004289636A JP2004289636A JP2005101619A5 JP 2005101619 A5 JP2005101619 A5 JP 2005101619A5 JP 2004289636 A JP2004289636 A JP 2004289636A JP 2004289636 A JP2004289636 A JP 2004289636A JP 2005101619 A5 JP2005101619 A5 JP 2005101619A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- defect inspection
- electron beam
- inspection apparatus
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 claims 31
- 238000007689 inspection Methods 0.000 claims 20
- 238000010894 electron beam technology Methods 0.000 claims 16
- 238000001514 detection method Methods 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 230000002093 peripheral effect Effects 0.000 claims 6
- 239000002245 particle Substances 0.000 claims 5
- 238000003384 imaging method Methods 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000000926 separation method Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004289636A JP4028864B2 (ja) | 2004-10-01 | 2004-10-01 | パターン欠陥検査方法および検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004289636A JP4028864B2 (ja) | 2004-10-01 | 2004-10-01 | パターン欠陥検査方法および検査装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003432567A Division JP2004151119A (ja) | 2003-12-26 | 2003-12-26 | パターン欠陥検査方法および検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005101619A JP2005101619A (ja) | 2005-04-14 |
| JP2005101619A5 true JP2005101619A5 (enrdf_load_stackoverflow) | 2006-10-05 |
| JP4028864B2 JP4028864B2 (ja) | 2007-12-26 |
Family
ID=34464135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004289636A Expired - Lifetime JP4028864B2 (ja) | 2004-10-01 | 2004-10-01 | パターン欠陥検査方法および検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4028864B2 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4870450B2 (ja) * | 2006-02-27 | 2012-02-08 | 株式会社日立ハイテクノロジーズ | 検査装置、および検査方法 |
| JP4903469B2 (ja) * | 2006-03-28 | 2012-03-28 | 富士通セミコンダクター株式会社 | 欠陥検出方法 |
| JP2009294022A (ja) * | 2008-06-04 | 2009-12-17 | Hitachi Ltd | 検査方法および装置 |
| JP5542095B2 (ja) * | 2011-06-21 | 2014-07-09 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| JP6604751B2 (ja) * | 2015-06-18 | 2019-11-13 | 株式会社ホロン | 電子を用いた超高速検査装置および電子を用いた超高速検査方法 |
| JP6803440B2 (ja) * | 2019-10-15 | 2020-12-23 | 株式会社ホロン | 電子を用いた超高速検査装置 |
| CN115793353A (zh) * | 2022-11-13 | 2023-03-14 | 无锡奥特维科技股份有限公司 | 一种光路限定元件及使用该元件的检测方法、装置 |
| EP4474805A1 (en) * | 2023-05-15 | 2024-12-11 | Jeol Ltd. | Analysis device and analysis method |
-
2004
- 2004-10-01 JP JP2004289636A patent/JP4028864B2/ja not_active Expired - Lifetime