JP2005193088A - エキシマランプ照射装置 - Google Patents

エキシマランプ照射装置 Download PDF

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Publication number
JP2005193088A
JP2005193088A JP2003435750A JP2003435750A JP2005193088A JP 2005193088 A JP2005193088 A JP 2005193088A JP 2003435750 A JP2003435750 A JP 2003435750A JP 2003435750 A JP2003435750 A JP 2003435750A JP 2005193088 A JP2005193088 A JP 2005193088A
Authority
JP
Japan
Prior art keywords
lamp
excimer
excimer lamp
scattered matter
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003435750A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005193088A5 (https=
Inventor
Koji Hosoya
細谷　　浩二
Hiromi Sakamoto
弘実 坂元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Storage Battery Co Ltd
Original Assignee
Japan Storage Battery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Storage Battery Co Ltd filed Critical Japan Storage Battery Co Ltd
Priority to JP2003435750A priority Critical patent/JP2005193088A/ja
Priority to TW093139767A priority patent/TWI259497B/zh
Priority to PCT/JP2004/019762 priority patent/WO2005065817A1/ja
Priority to CNB2004800127242A priority patent/CN100420512C/zh
Priority to KR1020057004537A priority patent/KR100641309B1/ko
Publication of JP2005193088A publication Critical patent/JP2005193088A/ja
Publication of JP2005193088A5 publication Critical patent/JP2005193088A5/ja
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2003435750A 2003-12-26 2003-12-26 エキシマランプ照射装置 Pending JP2005193088A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003435750A JP2005193088A (ja) 2003-12-26 2003-12-26 エキシマランプ照射装置
TW093139767A TWI259497B (en) 2003-12-26 2004-12-21 Irradiating device of excimer lamp and method for using the same
PCT/JP2004/019762 WO2005065817A1 (ja) 2003-12-26 2004-12-24 エキシマランプ照射装置及びその使用方法
CNB2004800127242A CN100420512C (zh) 2003-12-26 2004-12-24 激发式气体分子放电灯的照射装置及其使用方法
KR1020057004537A KR100641309B1 (ko) 2003-12-26 2004-12-24 엑시머 램프 조사 장치 및 그 사용 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003435750A JP2005193088A (ja) 2003-12-26 2003-12-26 エキシマランプ照射装置

Publications (2)

Publication Number Publication Date
JP2005193088A true JP2005193088A (ja) 2005-07-21
JP2005193088A5 JP2005193088A5 (https=) 2007-02-15

Family

ID=34746912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003435750A Pending JP2005193088A (ja) 2003-12-26 2003-12-26 エキシマランプ照射装置

Country Status (5)

Country Link
JP (1) JP2005193088A (https=)
KR (1) KR100641309B1 (https=)
CN (1) CN100420512C (https=)
TW (1) TWI259497B (https=)
WO (1) WO2005065817A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010022924A (ja) * 2008-07-17 2010-02-04 Ushio Inc エキシマランプ装置
KR100961316B1 (ko) 2005-09-28 2010-06-04 우시오덴키 가부시키가이샤 엑시머 램프 및 자외선 조사장치

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5146061B2 (ja) * 2008-04-10 2013-02-20 ウシオ電機株式会社 エキシマランプおよびこれを備えたランプユニット
TWI841791B (zh) * 2019-10-07 2024-05-11 日商牛尾電機股份有限公司 紫外線照射裝置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
JP2001217216A (ja) * 1999-11-25 2001-08-10 Hoya Schott Kk 紫外線照射方法及び装置
JP2001319510A (ja) * 2000-05-11 2001-11-16 Ushio Inc 誘電体バリア放電ランプ装置
JP2003080191A (ja) * 2001-09-14 2003-03-18 Ushio Inc 光照射装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3653980B2 (ja) * 1998-04-09 2005-06-02 ウシオ電機株式会社 紫外線照射装置
WO2000075080A1 (en) * 1999-06-04 2000-12-14 Henry Kozlowski Apparatus for ultraviolet light treatment of fluids
US6559460B1 (en) * 2000-10-31 2003-05-06 Nordson Corporation Ultraviolet lamp system and methods
JP3757790B2 (ja) * 2000-11-30 2006-03-22 ウシオ電機株式会社 誘電体バリア放電ランプを使った光源装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
JP2001217216A (ja) * 1999-11-25 2001-08-10 Hoya Schott Kk 紫外線照射方法及び装置
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
JP2001319510A (ja) * 2000-05-11 2001-11-16 Ushio Inc 誘電体バリア放電ランプ装置
JP2003080191A (ja) * 2001-09-14 2003-03-18 Ushio Inc 光照射装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100961316B1 (ko) 2005-09-28 2010-06-04 우시오덴키 가부시키가이샤 엑시머 램프 및 자외선 조사장치
JP2010022924A (ja) * 2008-07-17 2010-02-04 Ushio Inc エキシマランプ装置
KR101237650B1 (ko) * 2008-07-17 2013-02-27 우시오덴키 가부시키가이샤 엑시머 램프 장치

Also Published As

Publication number Publication date
KR20060038900A (ko) 2006-05-04
CN1787875A (zh) 2006-06-14
CN100420512C (zh) 2008-09-24
TWI259497B (en) 2006-08-01
KR100641309B1 (ko) 2006-11-01
TW200522127A (en) 2005-07-01
WO2005065817A1 (ja) 2005-07-21

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