JP2005154820A5 - - Google Patents
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- Publication number
- JP2005154820A5 JP2005154820A5 JP2003394028A JP2003394028A JP2005154820A5 JP 2005154820 A5 JP2005154820 A5 JP 2005154820A5 JP 2003394028 A JP2003394028 A JP 2003394028A JP 2003394028 A JP2003394028 A JP 2003394028A JP 2005154820 A5 JP2005154820 A5 JP 2005154820A5
- Authority
- JP
- Japan
- Prior art keywords
- information recording
- optical information
- recording medium
- sputtering target
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 12
- 239000011701 zinc Substances 0.000 claims 10
- 238000005477 sputtering target Methods 0.000 claims 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 3
- 229910001887 tin oxide Inorganic materials 0.000 claims 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 238000002441 X-ray diffraction Methods 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003394028A JP4711244B2 (ja) | 2003-11-25 | 2003-11-25 | スパッタリングターゲット |
| TW093132542A TWI263686B (en) | 2003-11-25 | 2004-10-27 | Sputtering target, optical information recording medium and manufacturing method thereof |
| CNB2004100962421A CN100340698C (zh) | 2003-11-25 | 2004-11-25 | 溅射靶及光信息记录介质及其制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003394028A JP4711244B2 (ja) | 2003-11-25 | 2003-11-25 | スパッタリングターゲット |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007296272A Division JP4745319B2 (ja) | 2007-11-15 | 2007-11-15 | 光情報記録媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005154820A JP2005154820A (ja) | 2005-06-16 |
| JP2005154820A5 true JP2005154820A5 (enrdf_load_stackoverflow) | 2007-01-11 |
| JP4711244B2 JP4711244B2 (ja) | 2011-06-29 |
Family
ID=34720221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003394028A Expired - Lifetime JP4711244B2 (ja) | 2003-11-25 | 2003-11-25 | スパッタリングターゲット |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4711244B2 (enrdf_load_stackoverflow) |
| CN (1) | CN100340698C (enrdf_load_stackoverflow) |
| TW (1) | TWI263686B (enrdf_load_stackoverflow) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1993847B1 (en) * | 2006-03-10 | 2011-10-26 | Ricoh Company, Ltd. | Optical recording medium |
| JP4552950B2 (ja) * | 2006-03-15 | 2010-09-29 | 住友金属鉱山株式会社 | ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜 |
| JP4788463B2 (ja) * | 2006-04-25 | 2011-10-05 | 住友金属鉱山株式会社 | 酸化物焼結体、透明酸化物膜、ガスバリア性透明樹脂基板、ガスバリア性透明導電性樹脂基板およびフレキシブル表示素子 |
| WO2007142330A1 (ja) | 2006-06-08 | 2007-12-13 | Asahi Glass Company, Limited | 透明導電膜およびその製造方法、ならびにその製造に使用されるスパッタリングターゲット |
| JP5269501B2 (ja) * | 2008-07-08 | 2013-08-21 | 出光興産株式会社 | 酸化物焼結体及びそれからなるスパッタリングターゲット |
| KR101671543B1 (ko) | 2008-11-20 | 2016-11-01 | 이데미쓰 고산 가부시키가이샤 | ＺｎＯ-ＳｎＯ₂-Ｉｎ₂Ｏ₃계 산화물 소결체 및 비정질 투명 도전막 |
| JP5145513B2 (ja) | 2008-12-12 | 2013-02-20 | 出光興産株式会社 | 複合酸化物焼結体及びそれからなるスパッタリングターゲット |
| US20120279856A1 (en) * | 2009-10-15 | 2012-11-08 | Medvedovski Eugene | Tin Oxide Ceramic Sputtering Target and Method of Producing It |
| JP5389852B2 (ja) * | 2011-04-07 | 2014-01-15 | Ｊｘ日鉱日石金属株式会社 | 光情報記録媒体の保護膜 |
| JP5476636B2 (ja) * | 2011-05-23 | 2014-04-23 | Ｊｘ日鉱日石金属株式会社 | スパッタリングターゲットの製造方法及びスパッタリングターゲット |
| JP6212869B2 (ja) | 2012-02-06 | 2017-10-18 | 三菱マテリアル株式会社 | 酸化物スパッタリングターゲット |
| TW201422835A (zh) * | 2012-12-03 | 2014-06-16 | Solar Applied Mat Tech Corp | 濺鍍靶材及導電金屬氧化物薄膜 |
| CN105074045B (zh) * | 2013-04-08 | 2017-11-24 | 三菱综合材料株式会社 | 氧化物溅射靶、其制造方法及光记录介质用保护膜 |
| WO2017094227A1 (ja) * | 2015-12-01 | 2017-06-08 | ソニー株式会社 | 光記録媒体 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5026672A (en) * | 1990-06-25 | 1991-06-25 | Tektronix, Inc. | Method of fabricating a sintered body containing tin oxide |
| US6534183B1 (en) * | 1998-08-31 | 2003-03-18 | Idemitsu Kosan Co., Ltd. | Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film |
| JP4559553B2 (ja) * | 1999-03-05 | 2010-10-06 | 出光興産株式会社 | スパッタリング、エレクトロンビーム、イオンプレーティング用焼結体、透明導電ガラス及び透明導電フィルム |
| US6423161B1 (en) * | 1999-10-15 | 2002-07-23 | Honeywell International Inc. | High purity aluminum materials |
| JP4724330B2 (ja) * | 2001-09-07 | 2011-07-13 | 株式会社アルバック | 錫−アンチモン酸化物焼結体ターゲット及びその製造方法 |
-
2003
- 2003-11-25 JP JP2003394028A patent/JP4711244B2/ja not_active Expired - Lifetime
-
2004
- 2004-10-27 TW TW093132542A patent/TWI263686B/zh not_active IP Right Cessation
- 2004-11-25 CN CNB2004100962421A patent/CN100340698C/zh not_active Expired - Lifetime
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