JP2005146369A5 - - Google Patents

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Publication number
JP2005146369A5
JP2005146369A5 JP2003387309A JP2003387309A JP2005146369A5 JP 2005146369 A5 JP2005146369 A5 JP 2005146369A5 JP 2003387309 A JP2003387309 A JP 2003387309A JP 2003387309 A JP2003387309 A JP 2003387309A JP 2005146369 A5 JP2005146369 A5 JP 2005146369A5
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JP
Japan
Prior art keywords
target
sputtering apparatus
container
outer peripheral
thickness
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Application number
JP2003387309A
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English (en)
Japanese (ja)
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JP4197149B2 (ja
JP2005146369A (ja
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Priority to JP2003387309A priority Critical patent/JP4197149B2/ja
Priority claimed from JP2003387309A external-priority patent/JP4197149B2/ja
Publication of JP2005146369A publication Critical patent/JP2005146369A/ja
Publication of JP2005146369A5 publication Critical patent/JP2005146369A5/ja
Application granted granted Critical
Publication of JP4197149B2 publication Critical patent/JP4197149B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003387309A 2003-11-18 2003-11-18 スパッタリング装置 Expired - Fee Related JP4197149B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003387309A JP4197149B2 (ja) 2003-11-18 2003-11-18 スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003387309A JP4197149B2 (ja) 2003-11-18 2003-11-18 スパッタリング装置

Publications (3)

Publication Number Publication Date
JP2005146369A JP2005146369A (ja) 2005-06-09
JP2005146369A5 true JP2005146369A5 (https=) 2006-11-24
JP4197149B2 JP4197149B2 (ja) 2008-12-17

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ID=34694690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003387309A Expired - Fee Related JP4197149B2 (ja) 2003-11-18 2003-11-18 スパッタリング装置

Country Status (1)

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JP (1) JP4197149B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007011026A (ja) * 2005-06-30 2007-01-18 Ricoh Co Ltd 導電性部材、プロセスカートリッジ及び画像形成装置
JP4882332B2 (ja) * 2005-10-11 2012-02-22 大日本印刷株式会社 スパッタ装置
JP5300066B2 (ja) * 2009-04-15 2013-09-25 株式会社昭和真空 マグネトロンカソード
TWI558832B (zh) * 2011-12-30 2016-11-21 Hoya Corp An optical element, an optical thin film forming apparatus, and an optical thin film forming method
CN116213992A (zh) * 2022-09-07 2023-06-06 有研稀土新材料股份有限公司 一种稀土靶材、背板及稀土靶材焊接方法

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