JP2005141158A5 - - Google Patents
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- Publication number
- JP2005141158A5 JP2005141158A5 JP2003380075A JP2003380075A JP2005141158A5 JP 2005141158 A5 JP2005141158 A5 JP 2005141158A5 JP 2003380075 A JP2003380075 A JP 2003380075A JP 2003380075 A JP2003380075 A JP 2003380075A JP 2005141158 A5 JP2005141158 A5 JP 2005141158A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- light
- illumination optical
- mirror
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 claims 10
- 238000005286 illumination Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003380075A JP2005141158A (ja) | 2003-11-10 | 2003-11-10 | 照明光学系及び露光装置 |
| US10/980,341 US20050105290A1 (en) | 2003-11-10 | 2004-11-04 | Illumination optical system and exposure apparatus |
| TW093133867A TWI270120B (en) | 2003-11-10 | 2004-11-05 | Illumination optical system and exposure apparatus |
| EP04026463A EP1530087A3 (en) | 2003-11-10 | 2004-11-08 | Illumination optical system and exposure apparatus |
| KR1020040090676A KR20050045849A (ko) | 2003-11-10 | 2004-11-09 | 조명광학계 및 노광장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003380075A JP2005141158A (ja) | 2003-11-10 | 2003-11-10 | 照明光学系及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005141158A JP2005141158A (ja) | 2005-06-02 |
| JP2005141158A5 true JP2005141158A5 (US07179912-20070220-C00144.png) | 2006-12-14 |
Family
ID=34431393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003380075A Withdrawn JP2005141158A (ja) | 2003-11-10 | 2003-11-10 | 照明光学系及び露光装置 |
Country Status (5)
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005235959A (ja) * | 2004-02-18 | 2005-09-02 | Canon Inc | 光発生装置及び露光装置 |
| TWI417649B (zh) * | 2005-12-28 | 2013-12-01 | 尼康股份有限公司 | 十字標記運送裝置、曝光裝置、十字標記運送方法以及十字標記的處理方法 |
| US7470033B2 (en) * | 2006-03-24 | 2008-12-30 | Nikon Corporation | Reflection-type projection-optical systems, and exposure apparatus comprising same |
| TWI303115B (en) | 2006-04-13 | 2008-11-11 | Epistar Corp | Semiconductor light emitting device |
| EP2020165B1 (en) | 2006-05-16 | 2010-11-24 | Philips Intellectual Property & Standards GmbH | A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus |
| DE102006039655A1 (de) * | 2006-08-24 | 2008-03-20 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement |
| JP4989180B2 (ja) | 2006-10-13 | 2012-08-01 | キヤノン株式会社 | 照明光学系および露光装置 |
| JP4986754B2 (ja) * | 2007-07-27 | 2012-07-25 | キヤノン株式会社 | 照明光学系及びそれを有する露光装置 |
| JP5241270B2 (ja) * | 2008-02-27 | 2013-07-17 | キヤノン株式会社 | 照明光学系、これを用いた露光装置及びデバイス製造方法 |
| JP5142892B2 (ja) * | 2008-09-03 | 2013-02-13 | キヤノン株式会社 | 照明光学系及び露光装置 |
| JP5534910B2 (ja) * | 2009-04-23 | 2014-07-02 | ギガフォトン株式会社 | 極端紫外光源装置 |
| DE102017219179B3 (de) * | 2017-10-26 | 2018-12-27 | Carl Zeiss Smt Gmbh | Verfahren zum Wiedererstellen eines Beleuchtungssystems für eine EUV-Anlage, Detektormodul sowie Verfahren zum Überwachen eines in einer EUV-Anlage eingebauten Beleuchtungssystems |
| CN107870417B (zh) * | 2017-11-08 | 2020-12-22 | 北京仿真中心 | 一种背景辐射可控的红外点源目标模拟器 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5486919A (en) * | 1992-04-27 | 1996-01-23 | Canon Kabushiki Kaisha | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
| US5861952A (en) * | 1992-11-16 | 1999-01-19 | Canon Kabushiki Kaisha | Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position |
| JP3211538B2 (ja) * | 1994-01-13 | 2001-09-25 | キヤノン株式会社 | 検査装置及びそれを用いた半導体デバイスの製造方法 |
| JPH07209202A (ja) * | 1994-01-21 | 1995-08-11 | Canon Inc | 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法 |
| JP3183046B2 (ja) * | 1994-06-06 | 2001-07-03 | キヤノン株式会社 | 異物検査装置及びそれを用いた半導体デバイスの製造方法 |
| JPH0815169A (ja) * | 1994-06-28 | 1996-01-19 | Canon Inc | 異物検査装置及びそれを用いた半導体デバイスの製造 方法 |
| JPH09320952A (ja) * | 1996-05-29 | 1997-12-12 | Nikon Corp | 露光装置 |
| JP3706691B2 (ja) * | 1996-08-26 | 2005-10-12 | キヤノン株式会社 | Ｘ線縮小投影露光装置及びこれを用いた半導体デバイス製造方法 |
| JP3005203B2 (ja) * | 1997-03-24 | 2000-01-31 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
| US6398374B1 (en) * | 1998-12-31 | 2002-06-04 | The Regents Of The University Of California | Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography |
| US6392742B1 (en) * | 1999-06-01 | 2002-05-21 | Canon Kabushiki Kaisha | Illumination system and projection exposure apparatus |
| JP3919419B2 (ja) * | 2000-03-30 | 2007-05-23 | キヤノン株式会社 | 照明装置及びそれを有する露光装置 |
| DE10134387A1 (de) * | 2001-07-14 | 2003-01-23 | Zeiss Carl | Optisches System mit mehreren optischen Elementen |
| US6919951B2 (en) * | 2001-07-27 | 2005-07-19 | Canon Kabushiki Kaisha | Illumination system, projection exposure apparatus and device manufacturing method |
| AU2002354418A1 (en) * | 2001-12-12 | 2003-06-23 | Nikon Corporation | Reflective illuminating optical element, reflective illuminating optical system, and duv to euv exposure device |
| JP3564104B2 (ja) * | 2002-01-29 | 2004-09-08 | キヤノン株式会社 | 露光装置及びその制御方法、これを用いたデバイスの製造方法 |
| JP3720788B2 (ja) * | 2002-04-15 | 2005-11-30 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
-
2003
- 2003-11-10 JP JP2003380075A patent/JP2005141158A/ja not_active Withdrawn
-
2004
- 2004-11-04 US US10/980,341 patent/US20050105290A1/en not_active Abandoned
- 2004-11-05 TW TW093133867A patent/TWI270120B/zh not_active IP Right Cessation
- 2004-11-08 EP EP04026463A patent/EP1530087A3/en not_active Withdrawn
- 2004-11-09 KR KR1020040090676A patent/KR20050045849A/ko active IP Right Grant
