JP2005129674A - 走査露光装置およびデバイス製造方法 - Google Patents

走査露光装置およびデバイス製造方法 Download PDF

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Publication number
JP2005129674A
JP2005129674A JP2003362867A JP2003362867A JP2005129674A JP 2005129674 A JP2005129674 A JP 2005129674A JP 2003362867 A JP2003362867 A JP 2003362867A JP 2003362867 A JP2003362867 A JP 2003362867A JP 2005129674 A JP2005129674 A JP 2005129674A
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Japan
Prior art keywords
measurement
focus
exposure apparatus
surface shape
wafer
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
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JP2003362867A
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English (en)
Japanese (ja)
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JP2005129674A5 (enExample
Inventor
Hiroshi Kurosawa
博史 黒澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003362867A priority Critical patent/JP2005129674A/ja
Priority to US10/969,075 priority patent/US7292311B2/en
Publication of JP2005129674A publication Critical patent/JP2005129674A/ja
Publication of JP2005129674A5 publication Critical patent/JP2005129674A5/ja
Priority to US11/770,115 priority patent/US7812927B2/en
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003362867A 2003-10-23 2003-10-23 走査露光装置およびデバイス製造方法 Withdrawn JP2005129674A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003362867A JP2005129674A (ja) 2003-10-23 2003-10-23 走査露光装置およびデバイス製造方法
US10/969,075 US7292311B2 (en) 2003-10-23 2004-10-21 Scanning exposure technique
US11/770,115 US7812927B2 (en) 2003-10-23 2007-06-28 Scanning exposure technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003362867A JP2005129674A (ja) 2003-10-23 2003-10-23 走査露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2005129674A true JP2005129674A (ja) 2005-05-19
JP2005129674A5 JP2005129674A5 (enExample) 2006-12-07

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JP2003362867A Withdrawn JP2005129674A (ja) 2003-10-23 2003-10-23 走査露光装置およびデバイス製造方法

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US (2) US7292311B2 (enExample)
JP (1) JP2005129674A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7474381B2 (en) 2007-04-27 2009-01-06 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP2009182334A (ja) * 2009-03-04 2009-08-13 Canon Inc 露光装置及びデバイス製造方法
JP2012004354A (ja) * 2010-06-17 2012-01-05 Canon Inc インプリント方法及びインプリント装置、サンプルショット抽出方法、並びにそれを用いた物品の製造方法
JP2015002260A (ja) * 2013-06-14 2015-01-05 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、それを用いた物品の製造方法
KR20200002621A (ko) * 2018-06-29 2020-01-08 캐논 가부시끼가이샤 노광 장치 및 물품의 제조 방법
JP2020109531A (ja) * 2020-04-02 2020-07-16 キヤノン株式会社 露光装置、露光方法、および物品製造方法
JP2023088697A (ja) * 2021-12-15 2023-06-27 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10315086B4 (de) * 2003-04-02 2006-08-24 Infineon Technologies Ag Verfahren und Vorrichtung zum Ausrichten von Halbleiterwafern bei der Halbleiterherstellung
JP4315455B2 (ja) * 2006-04-04 2009-08-19 キヤノン株式会社 露光装置及びデバイス製造方法
JP4250637B2 (ja) * 2006-06-14 2009-04-08 キヤノン株式会社 走査露光装置及びデバイス製造方法
JP2008066634A (ja) * 2006-09-11 2008-03-21 Canon Inc 露光装置
JP2008288347A (ja) * 2007-05-16 2008-11-27 Canon Inc 露光装置及びデバイス製造方法
US8725504B1 (en) 2007-06-06 2014-05-13 Nvidia Corporation Inverse quantization in audio decoding
US8726125B1 (en) * 2007-06-06 2014-05-13 Nvidia Corporation Reducing interpolation error
DE102007030390B4 (de) * 2007-06-29 2010-05-12 Vistec Semiconductor Systems Gmbh Koordinaten-Messmaschine und Verfahren zur Kalibrierung der Koordinaten-Messmaschine
US8218129B2 (en) * 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8934539B2 (en) 2007-12-03 2015-01-13 Nvidia Corporation Vector processor acceleration for media quantization
US8001495B2 (en) 2008-04-17 2011-08-16 International Business Machines Corporation System and method of predicting problematic areas for lithography in a circuit design
US8441640B2 (en) * 2008-05-02 2013-05-14 Applied Materials, Inc. Non-contact substrate support position sensing system and corresponding adjustments
US8203695B2 (en) * 2008-11-03 2012-06-19 Micron Technology, Inc. Photolithography systems and associated methods of focus correction
CN103309167B (zh) * 2012-03-09 2015-06-17 上海微电子装备有限公司 运动台定位精度的测量系统及测量方法
KR101593171B1 (ko) * 2014-05-30 2016-02-15 한국전자통신연구원 차량 정보 유출 방지 장치 및 그 방법
US9767065B2 (en) * 2014-08-21 2017-09-19 GM Global Technology Operations LLC Dynamic vehicle bus subscription
WO2017062852A1 (en) * 2015-10-09 2017-04-13 Applied Materials, Inc. Diode laser for wafer heating for epi processes
CN107966880B (zh) * 2017-03-15 2019-01-11 上海微电子装备（集团）股份有限公司 一种用于光刻机的垂向控制方法
JP7173730B2 (ja) * 2017-11-24 2022-11-16 キヤノン株式会社 処理装置を管理する管理方法、管理装置、プログラム、および、物品製造方法
CN114171500B (zh) * 2021-12-07 2024-04-09 成都海威华芯科技有限公司 一种版图定位标记绘制方法、基于其制备的芯片及晶圆
CN118409496B (zh) * 2024-07-01 2024-11-01 中国电子科技集团公司第十四研究所 迭代计算星载滑聚sar场景中心时刻的方法、星载合成孔径雷达

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07113548B2 (ja) 1986-06-19 1995-12-06 株式会社ニコン 表面変位検出装置
US4748333A (en) 1986-03-31 1988-05-31 Nippon Kogaku K. K. Surface displacement sensor with opening angle control
JPH0652707B2 (ja) 1988-10-11 1994-07-06 キヤノン株式会社 面位置検出方法
DE69023186T2 (de) * 1989-08-07 1996-03-28 Canon K.K., Tokio/Tokyo Belichtungsvorrichtung.
JP2777915B2 (ja) * 1989-08-30 1998-07-23 キヤノン株式会社 位置合わせ機構
JP3307988B2 (ja) 1992-07-17 2002-07-29 株式会社ニコン 投影露光方法及び装置
JPH0652707A (ja) 1992-07-29 1994-02-25 Yazaki Corp 表示装置
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JP3360401B2 (ja) 1994-03-28 2002-12-24 株式会社ニコン 投影露光装置
KR100363922B1 (ko) * 1993-12-06 2003-08-21 가부시키가이샤 니콘 노광장치및노광방법
US5883701A (en) * 1995-09-21 1999-03-16 Canon Kabushiki Kaisha Scanning projection exposure method and apparatus
JP3459742B2 (ja) * 1996-01-17 2003-10-27 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JP4585649B2 (ja) * 2000-05-19 2010-11-24 キヤノン株式会社 露光装置およびデバイス製造方法
JP2002222760A (ja) * 2001-01-29 2002-08-09 Canon Inc 露光方法及び露光装置並びにデバイスの製造方法
JP3559766B2 (ja) * 2001-02-21 2004-09-02 キヤノン株式会社 走査露光装置及び走査露光方法並びにデバイスの製造方法
JP3971174B2 (ja) * 2001-12-04 2007-09-05 株式会社アドバンテスト 露光方法、電子ビーム露光装置、及び電子部品製造方法
JP4125177B2 (ja) 2003-05-16 2008-07-30 キヤノン株式会社 露光装置
JP2005045164A (ja) * 2003-07-25 2005-02-17 Toshiba Corp 自動焦点合わせ装置

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7474381B2 (en) 2007-04-27 2009-01-06 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP2009182334A (ja) * 2009-03-04 2009-08-13 Canon Inc 露光装置及びデバイス製造方法
JP2012004354A (ja) * 2010-06-17 2012-01-05 Canon Inc インプリント方法及びインプリント装置、サンプルショット抽出方法、並びにそれを用いた物品の製造方法
US9651860B2 (en) 2010-06-17 2017-05-16 Canon Kabushiki Kaisha Imprinting method and imprinting apparatus, sample shot extraction method, and article manufacturing method using same
US10416552B2 (en) 2010-06-17 2019-09-17 Canon Kabushiki Kaisha Imprinting method and imprinting apparatus, sample shot extraction method, and article manufacturing method using same
JP2015002260A (ja) * 2013-06-14 2015-01-05 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、それを用いた物品の製造方法
KR20200002621A (ko) * 2018-06-29 2020-01-08 캐논 가부시끼가이샤 노광 장치 및 물품의 제조 방법
JP2020003737A (ja) * 2018-06-29 2020-01-09 キヤノン株式会社 露光装置および物品の製造方法
JP7114370B2 (ja) 2018-06-29 2022-08-08 キヤノン株式会社 露光装置および物品の製造方法
KR102523304B1 (ko) * 2018-06-29 2023-04-20 캐논 가부시끼가이샤 노광 장치 및 물품의 제조 방법
JP2020109531A (ja) * 2020-04-02 2020-07-16 キヤノン株式会社 露光装置、露光方法、および物品製造方法
JP2023088697A (ja) * 2021-12-15 2023-06-27 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
US11835869B2 (en) 2021-12-15 2023-12-05 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and method of manufacturing article
JP7538790B2 (ja) 2021-12-15 2024-08-22 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
US12072638B2 (en) 2021-12-15 2024-08-27 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and method of manufacturing article

Also Published As

Publication number Publication date
US7292311B2 (en) 2007-11-06
US20070250290A1 (en) 2007-10-25
US7812927B2 (en) 2010-10-12
US20050088636A1 (en) 2005-04-28

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