JP2005126757A - 化合物薄膜の製造装置および方法 - Google Patents

化合物薄膜の製造装置および方法 Download PDF

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Publication number
JP2005126757A
JP2005126757A JP2003362626A JP2003362626A JP2005126757A JP 2005126757 A JP2005126757 A JP 2005126757A JP 2003362626 A JP2003362626 A JP 2003362626A JP 2003362626 A JP2003362626 A JP 2003362626A JP 2005126757 A JP2005126757 A JP 2005126757A
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Japan
Prior art keywords
thin film
compound thin
substrate
film forming
vib
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JP2003362626A
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English (en)
Japanese (ja)
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JP2005126757A5 (enExample
Inventor
Hironobu Inoue
浩伸 井上
Kimihiko Kitani
王彦 木谷
Tadashi Kimura
忠司 木村
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Priority to JP2003362626A priority Critical patent/JP2005126757A/ja
Publication of JP2005126757A publication Critical patent/JP2005126757A/ja
Publication of JP2005126757A5 publication Critical patent/JP2005126757A5/ja
Pending legal-status Critical Current

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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
JP2003362626A 2003-10-23 2003-10-23 化合物薄膜の製造装置および方法 Pending JP2005126757A (ja)

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JP2003362626A JP2005126757A (ja) 2003-10-23 2003-10-23 化合物薄膜の製造装置および方法

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JP2003362626A JP2005126757A (ja) 2003-10-23 2003-10-23 化合物薄膜の製造装置および方法

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JP2005126757A true JP2005126757A (ja) 2005-05-19
JP2005126757A5 JP2005126757A5 (enExample) 2006-11-02

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069740A1 (ja) * 2007-11-30 2009-06-04 Tokyo Electron Limited 成膜装置の制御方法、成膜方法、成膜装置、有機ｅｌ電子デバイスおよびその制御プログラムを格納した記憶媒体
JP2011060865A (ja) * 2009-09-07 2011-03-24 Optorun Co Ltd リニア蒸着源とその使用方法、成膜装置並びに成膜方法
JP2011060866A (ja) * 2009-09-07 2011-03-24 Optorun Co Ltd 多元素同時レートモニターシステム、多元素同時レートモニター方法、成膜装置及び成膜方法
DE102009047483A1 (de) * 2009-12-04 2011-06-09 Sulfurcell Solartechnik Gmbh Vorrichtung und Verfahren zur Erzeugung von Chalkopyrit-Absorberschichten in Solarzellen
JP2011176148A (ja) * 2010-02-24 2011-09-08 Nitto Denko Corp 太陽電池モジュールの製造方法およびそれを用いて得られた太陽電池モジュール
CN103132023A (zh) * 2011-11-21 2013-06-05 绿阳光电股份有限公司 快速加热处理系统及其硫化方法
WO2014010371A1 (ja) * 2012-07-09 2014-01-16 日東電工株式会社 化合物太陽電池の製法
CN103966551A (zh) * 2013-01-27 2014-08-06 常州碳维纳米科技有限公司 一种解决高温下衬底原子蒸发影响平整度的方法及装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009069740A1 (ja) * 2007-11-30 2009-06-04 Tokyo Electron Limited 成膜装置の制御方法、成膜方法、成膜装置、有機ｅｌ電子デバイスおよびその制御プログラムを格納した記憶媒体
JP2009132977A (ja) * 2007-11-30 2009-06-18 Tokyo Electron Ltd 成膜装置の制御方法、成膜方法、成膜装置、有機ｅｌ電子デバイスおよびその制御プログラムを格納した記憶媒体
US20100259162A1 (en) * 2007-11-30 2010-10-14 Tokyo Electron Limited Film forming device control method, film forming method, film forming device, organic el electronic device, and recording medium storing its control program
JP2011060865A (ja) * 2009-09-07 2011-03-24 Optorun Co Ltd リニア蒸着源とその使用方法、成膜装置並びに成膜方法
JP2011060866A (ja) * 2009-09-07 2011-03-24 Optorun Co Ltd 多元素同時レートモニターシステム、多元素同時レートモニター方法、成膜装置及び成膜方法
DE102009047483A1 (de) * 2009-12-04 2011-06-09 Sulfurcell Solartechnik Gmbh Vorrichtung und Verfahren zur Erzeugung von Chalkopyrit-Absorberschichten in Solarzellen
WO2011067179A3 (de) * 2009-12-04 2011-11-24 Sulfurcell Solartechnik Gmbh Vorrichtung und verfahren zur erzeugung von chalkopyrit-absorberschichten in solarzellen
JP2011176148A (ja) * 2010-02-24 2011-09-08 Nitto Denko Corp 太陽電池モジュールの製造方法およびそれを用いて得られた太陽電池モジュール
CN103132023A (zh) * 2011-11-21 2013-06-05 绿阳光电股份有限公司 快速加热处理系统及其硫化方法
WO2014010371A1 (ja) * 2012-07-09 2014-01-16 日東電工株式会社 化合物太陽電池の製法
CN103966551A (zh) * 2013-01-27 2014-08-06 常州碳维纳米科技有限公司 一种解决高温下衬底原子蒸发影响平整度的方法及装置
CN103966551B (zh) * 2013-01-27 2016-11-23 常州国成新材料科技有限公司 一种解决高温下衬底原子蒸发影响平整度的方法及装置

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