JP2005101524A5 - - Google Patents

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Publication number
JP2005101524A5
JP2005101524A5 JP2004180094A JP2004180094A JP2005101524A5 JP 2005101524 A5 JP2005101524 A5 JP 2005101524A5 JP 2004180094 A JP2004180094 A JP 2004180094A JP 2004180094 A JP2004180094 A JP 2004180094A JP 2005101524 A5 JP2005101524 A5 JP 2005101524A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004180094A
Other versions
JP4290075B2 (ja
JP2005101524A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004180094A priority Critical patent/JP4290075B2/ja
Priority claimed from JP2004180094A external-priority patent/JP4290075B2/ja
Priority to TW093122615A priority patent/TWI248156B/zh
Priority to KR1020040065530A priority patent/KR100979976B1/ko
Priority to US10/923,309 priority patent/US7578304B2/en
Publication of JP2005101524A publication Critical patent/JP2005101524A/ja
Publication of JP2005101524A5 publication Critical patent/JP2005101524A5/ja
Application granted granted Critical
Publication of JP4290075B2 publication Critical patent/JP4290075B2/ja
Anticipated expiration legal-status Critical
Active legal-status Critical Current

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JP2004180094A 2003-08-19 2004-06-17 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法 Active JP4290075B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004180094A JP4290075B2 (ja) 2003-08-19 2004-06-17 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法
TW093122615A TWI248156B (en) 2003-08-19 2004-07-28 Cleaning and drying apparatus for substrate holder chuck and method thereof
KR1020040065530A KR100979976B1 (ko) 2003-08-19 2004-08-19 기판 유지용 척의 세정·건조 장치 및 기판 유지용 척의세정·건조 방법
US10/923,309 US7578304B2 (en) 2003-08-19 2004-08-19 Cleaning and drying apparatus for substrate holder chuck and method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003294792 2003-08-19
JP2004180094A JP4290075B2 (ja) 2003-08-19 2004-06-17 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法

Publications (3)

Publication Number Publication Date
JP2005101524A JP2005101524A (ja) 2005-04-14
JP2005101524A5 true JP2005101524A5 (ja) 2006-09-21
JP4290075B2 JP4290075B2 (ja) 2009-07-01

Family

ID=34197156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004180094A Active JP4290075B2 (ja) 2003-08-19 2004-06-17 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法

Country Status (4)

Country Link
US (1) US7578304B2 (ja)
JP (1) JP4290075B2 (ja)
KR (1) KR100979976B1 (ja)
TW (1) TWI248156B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4347156B2 (ja) * 2004-07-28 2009-10-21 大日本スクリーン製造株式会社 基板処理装置
JP2006186263A (ja) * 2004-12-28 2006-07-13 Disco Abrasive Syst Ltd 被加工物保持装置
JP4979412B2 (ja) * 2007-02-26 2012-07-18 大日本スクリーン製造株式会社 基板処理装置のスケジュール作成方法及びそのプログラム
US7865553B1 (en) 2007-03-22 2011-01-04 Google Inc. Chat system without topic-specific rooms
US7899869B1 (en) 2007-03-22 2011-03-01 Google Inc. Broadcasting in chat system without topic-specific rooms
KR100958793B1 (ko) * 2007-09-28 2010-05-18 주식회사 실트론 웨이퍼 쉽핑박스의 세정을 위한 박스 크리너
KR100921520B1 (ko) * 2007-10-05 2009-10-12 세메스 주식회사 척 세정 장치 및 방법 그리고 이를 구비하는 기판 처리장치 및 그의 척 세정 방법
JP4950247B2 (ja) * 2009-05-12 2012-06-13 東京エレクトロン株式会社 洗浄装置、基板処理システム、洗浄方法、プログラムおよび記憶媒体
JP2012004204A (ja) * 2010-06-15 2012-01-05 Disco Abrasive Syst Ltd パッド洗浄装置およびパッド洗浄方法
ITMI20110646A1 (it) * 2011-04-15 2012-10-16 St Microelectronics Srl Apparecchiatura per la lavorazione di wafer semiconduttori, in particolare per realizzare una fase di processo di rimozione di polimeri.
US10441980B2 (en) 2014-04-22 2019-10-15 Fuji Corporation Nozzle cleaning device and nozzle drying method
CN106252258B (zh) * 2015-06-15 2018-12-07 株式会社思可林集团 基板处理装置
TWI729584B (zh) * 2019-11-22 2021-06-01 佳宸科技有限公司 濕製程用清潔機構

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4619845A (en) * 1985-02-22 1986-10-28 The United States Of America As Represented By The Secretary Of The Navy Method for generating fine sprays of molten metal for spray coating and powder making
US4957783A (en) * 1988-10-05 1990-09-18 Nordson Corporation Method and apparatus for dispensing droplets of molten thermoplastic adhesive
US5226437A (en) * 1990-11-28 1993-07-13 Tokyo Electron Limited Washing apparatus
US5253663A (en) * 1991-08-26 1993-10-19 Tokyo Electron Limited Transfer apparatus
US5379784A (en) * 1993-01-23 1995-01-10 Tokyo Electron Limited Apparatus for cleaning conveyor chuck
JPH0969509A (ja) * 1995-09-01 1997-03-11 Matsushita Electron Corp 半導体ウェーハの洗浄・エッチング・乾燥装置及びその使用方法
US6491764B2 (en) * 1997-09-24 2002-12-10 Interuniversitair Microelektronics Centrum (Imec) Method and apparatus for removing a liquid from a surface of a rotating substrate
JP3661075B2 (ja) 1998-06-23 2005-06-15 東京エレクトロン株式会社 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法
JP3613782B2 (ja) 1998-06-23 2005-01-26 東京エレクトロン株式会社 基板保持用チャックの洗浄・乾燥装置及び基板保持用チャックの洗浄・乾燥方法
JP2003224103A (ja) 2002-01-31 2003-08-08 Kakizaki Mamufacuturing Co Ltd ウエハキャリアの洗浄方法

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