JP2005083948A - 検査装置及び検査方法並びにプロセス管理方法 - Google Patents

検査装置及び検査方法並びにプロセス管理方法 Download PDF

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Publication number
JP2005083948A
JP2005083948A JP2003317700A JP2003317700A JP2005083948A JP 2005083948 A JP2005083948 A JP 2005083948A JP 2003317700 A JP2003317700 A JP 2003317700A JP 2003317700 A JP2003317700 A JP 2003317700A JP 2005083948 A JP2005083948 A JP 2005083948A
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Japan
Prior art keywords
sample
electron beam
image
inspection apparatus
inspection
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Pending
Application number
JP2003317700A
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English (en)
Japanese (ja)
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JP2005083948A5 (enExample
Inventor
Hiroshi Makino
浩士 牧野
Hisaya Murakoshi
久弥 村越
Hiroyuki Shinada
博之 品田
Hideo Todokoro
秀男 戸所
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2003317700A priority Critical patent/JP2005083948A/ja
Priority to US10/885,725 priority patent/US7075076B2/en
Publication of JP2005083948A publication Critical patent/JP2005083948A/ja
Priority to US11/450,459 priority patent/US7411190B2/en
Publication of JP2005083948A5 publication Critical patent/JP2005083948A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2003317700A 2003-09-10 2003-09-10 検査装置及び検査方法並びにプロセス管理方法 Pending JP2005083948A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003317700A JP2005083948A (ja) 2003-09-10 2003-09-10 検査装置及び検査方法並びにプロセス管理方法
US10/885,725 US7075076B2 (en) 2003-09-10 2004-07-08 Inspection system, inspection method, and process management method
US11/450,459 US7411190B2 (en) 2003-09-10 2006-06-12 Inspection system, inspection method, and process management method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003317700A JP2005083948A (ja) 2003-09-10 2003-09-10 検査装置及び検査方法並びにプロセス管理方法

Publications (2)

Publication Number Publication Date
JP2005083948A true JP2005083948A (ja) 2005-03-31
JP2005083948A5 JP2005083948A5 (enExample) 2006-10-05

Family

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JP2003317700A Pending JP2005083948A (ja) 2003-09-10 2003-09-10 検査装置及び検査方法並びにプロセス管理方法

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US (2) US7075076B2 (enExample)
JP (1) JP2005083948A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051902A (ja) * 2005-08-17 2007-03-01 Hitachi High-Technologies Corp 写像投影型電子線式検査装置及びその方法
KR100688974B1 (ko) 2006-03-09 2007-03-08 삼성전자주식회사 진공챔버 내 하전입자빔 검사장치
JP2007206005A (ja) * 2006-02-06 2007-08-16 Hitachi High-Technologies Corp パターン欠陥検査方法および装置
JP2008304206A (ja) * 2007-06-05 2008-12-18 Hitachi Ltd 磁気記録媒体の欠陥検査装置及び欠陥検査方法
JP2011192654A (ja) * 2006-01-25 2011-09-29 Ebara Corp 試料表面検査方法及び検査装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005083948A (ja) * 2003-09-10 2005-03-31 Hitachi High-Technologies Corp 検査装置及び検査方法並びにプロセス管理方法
WO2005074002A2 (en) * 2004-01-29 2005-08-11 Applied Materials Israel, Ltd. Focusing system and method for a charged particle imaging system
JP2007207688A (ja) * 2006-02-06 2007-08-16 Hitachi High-Technologies Corp ミラー電子顕微鏡およびミラー電子顕微鏡を用いた検査装置
US7684609B1 (en) 2006-05-25 2010-03-23 Kla-Tencor Technologies Corporation Defect review using image segmentation
JP4709168B2 (ja) * 2007-01-04 2011-06-22 株式会社日立ハイテクノロジーズ レポート検索方法，レポート検索システム、およびレビュー装置
DE102008009410B4 (de) * 2008-02-15 2010-04-08 PTR Präzisionstechnik GmbH Elektronenstrahlvorrichtung und Verfahren zum Justieren eines Elektronenstrahls
US7932495B2 (en) * 2008-09-02 2011-04-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Fast wafer inspection system
US10928021B2 (en) * 2008-12-30 2021-02-23 Tseng-Lu Chien LED and/or laser outdoor projection light device having more than one inner and/or outer rotating optic-piece to create moving, changeable lighted image and/or pattern
JP6108674B2 (ja) * 2012-03-16 2017-04-05 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置及び試料搬送装置
US9128064B2 (en) 2012-05-29 2015-09-08 Kla-Tencor Corporation Super resolution inspection system
US9536697B2 (en) * 2015-05-19 2017-01-03 Hermes Microvision Inc. System and method for calibrating charge-regulating module
JP6599698B2 (ja) * 2015-08-31 2019-10-30 株式会社ミツトヨ 画像測定装置及びその制御プログラム
KR102368587B1 (ko) 2015-10-21 2022-03-02 삼성전자주식회사 검사 장치, 그를 포함하는 반도체 소자의 제조 시스템, 및 반도체 소자의 제조 방법
CN113573012B (zh) * 2021-06-08 2024-05-07 四川临丰医疗科技有限公司 一种基于大数据的药品安全智能检测预警与管理系统
US20240085470A1 (en) * 2022-07-12 2024-03-14 Femtometrix, Inc. Method and apparatus for non-invasive, non-intrusive, and un-grounded, simultaneous corona deposition and shg measurements

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01137957A (ja) 1987-11-19 1989-05-30 Hachiban:Kk スープ原料とその製造方法
JP3455069B2 (ja) 1997-07-23 2003-10-06 株式会社東芝 パターン検査装置
JP3534582B2 (ja) 1997-10-02 2004-06-07 株式会社日立製作所 パターン欠陥検査方法および検査装置
JP4163344B2 (ja) * 1999-03-05 2008-10-08 株式会社東芝 基板検査方法および基板検査システム
JP2000286310A (ja) 1999-03-31 2000-10-13 Hitachi Ltd パターン欠陥検査方法および検査装置
JP3767341B2 (ja) * 2000-07-21 2006-04-19 株式会社日立製作所 電子線を用いたパターン検査方法及びその装置
JP3996774B2 (ja) * 2002-01-09 2007-10-24 株式会社日立ハイテクノロジーズ パターン欠陥検査方法及びパターン欠陥検査装置
JP2005083948A (ja) * 2003-09-10 2005-03-31 Hitachi High-Technologies Corp 検査装置及び検査方法並びにプロセス管理方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051902A (ja) * 2005-08-17 2007-03-01 Hitachi High-Technologies Corp 写像投影型電子線式検査装置及びその方法
JP2011192654A (ja) * 2006-01-25 2011-09-29 Ebara Corp 試料表面検査方法及び検査装置
JP2007206005A (ja) * 2006-02-06 2007-08-16 Hitachi High-Technologies Corp パターン欠陥検査方法および装置
KR100688974B1 (ko) 2006-03-09 2007-03-08 삼성전자주식회사 진공챔버 내 하전입자빔 검사장치
JP2008304206A (ja) * 2007-06-05 2008-12-18 Hitachi Ltd 磁気記録媒体の欠陥検査装置及び欠陥検査方法

Also Published As

Publication number Publication date
US20060231758A1 (en) 2006-10-19
US7411190B2 (en) 2008-08-12
US7075076B2 (en) 2006-07-11
US20050051722A1 (en) 2005-03-10

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