JP2005049667A - 液晶表示装置とその製造方法 - Google Patents

液晶表示装置とその製造方法 Download PDF

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Publication number
JP2005049667A
JP2005049667A JP2003282303A JP2003282303A JP2005049667A JP 2005049667 A JP2005049667 A JP 2005049667A JP 2003282303 A JP2003282303 A JP 2003282303A JP 2003282303 A JP2003282303 A JP 2003282303A JP 2005049667 A JP2005049667 A JP 2005049667A
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JP
Japan
Prior art keywords
layer
scanning line
electrode
amorphous silicon
signal line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003282303A
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English (en)
Japanese (ja)
Inventor
Kiyohiro Kawasaki
清弘 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Quanta Display Japan Inc
Quanta Display Inc
Original Assignee
Quanta Display Japan Inc
Quanta Display Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quanta Display Japan Inc, Quanta Display Inc filed Critical Quanta Display Japan Inc
Priority to JP2003282303A priority Critical patent/JP2005049667A/ja
Priority to TW093109980A priority patent/TW200510884A/zh
Priority to CN200410055707.9A priority patent/CN1591141A/zh
Publication of JP2005049667A publication Critical patent/JP2005049667A/ja
Pending legal-status Critical Current

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JP2003282303A 2003-07-30 2003-07-30 液晶表示装置とその製造方法 Pending JP2005049667A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003282303A JP2005049667A (ja) 2003-07-30 2003-07-30 液晶表示装置とその製造方法
TW093109980A TW200510884A (en) 2003-07-30 2004-04-09 Liquid crystal display and its manufacturing method
CN200410055707.9A CN1591141A (zh) 2003-07-30 2004-07-30 液晶显示装置及其制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003282303A JP2005049667A (ja) 2003-07-30 2003-07-30 液晶表示装置とその製造方法

Publications (1)

Publication Number Publication Date
JP2005049667A true JP2005049667A (ja) 2005-02-24

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ID=34267553

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003282303A Pending JP2005049667A (ja) 2003-07-30 2003-07-30 液晶表示装置とその製造方法

Country Status (3)

Country Link
JP (1) JP2005049667A (enExample)
CN (1) CN1591141A (enExample)
TW (1) TW200510884A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007040194A1 (ja) 2005-10-05 2007-04-12 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及びｔｆｔ基板の製造方法
WO2007088722A1 (ja) 2006-01-31 2007-08-09 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及び反射型ｔｆｔ基板並びにそれらの製造方法
WO2007091405A1 (ja) 2006-02-09 2007-08-16 Idemitsu Kosan Co., Ltd. 反射型ｔｆｔ基板及び反射型ｔｆｔ基板の製造方法
US7291439B2 (en) 2005-07-08 2007-11-06 Samsung Electronics Co., Ltd. Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same
US8263977B2 (en) 2005-12-02 2012-09-11 Idemitsu Kosan Co., Ltd. TFT substrate and TFT substrate manufacturing method
US8481351B2 (en) 2008-12-19 2013-07-09 Sharp Kabushiki Kaisha Active matrix substrate manufacturing method and liquid crystal display device manufacturing method

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100405194C (zh) * 2004-11-29 2008-07-23 友达光电股份有限公司 液晶显示装置及其制造方法
CN100465747C (zh) * 2005-09-30 2009-03-04 乐金显示有限公司 液晶显示器件及其制造方法
CN101656232B (zh) * 2008-08-19 2011-10-12 北京京东方光电科技有限公司 薄膜晶体管阵列基板制造方法
US20250188639A1 (en) * 2023-12-06 2025-06-12 Mikro Mesa Technology Co., Ltd. Method of manufacturing structure having anodized parts

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7291439B2 (en) 2005-07-08 2007-11-06 Samsung Electronics Co., Ltd. Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same
WO2007040194A1 (ja) 2005-10-05 2007-04-12 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及びｔｆｔ基板の製造方法
US7982215B2 (en) 2005-10-05 2011-07-19 Idemitsu Kosan Co., Ltd. TFT substrate and method for manufacturing TFT substrate
US8030195B2 (en) 2005-10-05 2011-10-04 Idemitsu Kosan Co., Ltd. TFT substrate and method for manufacturing TFT substrate
US8263977B2 (en) 2005-12-02 2012-09-11 Idemitsu Kosan Co., Ltd. TFT substrate and TFT substrate manufacturing method
US8778722B2 (en) 2005-12-02 2014-07-15 Idemitsu Kosan Co., Ltd. TFT substrate and method for producing TFT substrate
WO2007088722A1 (ja) 2006-01-31 2007-08-09 Idemitsu Kosan Co., Ltd. Ｔｆｔ基板及び反射型ｔｆｔ基板並びにそれらの製造方法
WO2007091405A1 (ja) 2006-02-09 2007-08-16 Idemitsu Kosan Co., Ltd. 反射型ｔｆｔ基板及び反射型ｔｆｔ基板の製造方法
US8481351B2 (en) 2008-12-19 2013-07-09 Sharp Kabushiki Kaisha Active matrix substrate manufacturing method and liquid crystal display device manufacturing method

Also Published As

Publication number Publication date
TWI305288B (enExample) 2009-01-11
CN1591141A (zh) 2005-03-09
TW200510884A (en) 2005-03-16

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