CN1591141A - 液晶显示装置及其制造方法 - Google Patents

液晶显示装置及其制造方法 Download PDF

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Publication number
CN1591141A
CN1591141A CN200410055707.9A CN200410055707A CN1591141A CN 1591141 A CN1591141 A CN 1591141A CN 200410055707 A CN200410055707 A CN 200410055707A CN 1591141 A CN1591141 A CN 1591141A
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CN
China
Prior art keywords
layer
electrode
scanning line
insulating substrate
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200410055707.9A
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English (en)
Chinese (zh)
Inventor
川崎清弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Quanta Display Japan Inc
Quanta Display Inc
Original Assignee
Quanta Display Japan Inc
Quanta Display Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quanta Display Japan Inc, Quanta Display Inc filed Critical Quanta Display Japan Inc
Publication of CN1591141A publication Critical patent/CN1591141A/zh
Pending legal-status Critical Current

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CN200410055707.9A 2003-07-30 2004-07-30 液晶显示装置及其制造方法 Pending CN1591141A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003282303 2003-07-30
JP2003282303A JP2005049667A (ja) 2003-07-30 2003-07-30 液晶表示装置とその製造方法

Publications (1)

Publication Number Publication Date
CN1591141A true CN1591141A (zh) 2005-03-09

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ID=34267553

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200410055707.9A Pending CN1591141A (zh) 2003-07-30 2004-07-30 液晶显示装置及其制造方法

Country Status (3)

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JP (1) JP2005049667A (enExample)
CN (1) CN1591141A (enExample)
TW (1) TW200510884A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100405194C (zh) * 2004-11-29 2008-07-23 友达光电股份有限公司 液晶显示装置及其制造方法
CN100465747C (zh) * 2005-09-30 2009-03-04 乐金显示有限公司 液晶显示器件及其制造方法
CN101656232B (zh) * 2008-08-19 2011-10-12 北京京东方光电科技有限公司 薄膜晶体管阵列基板制造方法
TWI900319B (zh) * 2023-12-06 2025-10-01 薩摩亞商美科米尚技術有限公司 製造具有陽極氧化部分的結構的方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101240643B1 (ko) 2005-07-08 2013-03-08 삼성디스플레이 주식회사 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한 패턴의 형성 방법 및 이를 이용한 박막 트랜지스터표시판의 제조 방법
KR101268670B1 (ko) 2005-10-05 2013-05-29 이데미쓰 고산 가부시키가이샤 Ｔｆｔ 기판 및 ｔｆｔ 기판의 제조 방법
CN101336485B (zh) 2005-12-02 2012-09-26 出光兴产株式会社 Tft基板及tft基板的制造方法
CN102244103A (zh) 2006-01-31 2011-11-16 出光兴产株式会社 Tft基板
JP2007212699A (ja) 2006-02-09 2007-08-23 Idemitsu Kosan Co Ltd 反射型ｔｆｔ基板及び反射型ｔｆｔ基板の製造方法
US8481351B2 (en) 2008-12-19 2013-07-09 Sharp Kabushiki Kaisha Active matrix substrate manufacturing method and liquid crystal display device manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100405194C (zh) * 2004-11-29 2008-07-23 友达光电股份有限公司 液晶显示装置及其制造方法
CN100465747C (zh) * 2005-09-30 2009-03-04 乐金显示有限公司 液晶显示器件及其制造方法
CN101656232B (zh) * 2008-08-19 2011-10-12 北京京东方光电科技有限公司 薄膜晶体管阵列基板制造方法
TWI900319B (zh) * 2023-12-06 2025-10-01 薩摩亞商美科米尚技術有限公司 製造具有陽極氧化部分的結構的方法

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Publication number Publication date
JP2005049667A (ja) 2005-02-24
TWI305288B (enExample) 2009-01-11
TW200510884A (en) 2005-03-16

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