JP2005023398A - メッキ方法およびメッキ装置 - Google Patents
メッキ方法およびメッキ装置 Download PDFInfo
- Publication number
- JP2005023398A JP2005023398A JP2003192500A JP2003192500A JP2005023398A JP 2005023398 A JP2005023398 A JP 2005023398A JP 2003192500 A JP2003192500 A JP 2003192500A JP 2003192500 A JP2003192500 A JP 2003192500A JP 2005023398 A JP2005023398 A JP 2005023398A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plated
- carrier tape
- storage recess
- cathode member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 84
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 238000003860 storage Methods 0.000 claims description 33
- 238000004140 cleaning Methods 0.000 claims description 17
- 238000011144 upstream manufacturing Methods 0.000 claims description 10
- 239000000243 solution Substances 0.000 description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/28—Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Electrical Connectors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003192500A JP2005023398A (ja) | 2003-07-04 | 2003-07-04 | メッキ方法およびメッキ装置 |
| US10/717,584 US20050006243A1 (en) | 2003-07-04 | 2003-11-21 | Plating method and plating apparatus |
| EP03257520A EP1496142A3 (en) | 2003-07-04 | 2003-11-28 | Electroplating method and electroplating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003192500A JP2005023398A (ja) | 2003-07-04 | 2003-07-04 | メッキ方法およびメッキ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005023398A true JP2005023398A (ja) | 2005-01-27 |
| JP2005023398A5 JP2005023398A5 (OSRAM) | 2006-10-26 |
Family
ID=33447965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003192500A Pending JP2005023398A (ja) | 2003-07-04 | 2003-07-04 | メッキ方法およびメッキ装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20050006243A1 (OSRAM) |
| EP (1) | EP1496142A3 (OSRAM) |
| JP (1) | JP2005023398A (OSRAM) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009504906A (ja) * | 2005-08-09 | 2009-02-05 | ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー | 複数の基板を収容する又は保持する装置及び電気メッキ装置 |
| JP2011208203A (ja) * | 2010-03-29 | 2011-10-20 | Tdk Corp | めっき装置、めっき方法およびチップ型電子部品の製造方法 |
| JP2013160380A (ja) * | 2012-02-01 | 2013-08-19 | Nix Inc | 被めっき材の保護具 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113818057B (zh) * | 2021-09-25 | 2023-03-10 | 山东睿思精密工业有限公司 | 一种散件cpu散热片连续电镀方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3898145A (en) * | 1971-02-17 | 1975-08-05 | Scm Corp | Process for applying contrasting coatings to a workpiece |
| US4321124A (en) * | 1981-02-02 | 1982-03-23 | Select Technology Corporation | Loose parts plating apparatus |
| US4904363A (en) * | 1989-04-25 | 1990-02-27 | Burndy Corporation | Selective plating systems |
| US5133847A (en) * | 1991-02-28 | 1992-07-28 | Amp Incorporated | Component carrier, method of manufacture and use therefor |
| ATE233708T1 (de) * | 2000-11-13 | 2003-03-15 | Wilhelm Steckelbach | Modulare vorrichtung zum oberflächenbehandeln von behandlungsgut in form von einzelheiten |
-
2003
- 2003-07-04 JP JP2003192500A patent/JP2005023398A/ja active Pending
- 2003-11-21 US US10/717,584 patent/US20050006243A1/en not_active Abandoned
- 2003-11-28 EP EP03257520A patent/EP1496142A3/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009504906A (ja) * | 2005-08-09 | 2009-02-05 | ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー | 複数の基板を収容する又は保持する装置及び電気メッキ装置 |
| JP2011208203A (ja) * | 2010-03-29 | 2011-10-20 | Tdk Corp | めっき装置、めっき方法およびチップ型電子部品の製造方法 |
| JP2013160380A (ja) * | 2012-02-01 | 2013-08-19 | Nix Inc | 被めっき材の保護具 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1496142A2 (en) | 2005-01-12 |
| US20050006243A1 (en) | 2005-01-13 |
| EP1496142A3 (en) | 2006-04-05 |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
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| A02 | Decision of refusal |
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