JP2004537757A5 - - Google Patents
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- Publication number
- JP2004537757A5 JP2004537757A5 JP2003517673A JP2003517673A JP2004537757A5 JP 2004537757 A5 JP2004537757 A5 JP 2004537757A5 JP 2003517673 A JP2003517673 A JP 2003517673A JP 2003517673 A JP2003517673 A JP 2003517673A JP 2004537757 A5 JP2004537757 A5 JP 2004537757A5
- Authority
- JP
- Japan
- Prior art keywords
- developer
- replenisher
- attack inhibitor
- oxide
- film attack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003112 inhibitor Substances 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- -1 polyoxyethylene Polymers 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 229920001451 polypropylene glycol Polymers 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- 229920001400 block copolymer Polymers 0.000 claims 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical class C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical class [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000010276 construction Methods 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 229920001987 poloxamine Polymers 0.000 claims 1
- 229910052700 potassium Chemical class 0.000 claims 1
- 239000011591 potassium Chemical class 0.000 claims 1
- 229920005604 random copolymer Polymers 0.000 claims 1
- 239000011734 sodium Chemical class 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- 229940124530 sulfonamide Drugs 0.000 claims 1
- 150000003456 sulfonamides Chemical class 0.000 claims 1
- 239000013589 supplement Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/919,695 US6562555B2 (en) | 2001-08-01 | 2001-08-01 | Method for developing lithographic printing plate precursors using a coating attack-suppressing agent |
| PCT/US2002/024304 WO2003012550A1 (en) | 2001-08-01 | 2002-07-31 | Method for developing lithographic printing plate precursors using a coating attack-suppressing agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004537757A JP2004537757A (ja) | 2004-12-16 |
| JP2004537757A5 true JP2004537757A5 (enExample) | 2006-01-05 |
Family
ID=25442489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003517673A Pending JP2004537757A (ja) | 2001-08-01 | 2002-07-31 | 皮膜攻撃抑制剤を用いる平版印刷版前駆体の現像方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6562555B2 (enExample) |
| EP (1) | EP1412818A1 (enExample) |
| JP (1) | JP2004537757A (enExample) |
| WO (1) | WO2003012550A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10208785B4 (de) * | 2002-02-28 | 2008-01-31 | Qimonda Ag | Lithografieverfahren zur Fotomaskenherstellung mittels Elektronenstrahllithografie |
| DE10310168B4 (de) * | 2003-03-08 | 2007-07-19 | Huber Gmbh | Wässrige Entwicklerlösung für Offset-Druckplatten |
| JP2005025009A (ja) * | 2003-07-04 | 2005-01-27 | Fuji Photo Film Co Ltd | 平版印刷版原版の現像処理方法 |
| US6992688B2 (en) * | 2004-01-28 | 2006-01-31 | Eastman Kodak Company | Method for developing multilayer imageable elements |
| US20050076801A1 (en) * | 2003-10-08 | 2005-04-14 | Miller Gary Roger | Developer system |
| US7078162B2 (en) * | 2003-10-08 | 2006-07-18 | Eastman Kodak Company | Developer regenerators |
| JP4166167B2 (ja) * | 2004-02-05 | 2008-10-15 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
| US20060257798A1 (en) * | 2004-05-10 | 2006-11-16 | Agfa-Gevaert | Alkaline developer for radiation sensitive compositions |
| US20060257789A1 (en) * | 2005-05-10 | 2006-11-16 | Agfa-Gevaert | Method for processing lithographic printing plates |
| EP2040124A1 (en) * | 2007-09-24 | 2009-03-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| US7905994B2 (en) * | 2007-10-03 | 2011-03-15 | Moses Lake Industries, Inc. | Substrate holder and electroplating system |
| US20100216067A1 (en) * | 2009-02-20 | 2010-08-26 | Miller Gary R | Lithographic printing plate developing compositions |
| US8262894B2 (en) | 2009-04-30 | 2012-09-11 | Moses Lake Industries, Inc. | High speed copper plating bath |
| CN102770812B (zh) * | 2010-01-25 | 2015-07-01 | 东亚合成株式会社 | 含导电性高分子的基材上的光致抗蚀剂用显影液、以及图形形成方法 |
| US20110236832A1 (en) | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8846299B2 (en) | 2010-03-26 | 2014-09-30 | Eastman Kodak Company | Methods for preparing lithograhic printing plates |
| WO2017157579A1 (en) * | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4259434A (en) | 1977-10-24 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for developing positive acting light-sensitive planographic printing plate |
| JPS5754938A (en) | 1980-09-20 | 1982-04-01 | Konishiroku Photo Ind Co Ltd | Developing method for positive type photosensitive lithographic printing plate |
| GB8628613D0 (en) | 1986-11-29 | 1987-01-07 | Horsell Graphic Ind Ltd | Developing fluid for lithographic plates |
| CA2019632A1 (en) | 1989-06-29 | 1990-12-29 | Kazuhiro Shimura | Method of processing presensitized lithographic printing plate |
| JPH0338647A (ja) | 1989-07-05 | 1991-02-19 | Konica Corp | ポジ型感光性平版印刷版の処理方法 |
| JPH04163556A (ja) * | 1990-10-29 | 1992-06-09 | Konica Corp | 感光性平版印刷版の処理方法及び処理装置 |
| JP3086354B2 (ja) | 1993-03-30 | 2000-09-11 | 富士写真フイルム株式会社 | 感光性平版印刷版用の現像液および現像補充液 |
| US5635328A (en) * | 1993-08-21 | 1997-06-03 | Konica Corporation | Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound |
| DE69527494T2 (de) * | 1994-12-06 | 2002-11-07 | Fuji Photo Film Co., Ltd. | Entwickler für ein lichtempfindliches lithographisches Druckmaterial |
| EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
| US5766826A (en) | 1996-10-11 | 1998-06-16 | Eastman Kodak Company | Alkaline developing composition and method of use to process lithographic printing plates |
| JP3038647B2 (ja) | 1997-03-06 | 2000-05-08 | 日通工株式会社 | Ｐｏｓオーダエントリシステム |
| US5998102A (en) | 1997-10-06 | 1999-12-07 | Agfa Corporation | Etch inhibitors in developer for lithographic printing plates |
| US6143479A (en) | 1999-08-31 | 2000-11-07 | Kodak Polychrome Graphics Llc | Developing system for alkaline-developable lithographic printing plates |
| US6255042B1 (en) | 1999-11-24 | 2001-07-03 | Kodak Polychrome Graphics, Llc | Developing system for alkaline-developable lithographic printing plates with different interlayers |
| US6364544B1 (en) * | 2000-01-31 | 2002-04-02 | Fuji Photo Film Co., Ltd | Automatic developing apparatus and method of replenishing replenisher for developer for said apparatuses |
| US6423458B2 (en) | 2000-02-08 | 2002-07-23 | Fuji Photo Film Co., Ltd. | Monitoring method of developing solution for lithographic printing plates |
| JP2001324818A (ja) | 2000-05-15 | 2001-11-22 | Fuji Photo Film Co Ltd | 平版印刷版現像液の補充方法 |
| US6391530B1 (en) * | 2000-11-03 | 2002-05-21 | Kodak Polychrome Graphics, Llc | Process for developing exposed radiation-sensitive printing plate precursors |
-
2001
- 2001-08-01 US US09/919,695 patent/US6562555B2/en not_active Expired - Lifetime
-
2002
- 2002-07-31 JP JP2003517673A patent/JP2004537757A/ja active Pending
- 2002-07-31 EP EP02759230A patent/EP1412818A1/en not_active Withdrawn
- 2002-07-31 WO PCT/US2002/024304 patent/WO2003012550A1/en not_active Ceased
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