JP2004302079A5 - - Google Patents
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- Publication number
- JP2004302079A5 JP2004302079A5 JP2003094330A JP2003094330A JP2004302079A5 JP 2004302079 A5 JP2004302079 A5 JP 2004302079A5 JP 2003094330 A JP2003094330 A JP 2003094330A JP 2003094330 A JP2003094330 A JP 2003094330A JP 2004302079 A5 JP2004302079 A5 JP 2004302079A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- formulas
- hydrogen atom
- acid
- following general
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002253 acid Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003094330A JP4074825B2 (ja) | 2003-03-31 | 2003-03-31 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003094330A JP4074825B2 (ja) | 2003-03-31 | 2003-03-31 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004302079A JP2004302079A (ja) | 2004-10-28 |
| JP2004302079A5 true JP2004302079A5 (enExample) | 2005-09-29 |
| JP4074825B2 JP4074825B2 (ja) | 2008-04-16 |
Family
ID=33406917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003094330A Expired - Fee Related JP4074825B2 (ja) | 2003-03-31 | 2003-03-31 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4074825B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006225476A (ja) | 2005-02-16 | 2006-08-31 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料及びパターン形成方法 |
| US7592118B2 (en) * | 2007-03-27 | 2009-09-22 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| JP5046965B2 (ja) * | 2007-03-27 | 2012-10-10 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
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2003
- 2003-03-31 JP JP2003094330A patent/JP4074825B2/ja not_active Expired - Fee Related