JP4074825B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4074825B2
JP4074825B2 JP2003094330A JP2003094330A JP4074825B2 JP 4074825 B2 JP4074825 B2 JP 4074825B2 JP 2003094330 A JP2003094330 A JP 2003094330A JP 2003094330 A JP2003094330 A JP 2003094330A JP 4074825 B2 JP4074825 B2 JP 4074825B2
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Japan
Prior art keywords
group
resin
acid
represented
general formula
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JP2003094330A
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Japanese (ja)
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JP2004302079A (ja
JP2004302079A5 (enExample
Inventor
文之 西山
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2003094330A priority Critical patent/JP4074825B2/ja
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Publication of JP2004302079A5 publication Critical patent/JP2004302079A5/ja
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  • Materials For Photolithography (AREA)
JP2003094330A 2003-03-31 2003-03-31 ポジ型レジスト組成物 Expired - Fee Related JP4074825B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003094330A JP4074825B2 (ja) 2003-03-31 2003-03-31 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003094330A JP4074825B2 (ja) 2003-03-31 2003-03-31 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004302079A JP2004302079A (ja) 2004-10-28
JP2004302079A5 JP2004302079A5 (enExample) 2005-09-29
JP4074825B2 true JP4074825B2 (ja) 2008-04-16

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ID=33406917

Family Applications (1)

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JP2003094330A Expired - Fee Related JP4074825B2 (ja) 2003-03-31 2003-03-31 ポジ型レジスト組成物

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JP (1) JP4074825B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006225476A (ja) 2005-02-16 2006-08-31 Shin Etsu Chem Co Ltd ポジ型レジスト材料及びパターン形成方法
US7592118B2 (en) * 2007-03-27 2009-09-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
JP5046965B2 (ja) * 2007-03-27 2012-10-10 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法

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Publication number Publication date
JP2004302079A (ja) 2004-10-28

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