JP2004532427A - フォトニック結晶 - Google Patents

フォトニック結晶 Download PDF

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Publication number
JP2004532427A
JP2004532427A JP2002579848A JP2002579848A JP2004532427A JP 2004532427 A JP2004532427 A JP 2004532427A JP 2002579848 A JP2002579848 A JP 2002579848A JP 2002579848 A JP2002579848 A JP 2002579848A JP 2004532427 A JP2004532427 A JP 2004532427A
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JP
Japan
Prior art keywords
photonic crystal
glass
thermal expansion
coefficient
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002579848A
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English (en)
Japanese (ja)
Inventor
ハイトマン，ヴァルター
Original Assignee
ドイッチェ テレコム アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ドイッチェ テレコム アーゲー filed Critical ドイッチェ テレコム アーゲー
Publication of JP2004532427A publication Critical patent/JP2004532427A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B5/00—Single-crystal growth from gels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Nanotechnology (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Biophysics (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Inorganic Insulating Materials (AREA)
JP2002579848A 2001-04-03 2002-03-26 フォトニック結晶 Pending JP2004532427A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10116500A DE10116500A1 (de) 2001-04-03 2001-04-03 Photonische Kristalle
PCT/EP2002/003365 WO2002082135A2 (de) 2001-04-03 2002-03-26 Photonische kristalle

Publications (1)

Publication Number Publication Date
JP2004532427A true JP2004532427A (ja) 2004-10-21

Family

ID=7680166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002579848A Pending JP2004532427A (ja) 2001-04-03 2002-03-26 フォトニック結晶

Country Status (6)

Country Link
US (1) US7359605B2 (de)
EP (1) EP1386187A2 (de)
JP (1) JP2004532427A (de)
CA (1) CA2439191A1 (de)
DE (1) DE10116500A1 (de)
WO (1) WO2002082135A2 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012064824A (ja) * 2010-09-17 2012-03-29 Toshiba Corp 固体撮像素子、その製造方法、カメラ
JP2015172730A (ja) * 2014-01-27 2015-10-01 フォアルクス インコーポレイテッドＦｏｒｅｌｕｘ Ｉｎｃ． 周期的構造体を有するフォトニック装置
US10677965B2 (en) 2014-01-27 2020-06-09 Forelux Inc. Optical apparatus for non-visible light applications

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1965446B1 (de) * 2007-02-28 2011-11-16 Corning Incorporated Thermoelektrisches Glaskeramikmodul
DE102007027414B3 (de) 2007-06-11 2009-01-22 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH Mikro- und Nanofluidsystem zur dynamischen Strukturanalyse von linearen Makromolekülen und Anwendungen davon
EP2180534B1 (de) * 2008-10-27 2013-10-16 Corning Incorporated Energieumwandlungsvorrichtungen und Verfahren
TW201024800A (en) * 2008-12-30 2010-07-01 Ind Tech Res Inst Negative refraction photonic crystal lens
DE102018109345A1 (de) * 2018-04-19 2019-10-24 Physik Instrumente (Pi) Gmbh & Co. Kg Integriert-optisches Funktionselement

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4993032A (en) * 1989-12-28 1991-02-12 General Dynamics Corp., Electronics Divn. Monolithic temperature stabilized optical tuning circuit for channel separation in WDM systems utilizing tunable lasers
US5385114A (en) * 1992-12-04 1995-01-31 Milstein; Joseph B. Photonic band gap materials and method of preparation thereof
US5303319A (en) * 1992-12-28 1994-04-12 Honeywell Inc. Ion-beam deposited multilayer waveguides and resonators
US5377285A (en) * 1993-02-11 1994-12-27 Honeywell Inc. Technique for making ultrastable ring resonators and lasers
JP2674680B2 (ja) * 1994-02-23 1997-11-12 宇都宮大学長 超伝導超格子結晶デバイス
US5600483A (en) * 1994-05-10 1997-02-04 Massachusetts Institute Of Technology Three-dimensional periodic dielectric structures having photonic bandgaps
DE19743296C1 (de) * 1997-09-30 1998-11-12 Siemens Ag Verfahren zur Herstellung einer offenen Form
DE69942936D1 (de) * 1998-07-30 2010-12-23 Corning Inc Verfahren zur herstellung photonischen strukturen
TWI228179B (en) * 1999-09-24 2005-02-21 Toshiba Corp Process and device for producing photonic crystal, and optical element
DE10014723A1 (de) * 2000-03-24 2001-09-27 Juergen Carstensen Herstellung dreidimensionaler photonischer Kristalle mit Porenätzungsverfahren in Silizium
US20030016895A1 (en) * 2001-07-23 2003-01-23 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices utilizing photonic crystals
US6768256B1 (en) * 2001-08-27 2004-07-27 Sandia Corporation Photonic crystal light source

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012064824A (ja) * 2010-09-17 2012-03-29 Toshiba Corp 固体撮像素子、その製造方法、カメラ
JP2015172730A (ja) * 2014-01-27 2015-10-01 フォアルクス インコーポレイテッドＦｏｒｅｌｕｘ Ｉｎｃ． 周期的構造体を有するフォトニック装置
US10539719B2 (en) 2014-01-27 2020-01-21 Forelux Inc. Photonic apparatus with periodic structures
US10677965B2 (en) 2014-01-27 2020-06-09 Forelux Inc. Optical apparatus for non-visible light applications

Also Published As

Publication number Publication date
EP1386187A2 (de) 2004-02-04
CA2439191A1 (en) 2002-10-17
WO2002082135A3 (de) 2003-11-27
WO2002082135A2 (de) 2002-10-17
US20040109657A1 (en) 2004-06-10
DE10116500A1 (de) 2002-10-17
US7359605B2 (en) 2008-04-15

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