JP2004524706A5 - - Google Patents

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Publication number
JP2004524706A5
JP2004524706A5 JP2002580448A JP2002580448A JP2004524706A5 JP 2004524706 A5 JP2004524706 A5 JP 2004524706A5 JP 2002580448 A JP2002580448 A JP 2002580448A JP 2002580448 A JP2002580448 A JP 2002580448A JP 2004524706 A5 JP2004524706 A5 JP 2004524706A5
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JP
Japan
Prior art keywords
laser
laser system
filter
output
bandwidth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002580448A
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English (en)
Japanese (ja)
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JP2004524706A (ja
Filing date
Publication date
Priority claimed from US09/829,475 external-priority patent/US6765945B2/en
Application filed filed Critical
Publication of JP2004524706A publication Critical patent/JP2004524706A/ja
Publication of JP2004524706A5 publication Critical patent/JP2004524706A5/ja
Pending legal-status Critical Current

Links

JP2002580448A 2001-04-09 2002-04-04 プレ注入フィルタを有する注入シード方式ｆ２レーザ Pending JP2004524706A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/829,475 US6765945B2 (en) 1999-09-27 2001-04-09 Injection seeded F2 laser with pre-injection filter
PCT/US2002/010734 WO2002082598A1 (en) 2001-04-09 2002-04-04 Injection seeded f2 laser with pre-injected filter

Publications (2)

Publication Number Publication Date
JP2004524706A JP2004524706A (ja) 2004-08-12
JP2004524706A5 true JP2004524706A5 (https=) 2005-12-22

Family

ID=25254641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002580448A Pending JP2004524706A (ja) 2001-04-09 2002-04-04 プレ注入フィルタを有する注入シード方式ｆ２レーザ

Country Status (6)

Country Link
US (1) US6765945B2 (https=)
EP (1) EP1378035A4 (https=)
JP (1) JP2004524706A (https=)
CN (1) CN100508308C (https=)
TW (1) TW563279B (https=)
WO (1) WO2002082598A1 (https=)

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US20040202220A1 (en) * 2002-11-05 2004-10-14 Gongxue Hua Master oscillator-power amplifier excimer laser system
US7308013B2 (en) 2002-11-05 2007-12-11 Lambda Physik Ag Excimer or molecular fluorine laser system with precision timing
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
JP4657103B2 (ja) 2003-04-22 2011-03-23 株式会社小松製作所 露光用２ステージレーザ装置
US7286574B2 (en) 2003-11-19 2007-10-23 Neumann Information Systems, Inc. Infrared laser
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US20070182808A1 (en) 2005-10-26 2007-08-09 Lars Stiblert Writing apparatuses and methods
US8122846B2 (en) 2005-10-26 2012-02-28 Micronic Mydata AB Platforms, apparatuses, systems and methods for processing and analyzing substrates
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US8238400B2 (en) * 2010-08-09 2012-08-07 Coherent Gmbh High-precision synchronization of pulsed gas-discharge lasers
JP2013131724A (ja) * 2011-12-22 2013-07-04 Gigaphoton Inc レーザ装置
KR102253995B1 (ko) 2013-03-12 2021-05-18 마이크로닉 아베 기계적으로 생성된 정렬 표식 방법 및 정렬 시스템
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
US9130337B1 (en) * 2014-09-10 2015-09-08 Cymer, Llc System and method for automatic gas optimization in a two-chamber gas discharge laser system
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US9997888B2 (en) * 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
CN112397986B (zh) * 2019-08-15 2021-09-21 中国科学院大连化学物理研究所 一种轮转式拉曼池的拉曼激光器
CN114447752A (zh) * 2020-11-05 2022-05-06 中国科学院微电子研究所 波长可选择激光系统
CN113764962B (zh) * 2021-08-19 2022-11-29 中国科学院合肥物质科学研究院 基于放电出光时间差的激光器状态监控系统及监控方法
CN115966994A (zh) * 2021-10-12 2023-04-14 北京科益虹源光电技术有限公司 激光器的气体控制方法及激光器
CN116131081B (zh) * 2023-04-13 2023-07-18 中国人民解放军国防科技大学 脉冲时序激光功率放大装置及时序可控多激光系统

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US6381257B1 (en) * 1999-09-27 2002-04-30 Cymer, Inc. Very narrow band injection seeded F2 lithography laser

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