CN100508308C - 带有波长控制的注入种子的f2激光器 - Google Patents

带有波长控制的注入种子的f2激光器 Download PDF

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Publication number
CN100508308C
CN100508308C CNB028078128A CN02807812A CN100508308C CN 100508308 C CN100508308 C CN 100508308C CN B028078128 A CNB028078128 A CN B028078128A CN 02807812 A CN02807812 A CN 02807812A CN 100508308 C CN100508308 C CN 100508308C
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laser
pulse
discharge
group
optical maser
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Expired - Fee Related
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CNB028078128A
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Chinese (zh)
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CN1742413A (zh
Inventor
R·L·桑德斯特伦
R·M·内斯
W·N·帕特洛
A·I·叶尔绍夫
E·D·昂科尔斯
吴忠勋
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Cymer Inc
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Cymer Inc
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    • H—ELECTRICITY
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    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10084—Frequency control by seeding
    • H01S3/10092—Coherent seed, e.g. injection locking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
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    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
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    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
CNB028078128A 2001-04-09 2002-03-29 带有波长控制的注入种子的f2激光器 Expired - Fee Related CN100508308C (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/829,475 US6765945B2 (en) 1999-09-27 2001-04-09 Injection seeded F2 laser with pre-injection filter
US09/829,475 2001-04-09
US09/848,043 2001-05-03
US09/854,097 2001-05-11
US09/855,310 2001-05-14

Publications (2)

Publication Number Publication Date
CN1742413A CN1742413A (zh) 2006-03-01
CN100508308C true CN100508308C (zh) 2009-07-01

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CNB028078128A Expired - Fee Related CN100508308C (zh) 2001-04-09 2002-03-29 带有波长控制的注入种子的f2激光器

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Country Link
US (1) US6765945B2 (https=)
EP (1) EP1378035A4 (https=)
JP (1) JP2004524706A (https=)
CN (1) CN100508308C (https=)
TW (1) TW563279B (https=)
WO (1) WO2002082598A1 (https=)

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Publication number Priority date Publication date Assignee Title
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US20030219094A1 (en) * 2002-05-21 2003-11-27 Basting Dirk L. Excimer or molecular fluorine laser system with multiple discharge units
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