ATE499729T1 - Stimulierter brillouin-streuungsspiegel, laservorrichtung und verstärkungsverfahren - Google Patents

Stimulierter brillouin-streuungsspiegel, laservorrichtung und verstärkungsverfahren

Info

Publication number
ATE499729T1
ATE499729T1 AT04256709T AT04256709T ATE499729T1 AT E499729 T1 ATE499729 T1 AT E499729T1 AT 04256709 T AT04256709 T AT 04256709T AT 04256709 T AT04256709 T AT 04256709T AT E499729 T1 ATE499729 T1 AT E499729T1
Authority
AT
Austria
Prior art keywords
sbs
cell
mirror system
telescope
brillouin scattering
Prior art date
Application number
AT04256709T
Other languages
English (en)
Inventor
C Brent Dane
Lloyd A Hackel
Fritz B Harris
Original Assignee
Metal Improvement Company Llc
L Livermore Nat Security Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metal Improvement Company Llc, L Livermore Nat Security Llc filed Critical Metal Improvement Company Llc
Application granted granted Critical
Publication of ATE499729T1 publication Critical patent/ATE499729T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10076—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating using optical phase conjugation, e.g. phase conjugate reflection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/356—Working by laser beam, e.g. welding, cutting or boring for surface treatment by shock processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0602—Crystal lasers or glass lasers
    • H01S3/0606—Crystal lasers or glass lasers with polygonal cross-section, e.g. slab, prism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08095—Zig-zag travelling beam through the active medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/083—Ring lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/30—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects
    • H01S3/305—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects in a gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/30—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects
    • H01S3/307—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects in a liquid

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Lasers (AREA)
  • Optical Communication System (AREA)
AT04256709T 2003-10-30 2004-10-29 Stimulierter brillouin-streuungsspiegel, laservorrichtung und verstärkungsverfahren ATE499729T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US51574703P 2003-10-30 2003-10-30
US51885403P 2003-11-10 2003-11-10
US10/766,635 US7209500B2 (en) 2003-10-30 2004-01-28 Stimulated Brillouin scattering mirror system, high power laser and laser peening method and system using same

Publications (1)

Publication Number Publication Date
ATE499729T1 true ATE499729T1 (de) 2011-03-15

Family

ID=34557370

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04256709T ATE499729T1 (de) 2003-10-30 2004-10-29 Stimulierter brillouin-streuungsspiegel, laservorrichtung und verstärkungsverfahren

Country Status (5)

Country Link
US (2) US7209500B2 (de)
EP (2) EP1528644B1 (de)
AT (1) ATE499729T1 (de)
DE (1) DE602004031494D1 (de)
ES (1) ES2412267T3 (de)

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US7291805B2 (en) * 2003-10-30 2007-11-06 The Regents Of The University Of California Target isolation system, high power laser and laser peening method and system using same
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CN104953463A (zh) * 2014-03-27 2015-09-30 中国科学院大连化学物理研究所 一种低脉冲功率激光泵浦的气体介质拉曼激光器
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CN104977275B (zh) * 2015-07-15 2017-07-21 南昌航空大学 一种sbs超声场激励下的oct成像装置及方法
CN107845947A (zh) * 2017-12-12 2018-03-27 苏州大学 双脉冲环形激光放大器
GB2571930B (en) * 2018-03-09 2021-01-13 Leonardo Mw Ltd A laser
US10778912B2 (en) 2018-03-31 2020-09-15 Open Water Internet Inc. System and device for optical transformation
CN109143202B (zh) * 2018-09-21 2022-08-26 南昌航空大学 一种模拟海洋湍流下的受激布里渊散射激光雷达系统装置
CN109732203A (zh) * 2019-01-15 2019-05-10 哈尔滨工程大学 一种利用微结构实现微球操控及激光推进效率提高的方法
CN109613708B (zh) * 2019-01-16 2020-12-11 长春理工大学 一种基于双光束结构的局域空心四阱系统
CN110911947B (zh) * 2019-11-13 2020-09-04 中国人民解放军军事科学院国防科技创新研究院 一种基于负电性气体等离子体的脉冲脉宽压缩装置及方法
CN112038874B (zh) * 2020-08-03 2024-05-28 河北工业大学 一种双池的自泵浦sbs脉冲压缩系统
CN112415763B (zh) * 2020-11-24 2022-08-30 中国科学院上海光学精密机械研究所 高功率激光系统中的级联自准直装置
GB202111726D0 (en) * 2021-08-16 2021-09-29 Ams Sensors Asia Pte Ltd Semiconductor wafer fabrication

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Also Published As

Publication number Publication date
US7286580B2 (en) 2007-10-23
EP2270934A2 (de) 2011-01-05
EP1528644A2 (de) 2005-05-04
DE602004031494D1 (de) 2011-04-07
ES2412267T3 (es) 2013-07-10
EP2270934A3 (de) 2011-01-12
EP2270934B1 (de) 2013-03-06
EP1528644A3 (de) 2006-06-28
US7209500B2 (en) 2007-04-24
US20070024955A1 (en) 2007-02-01
US20050094256A1 (en) 2005-05-05
EP1528644B1 (de) 2011-02-23

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