JP2004512396A - マイクロリソグラフィー用組成物 - Google Patents

マイクロリソグラフィー用組成物 Download PDF

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Publication number
JP2004512396A
JP2004512396A JP2002536611A JP2002536611A JP2004512396A JP 2004512396 A JP2004512396 A JP 2004512396A JP 2002536611 A JP2002536611 A JP 2002536611A JP 2002536611 A JP2002536611 A JP 2002536611A JP 2004512396 A JP2004512396 A JP 2004512396A
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JP
Japan
Prior art keywords
fluorine
group
containing polymer
photoresist composition
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002536611A
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English (en)
Japanese (ja)
Other versions
JP2004512396A5 (fr
Inventor
ラリー　エル．バーガー
マイケル　カール　クロフォード
ジェラルド　フェルドマン
リンダ　ケイ　ジョンソン
フランク　エル．シャド　ザ　サード
フレドリック　クラウス　ザムステグ　ジュニア
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2004512396A publication Critical patent/JP2004512396A/ja
Publication of JP2004512396A5 publication Critical patent/JP2004512396A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP2002536611A 2000-10-18 2001-10-16 マイクロリソグラフィー用組成物 Pending JP2004512396A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69128000A 2000-10-18 2000-10-18
PCT/US2001/042743 WO2002033489A2 (fr) 2000-10-18 2001-10-16 Compositions pour microlithographie

Publications (2)

Publication Number Publication Date
JP2004512396A true JP2004512396A (ja) 2004-04-22
JP2004512396A5 JP2004512396A5 (fr) 2005-12-22

Family

ID=24775897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002536611A Pending JP2004512396A (ja) 2000-10-18 2001-10-16 マイクロリソグラフィー用組成物

Country Status (7)

Country Link
EP (1) EP1326903A2 (fr)
JP (1) JP2004512396A (fr)
KR (1) KR20040004403A (fr)
CN (1) CN1214054C (fr)
AU (1) AU2002232383A1 (fr)
TW (1) TW569079B (fr)
WO (1) WO2002033489A2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005535753A (ja) * 2002-08-09 2005-11-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトレジストとして有用な縮合４員環状炭素を有する多環式基を有するフッ素化ポリマーおよび微細平版印刷のための方法
JP2019131658A (ja) * 2018-01-30 2019-08-08 三井化学株式会社 フッ素含有環状オレフィン系共重合体および成形体

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030130452A1 (en) * 2001-10-12 2003-07-10 Johnson Lynda Kaye Copolymers of ethylene with various norbornene derivatives
JP2005519167A (ja) * 2002-03-01 2005-06-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ミクロ平版印刷法のための弗素化コポリマー
TWI307819B (en) 2002-05-28 2009-03-21 Arch Spec Chem Inc Acetal protected polymers and photoresist compositions thereof
CN101095082B (zh) * 2003-02-20 2012-08-08 普罗梅鲁斯有限责任公司 光致抗蚀剂组合物用的溶解速率改性剂
JP4377174B2 (ja) 2003-07-25 2009-12-02 富士フイルム株式会社 ポジ型レジスト組成物
JP6419212B2 (ja) 2013-12-20 2018-11-07 ビーエイエスエフ・コーティングス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢＡＳＦ Ｃｏａｔｉｎｇｓ ＧｍｂＨ 水性一次分散体、その製造方法およびその使用
CN106444281A (zh) * 2016-09-22 2017-02-22 京东方科技集团股份有限公司 一种光刻胶及刻蚀方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL141803A0 (en) * 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005535753A (ja) * 2002-08-09 2005-11-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトレジストとして有用な縮合４員環状炭素を有する多環式基を有するフッ素化ポリマーおよび微細平版印刷のための方法
JP2019131658A (ja) * 2018-01-30 2019-08-08 三井化学株式会社 フッ素含有環状オレフィン系共重合体および成形体

Also Published As

Publication number Publication date
WO2002033489A2 (fr) 2002-04-25
KR20040004403A (ko) 2004-01-13
CN1214054C (zh) 2005-08-10
CN1484659A (zh) 2004-03-24
TW569079B (en) 2004-01-01
AU2002232383A1 (en) 2002-04-29
WO2002033489A3 (fr) 2002-11-21
EP1326903A2 (fr) 2003-07-16

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