JP2004319060A - 薄膜磁気ヘッドおよびその製造方法 - Google Patents

薄膜磁気ヘッドおよびその製造方法 Download PDF

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Publication number
JP2004319060A
JP2004319060A JP2003409417A JP2003409417A JP2004319060A JP 2004319060 A JP2004319060 A JP 2004319060A JP 2003409417 A JP2003409417 A JP 2003409417A JP 2003409417 A JP2003409417 A JP 2003409417A JP 2004319060 A JP2004319060 A JP 2004319060A
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JP
Japan
Prior art keywords
film
layer
domain control
magnetic
magnetic domain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003409417A
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English (en)
Japanese (ja)
Other versions
JP2004319060A5 (https=
Inventor
Daisuke Miyauchi
大助 宮内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP2003409417A priority Critical patent/JP2004319060A/ja
Priority to US10/809,529 priority patent/US7193821B2/en
Publication of JP2004319060A publication Critical patent/JP2004319060A/ja
Publication of JP2004319060A5 publication Critical patent/JP2004319060A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
    • G11B5/3932—Magnetic biasing films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
    • Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)
JP2003409417A 2003-03-28 2003-12-08 薄膜磁気ヘッドおよびその製造方法 Pending JP2004319060A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003409417A JP2004319060A (ja) 2003-03-28 2003-12-08 薄膜磁気ヘッドおよびその製造方法
US10/809,529 US7193821B2 (en) 2003-03-28 2004-03-26 Thin film magnetic head and method for manufacturing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003092842 2003-03-28
JP2003409417A JP2004319060A (ja) 2003-03-28 2003-12-08 薄膜磁気ヘッドおよびその製造方法

Publications (2)

Publication Number Publication Date
JP2004319060A true JP2004319060A (ja) 2004-11-11
JP2004319060A5 JP2004319060A5 (https=) 2005-06-09

Family

ID=32993070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003409417A Pending JP2004319060A (ja) 2003-03-28 2003-12-08 薄膜磁気ヘッドおよびその製造方法

Country Status (2)

Country Link
US (1) US7193821B2 (https=)
JP (1) JP2004319060A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005167236A (ja) * 2003-11-20 2005-06-23 Headway Technologies Inc 膜面直交電流型巨大磁気抵抗効果センサおよびその製造方法
US7154714B2 (en) * 2002-09-10 2006-12-26 Hitachi Global Storage Technologies Japan, Ltd. Recording/reproducing separated type magnetic head having differential bias type magnetic domain control structure
US8149546B2 (en) 2007-10-26 2012-04-03 Tdk Corporation Magnetic field detecting element including tri-layer stack with stepped portion

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004022614A (ja) * 2002-06-13 2004-01-22 Alps Electric Co Ltd 磁気検出素子及びその製造方法
US7764469B2 (en) * 2004-10-29 2010-07-27 Hitachi Global Storage Technologies Netherlands B.V. Notched shield and pole structure with slanted wing for perpendicular recording
US7616403B2 (en) * 2004-10-29 2009-11-10 Hitachi Global Storage Technologies Netherlands B.V. Winged design for reducing corner stray magnetic fields
US7419610B2 (en) * 2005-08-05 2008-09-02 Hitachi Global Storage Technologies Netherlands B.V. Method of partial depth material removal for fabrication of CPP read sensor
JP2007280567A (ja) * 2006-04-11 2007-10-25 Hitachi Global Storage Technologies Netherlands Bv 薄膜磁気ヘッド及びその製造方法
JP2007287239A (ja) * 2006-04-17 2007-11-01 Hitachi Global Storage Technologies Netherlands Bv 磁気ヘッドとその形成方法
JP2008021896A (ja) * 2006-07-14 2008-01-31 Tdk Corp Ｃｐｐ構造のｇｍｒ素子、薄膜磁気ヘッド、ヘッドジンバルアセンブリおよびハードディスク装置
JP2008084373A (ja) * 2006-09-26 2008-04-10 Tdk Corp 薄膜磁気ヘッドの製造方法及び薄膜磁気ヘッド
US20080088985A1 (en) * 2006-10-16 2008-04-17 Driskill-Smith Alexander Adria Magnetic head having CPP sensor with partially milled stripe height
JP2008192222A (ja) * 2007-02-02 2008-08-21 Hitachi Global Storage Technologies Netherlands Bv 磁気検出素子及びその製造方法
US8822046B2 (en) 2012-04-30 2014-09-02 Seagate Technology Llc Stack with wide seed layer
US20160365104A1 (en) * 2015-06-15 2016-12-15 Seagate Technology Llc Magnetoresistive sensor fabrication

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6636396B1 (en) * 1999-04-08 2003-10-21 International Business Machines Corporation Spin value read head stabilized without hard bias layers
JP3699000B2 (ja) 2001-04-09 2005-09-21 アルプス電気株式会社 スピンバルブ型薄膜素子およびその製造方法
JP2002329905A (ja) 2001-05-02 2002-11-15 Fujitsu Ltd Ｃｐｐ構造磁気抵抗効果素子およびその製造方法
US6754056B2 (en) * 2002-01-18 2004-06-22 International Business Machines Corporation Read head having a tunnel junction sensor with a free layer biased by exchange coupling with insulating antiferromagnetic (AFM) layers
JP4270797B2 (ja) * 2002-03-12 2009-06-03 Ｔｄｋ株式会社 磁気検出素子
US6865062B2 (en) * 2002-03-21 2005-03-08 International Business Machines Corporation Spin valve sensor with exchange biased free layer and antiparallel (AP) pinned layer pinned without a pinning layer
US7016168B2 (en) * 2003-11-20 2006-03-21 Headway Technologies, Inc. Method of increasing CPP GMR in a spin valve structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7154714B2 (en) * 2002-09-10 2006-12-26 Hitachi Global Storage Technologies Japan, Ltd. Recording/reproducing separated type magnetic head having differential bias type magnetic domain control structure
JP2005167236A (ja) * 2003-11-20 2005-06-23 Headway Technologies Inc 膜面直交電流型巨大磁気抵抗効果センサおよびその製造方法
US8149546B2 (en) 2007-10-26 2012-04-03 Tdk Corporation Magnetic field detecting element including tri-layer stack with stepped portion

Also Published As

Publication number Publication date
US20040190205A1 (en) 2004-09-30
US7193821B2 (en) 2007-03-20

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