JP2004307725A5 - - Google Patents
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- Publication number
- JP2004307725A5 JP2004307725A5 JP2003105728A JP2003105728A JP2004307725A5 JP 2004307725 A5 JP2004307725 A5 JP 2004307725A5 JP 2003105728 A JP2003105728 A JP 2003105728A JP 2003105728 A JP2003105728 A JP 2003105728A JP 2004307725 A5 JP2004307725 A5 JP 2004307725A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- film
- cleaning liquid
- liquid composition
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 description 49
- 239000000203 mixture Substances 0.000 description 30
- 239000007788 liquid Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 23
- 239000004065 semiconductor Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- 125000001931 aliphatic group Chemical group 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 238000011109 contamination Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 150000007513 acids Chemical class 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000002209 hydrophobic effect Effects 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003105728A JP4375991B2 (ja) | 2003-04-09 | 2003-04-09 | 半導体基板洗浄液組成物 |
| US10/818,033 US7503982B2 (en) | 2003-04-09 | 2004-04-05 | Method for cleaning semiconductor substrate |
| KR1020040023443A KR101005925B1 (ko) | 2003-04-09 | 2004-04-06 | 반도체 기판 세정액 조성물 |
| EP04008284A EP1466963B1 (en) | 2003-04-09 | 2004-04-06 | Cleaning liquid composition for semiconductor substrate |
| DE602004003988T DE602004003988T2 (de) | 2003-04-09 | 2004-04-06 | Flüssiges Renigungsmittel für Halbleiter |
| TW093109650A TWI356095B (en) | 2003-04-09 | 2004-04-07 | Cleaning liquid composition for semiconductor subs |
| CNB2004100334935A CN100513544C (zh) | 2003-04-09 | 2004-04-09 | 半导体基板洗涤液组合物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003105728A JP4375991B2 (ja) | 2003-04-09 | 2003-04-09 | 半導体基板洗浄液組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004307725A JP2004307725A (ja) | 2004-11-04 |
| JP2004307725A5 true JP2004307725A5 (cg-RX-API-DMAC7.html) | 2006-06-01 |
| JP4375991B2 JP4375991B2 (ja) | 2009-12-02 |
Family
ID=32866753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003105728A Expired - Fee Related JP4375991B2 (ja) | 2003-04-09 | 2003-04-09 | 半導体基板洗浄液組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7503982B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1466963B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4375991B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101005925B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN100513544C (cg-RX-API-DMAC7.html) |
| DE (1) | DE602004003988T2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI356095B (cg-RX-API-DMAC7.html) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1744388A4 (en) | 2004-03-30 | 2010-08-25 | Noboru Oyama | REDOX-ACTIVE REVERSIBLE ELECTRODE AND SECONDARY BATTERY THEREWITH |
| KR101232249B1 (ko) * | 2004-08-10 | 2013-02-12 | 간또 가가꾸 가부시끼가이샤 | 반도체 기판 세정액 및 반도체 기판 세정방법 |
| US7208325B2 (en) * | 2005-01-18 | 2007-04-24 | Applied Materials, Inc. | Refreshing wafers having low-k dielectric materials |
| JP4876215B2 (ja) * | 2005-01-21 | 2012-02-15 | 独立行政法人産業技術総合研究所 | Ｃｍｐ研磨方法、ｃｍｐ研磨装置、及び半導体デバイスの製造方法 |
| KR100630737B1 (ko) * | 2005-02-04 | 2006-10-02 | 삼성전자주식회사 | 금속 ｃｍｐ 후 세정액 및 이를 이용한 반도체 소자의금속 배선 형성 방법 |
| US9058975B2 (en) * | 2006-06-09 | 2015-06-16 | Lam Research Corporation | Cleaning solution formulations for substrates |
| US8623236B2 (en) * | 2007-07-13 | 2014-01-07 | Tokyo Ohka Kogyo Co., Ltd. | Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film |
| JP5561914B2 (ja) * | 2008-05-16 | 2014-07-30 | 関東化学株式会社 | 半導体基板洗浄液組成物 |
| JP5515588B2 (ja) * | 2009-10-05 | 2014-06-11 | 栗田工業株式会社 | ウエハ用洗浄水及びウエハの洗浄方法 |
| US8128755B2 (en) * | 2010-03-03 | 2012-03-06 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Cleaning solvent and cleaning method for metallic compound |
| JP5630385B2 (ja) * | 2010-06-30 | 2014-11-26 | セントラル硝子株式会社 | 保護膜形成用薬液及びウェハ表面の洗浄方法 |
| JP2012017420A (ja) * | 2010-07-08 | 2012-01-26 | Neos Co Ltd | 水溶性洗浄剤組成物 |
| JP2012058273A (ja) * | 2010-09-03 | 2012-03-22 | Kanto Chem Co Inc | フォトレジスト残渣およびポリマー残渣除去液組成物 |
| JP5671962B2 (ja) * | 2010-11-15 | 2015-02-18 | 栗田工業株式会社 | シリコンウェハ洗浄用リンス液調製方法 |
| JP2014210690A (ja) * | 2013-04-22 | 2014-11-13 | 住友電気工業株式会社 | 炭化珪素基板の製造方法 |
| CN108611199A (zh) * | 2016-12-09 | 2018-10-02 | 段钰 | 一种高效强力清洗剂及其环保清洗工艺 |
| KR102434647B1 (ko) | 2017-01-17 | 2022-08-22 | 주식회사 다이셀 | 반도체 기판 세정제 |
| CN109037025A (zh) * | 2017-06-08 | 2018-12-18 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH122023A (de) | 1926-12-27 | 1927-08-16 | Richter Gutzwiller & Cie | Verfahren zur Herstellung einer Parkettreinigungsmasse. |
| DE2155849C3 (de) * | 1971-11-10 | 1979-07-26 | Semikron Gesellschaft Fuer Gleichrichterbau Und Elektronik Mbh, 8500 Nuernberg | Verfahren zur Herstellung eines stabilisierenden und/oder isolierenden Überzuges auf Halbleiteroberflächen |
| JPS5832669A (ja) * | 1981-08-22 | 1983-02-25 | Mitsubishi Pencil Co Ltd | インク消去液 |
| JPH02310092A (ja) * | 1989-05-25 | 1990-12-25 | Toyo Ink Mfg Co Ltd | 平版印刷用湿し水組成物 |
| US5503681A (en) * | 1990-03-16 | 1996-04-02 | Kabushiki Kaisha Toshiba | Method of cleaning an object |
| US6825156B2 (en) * | 2002-06-06 | 2004-11-30 | Ekc Technology, Inc. | Semiconductor process residue removal composition and process |
| US7144848B2 (en) * | 1992-07-09 | 2006-12-05 | Ekc Technology, Inc. | Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal |
| US6640816B2 (en) * | 1999-01-22 | 2003-11-04 | Micron Technology, Inc. | Method for post chemical-mechanical planarization cleaning of semiconductor wafers |
| US6410494B2 (en) * | 1996-06-05 | 2002-06-25 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| JP3219020B2 (ja) | 1996-06-05 | 2001-10-15 | 和光純薬工業株式会社 | 洗浄処理剤 |
| TW416987B (en) * | 1996-06-05 | 2001-01-01 | Wako Pure Chem Ind Ltd | A composition for cleaning the semiconductor substrate surface |
| EP0839898A1 (en) * | 1996-11-04 | 1998-05-06 | The Procter & Gamble Company | Self-thickened cleaning compositions |
| TW387936B (en) * | 1997-08-12 | 2000-04-21 | Kanto Kagaku | Washing solution |
| JP3165801B2 (ja) | 1997-08-12 | 2001-05-14 | 関東化学株式会社 | 洗浄液 |
| US6627590B1 (en) * | 1998-05-22 | 2003-09-30 | The Procter & Gamble Company | Acidic cleaning compositions with C10 alkyl sulfate detergent surfactant |
| US5928435A (en) * | 1998-11-11 | 1999-07-27 | Enthone-Omi, Inc. | Method for removing organic coatings from substrates using carboxylic acids, organic solvents, and corrosion inhibitors |
| TW574634B (en) * | 1998-11-13 | 2004-02-01 | Kao Corp | Stripping composition for resist |
| JP3474127B2 (ja) | 1998-11-13 | 2003-12-08 | 花王株式会社 | 剥離剤組成物 |
| JP4516176B2 (ja) * | 1999-04-20 | 2010-08-04 | 関東化学株式会社 | 電子材料用基板洗浄液 |
| WO2001014510A1 (en) * | 1999-08-19 | 2001-03-01 | Ashland Inc. | Stripping and cleaning compositions |
| JP2002041393A (ja) | 2000-07-21 | 2002-02-08 | Nippon Telegr & Teleph Corp <Ntt> | 通信ネットワークシステムを用いた情報配信方法 |
| EP1646091A3 (en) * | 2000-09-08 | 2006-04-19 | Kanto Kagaku Kabushiki Kaisha | Etching liquid composition |
| US6699825B2 (en) * | 2001-01-12 | 2004-03-02 | S.C. Johnson & Son, Inc. | Acidic hard-surface antimicrobial cleaner |
| TWI297102B (en) * | 2001-08-03 | 2008-05-21 | Nec Electronics Corp | Removing composition |
| WO2003065433A1 (fr) | 2002-01-28 | 2003-08-07 | Mitsubishi Chemical Corporation | Detergent liquide pour substrat de dispositif semi-conducteur et procede de nettoyage |
| TWI339680B (en) * | 2002-02-19 | 2011-04-01 | Kanto Kagaku | Washing liquid composition for semiconductor substrate |
| US7098181B2 (en) | 2002-05-22 | 2006-08-29 | Kao Corporation | Liquid detergent composition |
| US20060166846A1 (en) * | 2002-08-19 | 2006-07-27 | Ying-Hao Li | Remover solution |
| JP4170710B2 (ja) | 2002-09-02 | 2008-10-22 | 花王株式会社 | 剥離剤組成物 |
| US6696399B1 (en) * | 2002-10-15 | 2004-02-24 | Cleaning Systems, Inc. | Cleaning composition |
-
2003
- 2003-04-09 JP JP2003105728A patent/JP4375991B2/ja not_active Expired - Fee Related
-
2004
- 2004-04-05 US US10/818,033 patent/US7503982B2/en not_active Expired - Fee Related
- 2004-04-06 KR KR1020040023443A patent/KR101005925B1/ko not_active Expired - Fee Related
- 2004-04-06 DE DE602004003988T patent/DE602004003988T2/de not_active Expired - Lifetime
- 2004-04-06 EP EP04008284A patent/EP1466963B1/en not_active Expired - Lifetime
- 2004-04-07 TW TW093109650A patent/TWI356095B/zh not_active IP Right Cessation
- 2004-04-09 CN CNB2004100334935A patent/CN100513544C/zh not_active Expired - Fee Related
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