JP2004247619A5 - - Google Patents

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Publication number
JP2004247619A5
JP2004247619A5 JP2003037565A JP2003037565A JP2004247619A5 JP 2004247619 A5 JP2004247619 A5 JP 2004247619A5 JP 2003037565 A JP2003037565 A JP 2003037565A JP 2003037565 A JP2003037565 A JP 2003037565A JP 2004247619 A5 JP2004247619 A5 JP 2004247619A5
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JP
Japan
Prior art keywords
optical member
holding device
detection means
adjusting
adjustment unit
Prior art date
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Application number
JP2003037565A
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English (en)
Japanese (ja)
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JP3787556B2 (ja
JP2004247619A (ja
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Priority to JP2003037565A priority Critical patent/JP3787556B2/ja
Priority claimed from JP2003037565A external-priority patent/JP3787556B2/ja
Priority to US10/781,412 priority patent/US7031082B2/en
Publication of JP2004247619A publication Critical patent/JP2004247619A/ja
Publication of JP2004247619A5 publication Critical patent/JP2004247619A5/ja
Application granted granted Critical
Publication of JP3787556B2 publication Critical patent/JP3787556B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003037565A 2003-02-17 2003-02-17 保持装置、露光装置及びデバイス製造方法 Expired - Fee Related JP3787556B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003037565A JP3787556B2 (ja) 2003-02-17 2003-02-17 保持装置、露光装置及びデバイス製造方法
US10/781,412 US7031082B2 (en) 2003-02-17 2004-02-17 Retainer, exposure apparatus, and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003037565A JP3787556B2 (ja) 2003-02-17 2003-02-17 保持装置、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004247619A JP2004247619A (ja) 2004-09-02
JP2004247619A5 true JP2004247619A5 (enExample) 2005-04-14
JP3787556B2 JP3787556B2 (ja) 2006-06-21

Family

ID=32866368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003037565A Expired - Fee Related JP3787556B2 (ja) 2003-02-17 2003-02-17 保持装置、露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7031082B2 (enExample)
JP (1) JP3787556B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007266511A (ja) * 2006-03-29 2007-10-11 Nikon Corp 光学系、露光装置、及び光学特性の調整方法
WO2008122313A1 (en) * 2007-04-05 2008-10-16 Carl Zeiss Smt Ag Optical element module with imaging error and position correction
JP2010062394A (ja) * 2008-09-04 2010-03-18 Canon Inc 保持装置及び露光装置
CN101685192B (zh) * 2008-09-26 2011-02-16 中国科学院西安光学精密机械研究所 抑制大镜面像散变形的支撑装调方法
JP5556155B2 (ja) * 2009-12-04 2014-07-23 株式会社ニコン 光学部材変形装置、光学系、露光装置、デバイスの製造方法
US9188714B2 (en) * 2011-02-16 2015-11-17 Toyota Motor Engineering & Manufacturing North America, Inc. Method and apparatus to control a focal length of a curved reflector in real time
JP2015079221A (ja) * 2013-10-18 2015-04-23 三菱電機株式会社 光学素子支持装置及び光学素子支持装置の調整方法
JP2016139015A (ja) * 2015-01-28 2016-08-04 セイコーエプソン株式会社 ミラーデバイス、ミラーデバイスの製造方法、及び画像表示装置
DE102015106184B4 (de) * 2015-04-22 2021-09-02 Friedrich-Schiller-Universität Jena Verfahren zur Formgebung und/oder Formkorrektur mindestens eines optischen Elements
CN105739248B (zh) * 2016-04-01 2018-01-09 中国科学院长春光学精密机械与物理研究所 光学元件支撑结构、单元镜组、曝光光学系统及光刻机
CN106772881B (zh) * 2016-12-09 2019-03-08 中国科学院长春光学精密机械与物理研究所 一种主动式展开锁定机构
JP7090464B2 (ja) * 2018-04-26 2022-06-24 キヤノン株式会社 保持装置および光学装置
JP2021067925A (ja) * 2019-10-21 2021-04-30 キヤノン株式会社 支持装置、投影光学系、露光装置、支持装置の調整方法および物品製造方法
CN110955058B (zh) * 2019-12-17 2021-08-10 中国工程物理研究院应用电子学研究所 一种三自由度应力释放器
JP7510298B2 (ja) * 2020-07-31 2024-07-03 キヤノン株式会社 光学機器
CN116149145A (zh) * 2023-03-07 2023-05-23 中国科学院光电技术研究所 一种光刻投影物镜三叶、四叶像差变形镜机构
TWI896390B (zh) * 2024-10-28 2025-09-01 旭東機械工業股份有限公司 用於清潔環形金屬框的清潔設備

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100259151B1 (ko) * 1997-08-26 2000-06-15 윤종용 비대칭강성구조를 갖는 광 경로 변환 액츄에이터 및 그의 구동방법
JP3956454B2 (ja) 1997-11-18 2007-08-08 株式会社ニコン レンズ支持装置、支持方法および投影露光装置
US6275326B1 (en) * 1999-09-21 2001-08-14 Lucent Technologies Inc. Control arrangement for microelectromechanical devices and systems
US6411426B1 (en) * 2000-04-25 2002-06-25 Asml, Us, Inc. Apparatus, system, and method for active compensation of aberrations in an optical system
DE10062786A1 (de) * 2000-12-15 2002-06-20 Zeiss Carl System zur Dämpfung von Schwingungen
US6386714B1 (en) * 2001-05-04 2002-05-14 Lucent Technolgies Inc. Controlling mirror shape for generating interference patterns and the like
US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control

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