JP2004191986A - 多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置 - Google Patents

多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置 Download PDF

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Publication number
JP2004191986A
JP2004191986A JP2003410497A JP2003410497A JP2004191986A JP 2004191986 A JP2004191986 A JP 2004191986A JP 2003410497 A JP2003410497 A JP 2003410497A JP 2003410497 A JP2003410497 A JP 2003410497A JP 2004191986 A JP2004191986 A JP 2004191986A
Authority
JP
Japan
Prior art keywords
frame
reticle
pellicle
opening
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003410497A
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English (en)
Japanese (ja)
Inventor
Joseph Laganza
ラガンザ ジョセフ
Jorge Ivaldi
イーヴァルディ ジョルジュ
Florence Luo
ルオ フローレンス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/314,419 external-priority patent/US6847434B2/en
Priority claimed from US10/464,840 external-priority patent/US6822731B1/en
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of JP2004191986A publication Critical patent/JP2004191986A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
JP2003410497A 2002-12-09 2003-12-09 多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置 Pending JP2004191986A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/314,419 US6847434B2 (en) 2000-02-10 2002-12-09 Method and apparatus for a pellicle frame with porous filtering inserts
US10/464,840 US6822731B1 (en) 2003-06-18 2003-06-18 Method and apparatus for a pellicle frame with heightened bonding surfaces

Publications (1)

Publication Number Publication Date
JP2004191986A true JP2004191986A (ja) 2004-07-08

Family

ID=32328826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003410497A Pending JP2004191986A (ja) 2002-12-09 2003-12-09 多孔質フィルタ挿入体及び突出したボンディング面を備えたペリクルフレームのための方法及び装置

Country Status (5)

Country Link
EP (2) EP1720070A3 (de)
JP (1) JP2004191986A (de)
KR (1) KR100576189B1 (de)
CN (1) CN1506764A (de)
SG (1) SG106163A1 (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184817A (ja) * 2004-12-28 2006-07-13 Fujitsu Ltd ペリクル及び転写基板
JP2013228582A (ja) * 2012-04-26 2013-11-07 Shin Etsu Chem Co Ltd ペリクル
JP5454136B2 (ja) * 2007-03-01 2014-03-26 株式会社ニコン ペリクルフレーム装置、マスク、レチクル装置、露光方法及び露光装置並びにデバイスの製造方法
WO2021251157A1 (ja) * 2020-06-08 2021-12-16 信越化学工業株式会社 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
KR101442776B1 (ko) * 2008-04-15 2014-09-25 주성엔지니어링(주) 배기 컨덕턴스를 향상시킨 에지프레임과 이를 포함하는기판처리장치
US9759997B2 (en) * 2015-12-17 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle assembly and method for advanced lithography
JP7186183B2 (ja) 2017-06-15 2022-12-08 エーエスエムエル ネザーランズ ビー．ブイ． ペリクル及びペリクルアセンブリ
KR20230039294A (ko) 2021-09-14 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6118956A (ja) * 1984-07-05 1986-01-27 Nippon Kogaku Kk <Nikon> マスク保護装置
JPS6185850U (de) * 1984-11-12 1986-06-05
JPH05232690A (ja) * 1991-08-23 1993-09-10 Oki Electric Ind Co Ltd フォトマスク用ペリクル
WO2001059522A1 (en) * 2000-02-10 2001-08-16 Asml Us, Inc. Method and apparatus for a reticle with purged pellicle-to-reticle gap
JP2002158153A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置およびペリクル空間内ガス置換方法
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
JP2002182371A (ja) * 2000-12-14 2002-06-26 Shin Etsu Chem Co Ltd ペリクル
JP2003307832A (ja) * 2002-04-16 2003-10-31 Asahi Glass Co Ltd ペリクル及びペリクル装着フォトマスク

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03166545A (ja) * 1989-11-27 1991-07-18 Hitachi Electron Eng Co Ltd Ｉｃレチクル保護用のペリクル枠
JPH04196117A (ja) * 1990-11-26 1992-07-15 Seiko Epson Corp 半導体製造装置
SG63629A1 (en) * 1991-05-17 1999-03-30 Du Pont Photomasks Inc Pressure relieving pellicle
JPH05297572A (ja) * 1992-04-22 1993-11-12 Mitsubishi Electric Corp ペリクル膜付きレチクル及びその異物除去方法
US5344677A (en) * 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
JP3445685B2 (ja) * 1994-08-11 2003-09-08 三井化学株式会社 マスク保護装置
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof
TW522460B (en) * 2000-03-30 2003-03-01 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6118956A (ja) * 1984-07-05 1986-01-27 Nippon Kogaku Kk <Nikon> マスク保護装置
JPS6185850U (de) * 1984-11-12 1986-06-05
JPH05232690A (ja) * 1991-08-23 1993-09-10 Oki Electric Ind Co Ltd フォトマスク用ペリクル
WO2001059522A1 (en) * 2000-02-10 2001-08-16 Asml Us, Inc. Method and apparatus for a reticle with purged pellicle-to-reticle gap
JP2002158153A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置およびペリクル空間内ガス置換方法
JP2002182371A (ja) * 2000-12-14 2002-06-26 Shin Etsu Chem Co Ltd ペリクル
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
JP2003307832A (ja) * 2002-04-16 2003-10-31 Asahi Glass Co Ltd ペリクル及びペリクル装着フォトマスク

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184817A (ja) * 2004-12-28 2006-07-13 Fujitsu Ltd ペリクル及び転写基板
JP5454136B2 (ja) * 2007-03-01 2014-03-26 株式会社ニコン ペリクルフレーム装置、マスク、レチクル装置、露光方法及び露光装置並びにデバイスの製造方法
KR101531426B1 (ko) * 2007-03-01 2015-06-24 가부시키가이샤 니콘 펠리클 프레임 장치, 마스크, 노광 방법, 노광 장치, 및 디바이스의 제조 방법
JP2013228582A (ja) * 2012-04-26 2013-11-07 Shin Etsu Chem Co Ltd ペリクル
WO2021251157A1 (ja) * 2020-06-08 2021-12-16 信越化学工業株式会社 ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、半導体の製造方法及び液晶表示板の製造方法

Also Published As

Publication number Publication date
SG106163A1 (en) 2004-09-30
CN1506764A (zh) 2004-06-23
EP1429186A3 (de) 2006-06-07
KR20040050856A (ko) 2004-06-17
EP1429186A2 (de) 2004-06-16
KR100576189B1 (ko) 2006-05-03
EP1720070A2 (de) 2006-11-08
EP1720070A3 (de) 2006-11-22

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