JP2004191355A - 照明及び画像取得システム - Google Patents

照明及び画像取得システム Download PDF

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Publication number
JP2004191355A
JP2004191355A JP2003335093A JP2003335093A JP2004191355A JP 2004191355 A JP2004191355 A JP 2004191355A JP 2003335093 A JP2003335093 A JP 2003335093A JP 2003335093 A JP2003335093 A JP 2003335093A JP 2004191355 A JP2004191355 A JP 2004191355A
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JP
Japan
Prior art keywords
light
imager
flash
inspection system
image
Prior art date
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Pending
Application number
JP2003335093A
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English (en)
Japanese (ja)
Other versions
JP2004191355A5 (enExample
Inventor
David Fisch
フィッシュ・ダヴィッド
Yigal Katzir
カッツィール・イガル
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Orbotech Ltd
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Orbotech Ltd
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Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Publication of JP2004191355A publication Critical patent/JP2004191355A/ja
Publication of JP2004191355A5 publication Critical patent/JP2004191355A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Input (AREA)
  • Supply And Installment Of Electrical Components (AREA)
JP2003335093A 2002-09-26 2003-09-26 照明及び画像取得システム Pending JP2004191355A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/254,542 US6781687B2 (en) 2002-09-26 2002-09-26 Illumination and image acquisition system

Publications (2)

Publication Number Publication Date
JP2004191355A true JP2004191355A (ja) 2004-07-08
JP2004191355A5 JP2004191355A5 (enExample) 2006-11-02

Family

ID=32029037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003335093A Pending JP2004191355A (ja) 2002-09-26 2003-09-26 照明及び画像取得システム

Country Status (3)

Country Link
US (1) US6781687B2 (enExample)
JP (1) JP2004191355A (enExample)
TW (1) TWI289719B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008502096A (ja) * 2004-03-05 2008-01-24 オプティクス ワン，インコーポレーテッド 均一な像を形成する懐中電灯優先権主張本願は、２００４年３月５日に出願された、米国出願番号１０／７９４０７３の優先権を主張するものである。背景情報
JP2012516063A (ja) * 2009-01-26 2012-07-12 ケーエルエー−テンカー・コーポレーション ウエハ上の欠陥を検出するためのシステムおよび方法
JP2013197338A (ja) * 2012-03-21 2013-09-30 Yamaha Motor Co Ltd プリント配線板用撮像装置、表面実装機および実装システム
TWI410606B (zh) * 2006-01-11 2013-10-01 Orbotech Ltd 用於高解析度處理具有欲成像微觀形體之大體平坦工件之裝置，用於蒐集具有微觀形體之工件影像之方法，及用於檢驗微觀物件之系統
WO2021019609A1 (ja) 2019-07-26 2021-02-04 株式会社Ｆｕｊｉ 対基板作業システム

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006012551A1 (en) * 2004-07-23 2006-02-02 Nextech Solutions, Inc. Large substrate flat panel inspection system
US8121392B2 (en) * 2004-10-25 2012-02-21 Parata Systems, Llc Embedded imaging and control system
US8237138B2 (en) * 2005-09-08 2012-08-07 X-Rite, Inc. Systems and method for optical scatter imaging of latent image plates
US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
JP2010512535A (ja) * 2006-12-12 2010-04-22 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 細胞分析方法及び装置
EP2095186A2 (en) 2006-12-19 2009-09-02 Philips Intellectual Property & Standards GmbH Colour sequential flash for digital image acquisition
TWI345053B (en) * 2007-03-16 2011-07-11 Ind Tech Res Inst Image-acquiring system with high-spectrum resolution and method for the same
US7745771B2 (en) * 2007-04-03 2010-06-29 Delphi Technologies, Inc. Synchronous imaging using segmented illumination
JP2009065146A (ja) * 2007-08-15 2009-03-26 Sony Corp 半導体薄膜の形成方法および半導体薄膜の検査装置
US8605275B2 (en) * 2009-01-26 2013-12-10 Kla-Tencor Corp. Detecting defects on a wafer
US8144973B2 (en) * 2009-03-24 2012-03-27 Orbotech Ltd. Multi-modal imaging
US9035673B2 (en) 2010-01-25 2015-05-19 Palo Alto Research Center Incorporated Method of in-process intralayer yield detection, interlayer shunt detection and correction
CN103069436B (zh) * 2010-08-05 2017-02-08 奥博泰克有限公司 照明系统
WO2012139088A2 (en) * 2011-04-08 2012-10-11 Accusentry, Inc. System and method for generating multiple, interlaced images using a single scanning camera with multiple, alternating light sources
CN103076344A (zh) * 2012-12-27 2013-05-01 深圳市华星光电技术有限公司 显示面板的缺陷检测方法及其检测装置
US9008410B2 (en) 2013-03-13 2015-04-14 Kla-Tencor Corporation Single die inspection on a dark field inspection tool
TWI647530B (zh) * 2013-12-22 2019-01-11 Applied Materials, Inc. 用於沉積之監控系統及其操作方法
DK3007430T3 (en) 2014-10-10 2017-02-20 Sick Ag CAMERA SYSTEM AND INSPECTION AND / OR MEASUREMENT OF OBJECTS
US9870935B2 (en) 2014-12-19 2018-01-16 Applied Materials, Inc. Monitoring system for deposition and method of operation thereof
JP6857079B2 (ja) * 2017-05-09 2021-04-14 株式会社キーエンス 画像検査装置
TWI721385B (zh) * 2018-07-08 2021-03-11 香港商康代影像技術方案香港有限公司 產生印刷電路板合成彩色影像之技術
TWI848757B (zh) * 2023-06-29 2024-07-11 宏瀨光電有限公司 多色閃頻取像檢測系統及其方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5495337A (en) * 1991-11-06 1996-02-27 Machine Vision Products, Inc. Method of visualizing minute particles
US5440385A (en) * 1993-02-05 1995-08-08 Pressco Technology, Inc. Integrated isotropic illumination source for translucent item inspection
US6122048A (en) * 1994-08-26 2000-09-19 Pressco Technology Inc. Integral field lens illumination for video inspection
US6603103B1 (en) * 1998-07-08 2003-08-05 Ppt Vision, Inc. Circuit for machine-vision system
US6177682B1 (en) * 1998-10-21 2001-01-23 Novacam Tyechnologies Inc. Inspection of ball grid arrays (BGA) by using shadow images of the solder balls
IL132817A (en) 1999-11-08 2003-11-23 Orbotech Schuh Gmbh & Co Illumination and image acquisition system
TW468033B (en) 2000-05-15 2001-12-11 Orbotech Ltd Microscope inspection system
US6552783B1 (en) * 2000-06-28 2003-04-22 Teradyne, Inc. Optical system
US6621566B1 (en) * 2000-10-02 2003-09-16 Teradyne, Inc. Optical inspection system having integrated component learning

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008502096A (ja) * 2004-03-05 2008-01-24 オプティクス ワン，インコーポレーテッド 均一な像を形成する懐中電灯優先権主張本願は、２００４年３月５日に出願された、米国出願番号１０／７９４０７３の優先権を主張するものである。背景情報
TWI410606B (zh) * 2006-01-11 2013-10-01 Orbotech Ltd 用於高解析度處理具有欲成像微觀形體之大體平坦工件之裝置，用於蒐集具有微觀形體之工件影像之方法，及用於檢驗微觀物件之系統
JP2012516063A (ja) * 2009-01-26 2012-07-12 ケーエルエー−テンカー・コーポレーション ウエハ上の欠陥を検出するためのシステムおよび方法
US9880107B2 (en) 2009-01-26 2018-01-30 Kla-Tencor Corp. Systems and methods for detecting defects on a wafer
US10605744B2 (en) 2009-01-26 2020-03-31 Kla-Tencor Corp. Systems and methods for detecting defects on a wafer
JP2013197338A (ja) * 2012-03-21 2013-09-30 Yamaha Motor Co Ltd プリント配線板用撮像装置、表面実装機および実装システム
WO2021019609A1 (ja) 2019-07-26 2021-02-04 株式会社Ｆｕｊｉ 対基板作業システム
CN114128417A (zh) * 2019-07-26 2022-03-01 株式会社富士 对基板作业系统
CN114128417B (zh) * 2019-07-26 2024-03-12 株式会社富士 对基板作业系统
US12051188B2 (en) 2019-07-26 2024-07-30 Fuji Corporation Substrate work system

Also Published As

Publication number Publication date
US6781687B2 (en) 2004-08-24
TW200405110A (en) 2004-04-01
US20040061850A1 (en) 2004-04-01
TWI289719B (en) 2007-11-11

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