JP2004152773A - 薄いセラミツク層を含むデイバイスの作成法 - Google Patents
薄いセラミツク層を含むデイバイスの作成法 Download PDFInfo
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- BQENXCOZCUHKRE-UHFFFAOYSA-N [La+3].[La+3].[O-][Mn]([O-])=O.[O-][Mn]([O-])=O.[O-][Mn]([O-])=O Chemical compound [La+3].[La+3].[O-][Mn]([O-])=O.[O-][Mn]([O-])=O.[O-][Mn]([O-])=O BQENXCOZCUHKRE-UHFFFAOYSA-N 0.000 description 1
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- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
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- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
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- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
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- 238000009736 wetting Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
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- B32B9/005—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B1/00—Producing shaped prefabricated articles from the material
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- H—ELECTRICITY
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- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
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Abstract
【解決手段】セラミツク粒子、結合剤および可塑剤の混合物を作成し、この混合物をセラミツク層に形成することにより作成され、第2の層がセラミツク層と隣接して配置され複合層構造体が形成され、更に複合層構造体のセラミツク層部分が所定の小さな厚さになるまで、ローリング処理することにより複合層構造体の厚さを減少する。
【選択図】図1
Description
ある場合対をなすローラ32あるいは一連の対をなすローラ32によってもセラミツクを含む層36の厚さを所望量減少できないことがある。減少量を増大させる積層工程が図1に示される。積層工程の図示の場合、(複合層構造体30をローラ32間に通過させることにより得られる)厚さが減少された複合層構造体34が別の層と共に積層される。別の層は図示のように厚さが減少された複合層構造体34の他の部分、他のテープ44あるいはその両方にできる。他のテープ44はセラミツクを含む他のテープ、金属粉末を含むテープ、不活性材料等にできる。このようなテープにより多層体46が形成される。多層体46は一対のローラ48間を通過することによりテープが積層され、多層体の厚さは実質的に減少されない。多層体46は2つのローラ50間あるいは一連の対をなすローラ間に通過され、ローラ32に関連して上述したような方法で多層体46の厚さが減少される。積層工程を実行し必要に応じこの工程を反復することによって、特定のセラミツクを含むテープ24あるいは36の厚さが所定の小さな値まで減少される。この結果得られる、厚さが減少した層あるいは多層体はデイバイス40の組み立てに使用される。
Claims (3)
- 第1のセラミック粒子、第1のバインダー、及び第1の可塑剤の第1のセラミック混合物を作成する工程と、
第1のセラミック混合物をセラミック電解質層に形成する工程と、
第2のセラミック粒子、第2のバインダー、及び第2の可塑剤の第2のセラミック混合物を作成する工程と、
第2のセラミック混合物を第1のセラミック電極層に形成する工程と;
セラミック電解質層を第1のセラミック電極層に積層して積層構造体を製造する工程と、
セラミック電解質層の厚さが所定の値に減少するまで、積層構造体の厚さを減少させる工程と、
該積層構造体を別の構造体と積層して二次積層構造体を形成する工程と、
二次積層構造体の厚さを減少させる工程と、
二次積層構造体の厚さを減少させる工程で製造された積層構造体を固体酸化物燃料セルに組み立てる工程と、
を含む固体酸化物燃料セルを作成する方法。 - 第1のセラミック混合物の形成、第2のセラミック混合物の形成、積層、及び厚さ減少工程がそれぞれの材料をロールの間を通過させることにより行われる請求項1の方法。
- 第1のセラミック粒子、第1のバインダー、及び第1の可塑剤の第1のセラミック混合物を作成する工程と、
第1のセラミック混合物をセラミック電解質層に形成する工程と、
第2のセラミック粒子、第2のバインダー、及び第2の可塑剤の第2のセラミック混合物を作成する工程と、
第2のセラミック混合物を第1のセラミック電極層に形成する工程と、
セラミック電解質層を第1のセラミック電極層に積層して積層構造体を生成する工程と、
セラミック電解質層の厚さが所定の値に減少するまで、積層構造体の厚さを減少させる工程と、
厚さを減少させた積層構造体を焼結し;第2の電極として作用させる第3のセラミック粒子層を積層構造体のセラミック電解質層側に塗布し;塗布工程で製造された構造体を焼結させる;諸工程が含まれる、該厚さ減少工程で製造された積層構造体を固体酸化物燃料セルに組み立てる工程と、
を含む固体酸化物燃料セルを作成する方法。
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US08/011,052 US5368667A (en) | 1993-01-29 | 1993-01-29 | Preparation of devices that include a thin ceramic layer |
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JP51713694A Division JP4006020B2 (ja) | 1993-01-29 | 1994-01-18 | 薄いセラミック層を含むデイバイスの作成法 |
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JP2004152773A true JP2004152773A (ja) | 2004-05-27 |
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JP51713694A Expired - Fee Related JP4006020B2 (ja) | 1993-01-29 | 1994-01-18 | 薄いセラミック層を含むデイバイスの作成法 |
JP2003389152A Pending JP2004152773A (ja) | 1993-01-29 | 2003-11-19 | 薄いセラミツク層を含むデイバイスの作成法 |
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JP51713694A Expired - Fee Related JP4006020B2 (ja) | 1993-01-29 | 1994-01-18 | 薄いセラミック層を含むデイバイスの作成法 |
Country Status (4)
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US (3) | US5368667A (ja) |
JP (2) | JP4006020B2 (ja) |
DE (1) | DE4490417T1 (ja) |
WO (1) | WO1994016887A1 (ja) |
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JP2014235858A (ja) * | 2013-05-31 | 2014-12-15 | 株式会社ノリタケカンパニーリミテド | 固体酸化物形燃料電池形成用のグリーンシートの製造方法 |
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-
1993
- 1993-01-29 US US08/011,052 patent/US5368667A/en not_active Expired - Fee Related
-
1994
- 1994-01-18 DE DE4490417T patent/DE4490417T1/de not_active Ceased
- 1994-01-18 WO PCT/US1994/000548 patent/WO1994016887A1/en active Application Filing
- 1994-01-18 JP JP51713694A patent/JP4006020B2/ja not_active Expired - Fee Related
- 1994-09-07 US US08/301,930 patent/US5589017A/en not_active Expired - Fee Related
-
1996
- 1996-06-10 US US08/662,724 patent/US5788788A/en not_active Expired - Lifetime
-
2003
- 2003-11-19 JP JP2003389152A patent/JP2004152773A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100849994B1 (ko) | 2006-12-19 | 2008-08-04 | 한국생산기술연구원 | 고체산화물 연료전지의 단위전지 제조용 가압장치 및 이를이용한 제조방법 |
JP2014235858A (ja) * | 2013-05-31 | 2014-12-15 | 株式会社ノリタケカンパニーリミテド | 固体酸化物形燃料電池形成用のグリーンシートの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US5368667A (en) | 1994-11-29 |
US5589017A (en) | 1996-12-31 |
DE4490417T1 (de) | 1996-01-25 |
JPH08505823A (ja) | 1996-06-25 |
WO1994016887A1 (en) | 1994-08-04 |
JP4006020B2 (ja) | 2007-11-14 |
US5788788A (en) | 1998-08-04 |
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