JP2004144975A5 - - Google Patents
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- Publication number
- JP2004144975A5 JP2004144975A5 JP2002309416A JP2002309416A JP2004144975A5 JP 2004144975 A5 JP2004144975 A5 JP 2004144975A5 JP 2002309416 A JP2002309416 A JP 2002309416A JP 2002309416 A JP2002309416 A JP 2002309416A JP 2004144975 A5 JP2004144975 A5 JP 2004144975A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002309416A JP2004144975A (ja) | 2002-10-24 | 2002-10-24 | パターン転写マスク、半導体装置の製造方法、及び、マスクパターン作成用コンピュータプログラム |
| US10/442,960 US7033925B2 (en) | 2002-10-24 | 2003-05-22 | Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| CNB031548423A CN100336197C (zh) | 2002-10-24 | 2003-08-15 | 图案复制掩模、半导体装置制造方法及掩模图案制作用程序 |
| US11/360,384 US20060141774A1 (en) | 2002-10-24 | 2006-02-24 | Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002309416A JP2004144975A (ja) | 2002-10-24 | 2002-10-24 | パターン転写マスク、半導体装置の製造方法、及び、マスクパターン作成用コンピュータプログラム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004144975A JP2004144975A (ja) | 2004-05-20 |
| JP2004144975A5 true JP2004144975A5 (enExample) | 2005-12-22 |
Family
ID=32105266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002309416A Withdrawn JP2004144975A (ja) | 2002-10-24 | 2002-10-24 | パターン転写マスク、半導体装置の製造方法、及び、マスクパターン作成用コンピュータプログラム |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US7033925B2 (enExample) |
| JP (1) | JP2004144975A (enExample) |
| CN (1) | CN100336197C (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006095915A1 (ja) * | 2005-03-09 | 2006-09-14 | Nec Corporation | 多層配線構造、半導体装置、パターン転写マスク、及び多層配線構造の製造方法 |
| KR100898222B1 (ko) * | 2007-08-30 | 2009-05-18 | 주식회사 동부하이텍 | 반도체 소자 및 그 제조 방법 |
| CN102683876B (zh) * | 2012-04-28 | 2016-01-06 | 深圳光启创新技术有限公司 | 超材料的制备工艺 |
| CN103019042B (zh) * | 2012-11-29 | 2015-01-07 | 上海华力微电子有限公司 | 改善高透光率掩膜板套刻精度稳定性的方法 |
| CN107505811B (zh) * | 2017-09-11 | 2020-05-05 | 深圳市华星光电技术有限公司 | 光罩 |
| US10481487B2 (en) | 2017-09-11 | 2019-11-19 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Mask |
| CN112711173A (zh) * | 2020-12-31 | 2021-04-27 | 苏州科阳半导体有限公司 | 一种光罩 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450943A (ja) * | 1990-06-15 | 1992-02-19 | Mitsubishi Electric Corp | マスクパターンとその製造方法 |
| JPH0844038A (ja) | 1994-08-03 | 1996-02-16 | Matsushita Electron Corp | マスターマスク作成装置及び半導体装置の製造方法 |
| JPH1012543A (ja) * | 1996-06-20 | 1998-01-16 | Mitsubishi Electric Corp | 位相シフトマスクを用いたパターンの形成方法 |
| JPH11307426A (ja) | 1998-04-22 | 1999-11-05 | Toshiba Corp | マスクパターンの補正方法と補正システム、及びこれらを用いた露光用マスクと半導体装置 |
| JP2000058647A (ja) | 1998-08-17 | 2000-02-25 | Toshiba Corp | 半導体装置の製造方法 |
| JP2000077524A (ja) * | 1998-09-03 | 2000-03-14 | Matsushita Electronics Industry Corp | パターン形成方法 |
| US6355399B1 (en) * | 2000-01-18 | 2002-03-12 | Chartered Semiconductor Manufacturing Ltd. | One step dual damascene patterning by gray tone mask |
| JP2001351924A (ja) * | 2000-06-08 | 2001-12-21 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
| JP3760086B2 (ja) * | 2000-07-07 | 2006-03-29 | 株式会社ルネサステクノロジ | フォトマスクの製造方法 |
| US6436810B1 (en) * | 2000-09-27 | 2002-08-20 | Institute Of Microelectronics | Bi-layer resist process for dual damascene |
| KR100475074B1 (ko) * | 2002-05-16 | 2005-03-10 | 삼성전자주식회사 | 반도체 소자의 커패시터의 스토리지 전극 제조 방법 |
-
2002
- 2002-10-24 JP JP2002309416A patent/JP2004144975A/ja not_active Withdrawn
-
2003
- 2003-05-22 US US10/442,960 patent/US7033925B2/en not_active Expired - Fee Related
- 2003-08-15 CN CNB031548423A patent/CN100336197C/zh not_active Expired - Fee Related
-
2006
- 2006-02-24 US US11/360,384 patent/US20060141774A1/en not_active Abandoned