JP2004038140A5 - - Google Patents
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- Publication number
- JP2004038140A5 JP2004038140A5 JP2003054131A JP2003054131A JP2004038140A5 JP 2004038140 A5 JP2004038140 A5 JP 2004038140A5 JP 2003054131 A JP2003054131 A JP 2003054131A JP 2003054131 A JP2003054131 A JP 2003054131A JP 2004038140 A5 JP2004038140 A5 JP 2004038140A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36112302P | 2002-03-01 | 2002-03-01 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010153102A Division JP4616931B2 (ja) | 2002-03-01 | 2010-07-05 | フォトレジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004038140A JP2004038140A (ja) | 2004-02-05 |
JP2004038140A5 true JP2004038140A5 (ja) | 2006-03-09 |
Family
ID=27734779
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003054131A Pending JP2004038140A (ja) | 2002-03-01 | 2003-02-28 | フォトレジスト組成物 |
JP2010153102A Expired - Fee Related JP4616931B2 (ja) | 2002-03-01 | 2010-07-05 | フォトレジスト組成物 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010153102A Expired - Fee Related JP4616931B2 (ja) | 2002-03-01 | 2010-07-05 | フォトレジスト組成物 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7220486B2 (ja) |
EP (1) | EP1341041A3 (ja) |
JP (2) | JP2004038140A (ja) |
KR (1) | KR100998068B1 (ja) |
TW (1) | TW200401164A (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0537524A1 (en) * | 1991-10-17 | 1993-04-21 | Shipley Company Inc. | Radiation sensitive compositions and methods |
US6740464B2 (en) * | 2000-01-14 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
TW200403522A (en) * | 2002-03-01 | 2004-03-01 | Shipley Co Llc | Photoresist compositions |
TW200401164A (en) | 2002-03-01 | 2004-01-16 | Shipley Co Llc | Photoresist compositions |
JP2004004703A (ja) * | 2002-04-03 | 2004-01-08 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
US8012670B2 (en) | 2002-04-11 | 2011-09-06 | Rohm And Haas Electronic Materials Llc | Photoresist systems |
KR100576477B1 (ko) * | 2003-10-06 | 2006-05-10 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 및 이를 이용한 패턴 형성방법 |
EP2336829B1 (en) * | 2009-12-15 | 2019-01-23 | Rohm and Haas Electronic Materials LLC | Photoresists and methods for use thereof |
JP5964615B2 (ja) * | 2011-03-28 | 2016-08-03 | 住友化学株式会社 | ポジ型レジスト組成物 |
US8728714B2 (en) * | 2011-11-17 | 2014-05-20 | Micron Technology, Inc. | Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures |
CN104460232B (zh) * | 2013-09-24 | 2019-11-15 | 住友化学株式会社 | 光致抗蚀剂组合物 |
JP6237551B2 (ja) * | 2014-09-18 | 2017-11-29 | 信越化学工業株式会社 | レジスト組成物及びパターン形成方法 |
KR102239212B1 (ko) * | 2018-12-14 | 2021-04-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3772102A (en) * | 1969-10-27 | 1973-11-13 | Gen Electric | Method of transferring a desired pattern in silicon to a substrate layer |
US4587196A (en) * | 1981-06-22 | 1986-05-06 | Philip A. Hunt Chemical Corporation | Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide |
EP0537524A1 (en) * | 1991-10-17 | 1993-04-21 | Shipley Company Inc. | Radiation sensitive compositions and methods |
JP3224602B2 (ja) * | 1992-07-10 | 2001-11-05 | 東京応化工業株式会社 | 感光性基材及びそれを用いたレジストパターン形成方法 |
US5879856A (en) * | 1995-12-05 | 1999-03-09 | Shipley Company, L.L.C. | Chemically amplified positive photoresists |
EP0789279B2 (en) * | 1996-02-09 | 2004-12-08 | Wako Pure Chemical Industries Ltd | Polymer and resist material |
JP3919887B2 (ja) | 1996-07-24 | 2007-05-30 | 東京応化工業株式会社 | 化学増幅型ポジ型レジスト組成物 |
US5945248A (en) * | 1996-07-24 | 1999-08-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemical-sensitization positive-working photoresist composition |
JP3695024B2 (ja) * | 1996-11-14 | 2005-09-14 | Jsr株式会社 | 半導体デバイス製造用感放射線性樹脂組成物 |
TW574628B (en) | 1996-12-10 | 2004-02-01 | Morton Int Inc | High resolution positive acting dry film photoresist |
IL141803A0 (en) * | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
TWI224241B (en) * | 1999-04-28 | 2004-11-21 | Jsr Corp | Positive resist composition |
JP2001013688A (ja) * | 1999-04-28 | 2001-01-19 | Jsr Corp | 感放射線性樹脂組成物 |
KR20020012206A (ko) * | 1999-05-04 | 2002-02-15 | 메리 이. 보울러 | 플루오르화 중합체, 포토레지스트 및 마이크로리소그래피방법 |
US6319655B1 (en) * | 1999-06-11 | 2001-11-20 | Electron Vision Corporation | Modification of 193 nm sensitive photoresist materials by electron beam exposure |
JP4424632B2 (ja) | 1999-07-13 | 2010-03-03 | 三菱レイヨン株式会社 | 化学増幅型レジスト組成物およびレジストパターン形成方法 |
KR100535149B1 (ko) * | 1999-08-17 | 2005-12-07 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물 |
US6692888B1 (en) * | 1999-10-07 | 2004-02-17 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
EP1240554A2 (en) * | 1999-11-17 | 2002-09-18 | E.I. Du Pont De Nemours And Company | Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
US6306554B1 (en) * | 2000-05-09 | 2001-10-23 | Shipley Company, L.L.C. | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
US7132214B2 (en) * | 2000-09-08 | 2006-11-07 | Shipley Company, L.L.C. | Polymers and photoresist compositions for short wavelength imaging |
AU2001288865A1 (en) * | 2000-09-08 | 2002-03-22 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising electronegative groups |
WO2002021214A2 (en) * | 2000-09-08 | 2002-03-14 | Shipley Company, L.L.C. | Use of acetal/ketal polymers in photoresist compositions suitable for short wave imaging |
US6844270B2 (en) * | 2000-11-26 | 2005-01-18 | Shipley Company, L.L.C. | Polymers and photoresist compositions for short wavelength imaging |
US6509134B2 (en) * | 2001-01-26 | 2003-01-21 | International Business Machines Corporation | Norbornene fluoroacrylate copolymers and process for the use thereof |
US6787286B2 (en) * | 2001-03-08 | 2004-09-07 | Shipley Company, L.L.C. | Solvents and photoresist compositions for short wavelength imaging |
JP2003020335A (ja) * | 2001-05-01 | 2003-01-24 | Jsr Corp | ポリシロキサンおよび感放射線性樹脂組成物 |
JP2003122007A (ja) * | 2001-10-09 | 2003-04-25 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP2003241386A (ja) * | 2001-12-13 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP3890979B2 (ja) * | 2001-12-27 | 2007-03-07 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
TW200403522A (en) * | 2002-03-01 | 2004-03-01 | Shipley Co Llc | Photoresist compositions |
TW200401164A (en) | 2002-03-01 | 2004-01-16 | Shipley Co Llc | Photoresist compositions |
-
2003
- 2003-02-27 TW TW92104155A patent/TW200401164A/zh unknown
- 2003-02-28 JP JP2003054131A patent/JP2004038140A/ja active Pending
- 2003-02-28 KR KR1020030012747A patent/KR100998068B1/ko active IP Right Grant
- 2003-02-28 EP EP20030251225 patent/EP1341041A3/en not_active Withdrawn
- 2003-03-01 US US10/377,165 patent/US7220486B2/en not_active Expired - Lifetime
-
2010
- 2010-07-05 JP JP2010153102A patent/JP4616931B2/ja not_active Expired - Fee Related