JP2004014827A - Manufacturing method of package for high frequency - Google Patents

Manufacturing method of package for high frequency Download PDF

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Publication number
JP2004014827A
JP2004014827A JP2002166579A JP2002166579A JP2004014827A JP 2004014827 A JP2004014827 A JP 2004014827A JP 2002166579 A JP2002166579 A JP 2002166579A JP 2002166579 A JP2002166579 A JP 2002166579A JP 2004014827 A JP2004014827 A JP 2004014827A
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insulator
manufacturing
frequency package
heat
metal plate
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JP2002166579A
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JP3984107B2 (en
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Akiyoshi Kosakata
小阪田 明義
Sumio Nakano
中野 澄夫
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Sumitomo Metal SMI Electronics Device Inc
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Sumitomo Metal SMI Electronics Device Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a package for high frequencies, in which a warping is prevented, a process yield is improved, the cost is low and no joining failure occurs. <P>SOLUTION: There is provided a manufacturing method of a package 10 for high frequencies, in which an upper surface of a nearly rectangular plate shaped heat dissipating metallic plate 11 made from a copper tungsten based composite metallic material and a lower surface of a frame shaped insulating body 12 made of ceramic are joined together, and an external connecting terminal 14 is joined to the upper surface of the insulating body 12, wherein the method comprises two processes: a process for brazing the heat dissipating metallic plate 11 with the insulating body 12 and the insulating body 12 with an external connecting terminal 14 using a high temperature brazing material 13 to form a joined body 15 and a process for correcting the warp by pressing the joined body 15 being heated at a temperature lower than the melting temperature of the high temperature brazing material 13. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明が属する技術分野】
本発明は、放熱用金属板と絶縁体、及び絶縁体と外部接続端子を接合して形成する高周波用パッケージの製造方法に関する。
【0002】
【従来の技術】
高周波用パッケージは、例えば、RF基地局等に用いるシリコンや、ガリウム砒素電界効果トランジスタ等の高周波、高出力の半導体素子を実装するのに用いられる。この高周波用パッケージは、半導体素子を実装するためのキャビティ部が、半導体素子の高周波の領域での電気特性を悪化させないために、略長方形状をした高放熱特性を有する放熱用金属板上に形成された半導体素子実装領域をセラミック製の枠状の絶縁体で囲繞するように接合して形成されている。そして、高周波用パッケージは、半導体素子が実装された後、絶縁体の上面に接合される蓋体でキャビティ部を気密に封止するようになっている。また、高周波信号は、絶縁体上面と蓋体との間に接合された外部接続端子を介して入出力されるようになっている。
【0003】
高周波用パッケージに、パワートランジスターモジュールに代表されるような半導体素子からの発熱量の大きな半導体素子が通常の方法で搭載されるのでは、発熱により半導体装置が正常に作動しなくなる恐れがある。そこで、半導体素子の作動時に発生する熱を大気中に良好に放散させるようにした高周波用パッケージとして、例えば、熱膨張係数がセラミックの熱膨張係数に近似し、しかも、熱伝導性に優れた金属からなる板状の放熱用金属板にセラミック製の枠状の絶縁体を接合して形成したパッケージが用いられている。
【0004】
図5(A)、(B)を参照して、従来の高周波用パッケージ50の製造方法の一例を説明する。セラミックと熱膨張係数が近似し、しかも放熱特性がよい銅タングステン(Cu−W)系の複合金属材料からなる板状の放熱用金属板51上に、アルミナ(Al)等からなるセラミック製の枠状の絶縁体52を、その裏面側に形成したメタライズパターン上にAg−Cuろう53を介して載置する。次いで、加熱炉で加熱して放熱金属板51と絶縁体52をろう付け接合する。更に、絶縁体52には、表面側に形成されたメタライズパターンを介して外部と接続するための金属部材からなる外部接続端子54をAg−Cuろう53でろう付け接合する。次いで、放熱金属板51と絶縁体52及び外部接続端子54の金属表面に、Niめっき及びAuめっきを施す。なお、放熱金属板51の長手方向の両端部には、ボード等に取り付けるための固定用切り欠き部55が設けられている。
【0005】
【発明が解決しようとする課題】
しかしながら、前述したような従来の高周波用パッケージの製造方法は、次のような問題がある。
(1)放熱用金属板や、外部接続端子の熱膨張係数は、絶縁体の熱膨張係数に近似させてはいるが、完全に一致させることが難しいので、Ag−Cuろう等の高温ろう材でろう付け接合を行うときに接合部に応力が発生し、接合して形成した接合体に反りが発生するのを防止することができない。従って、決められた許容範囲を超える反りが発生し、作製された高周波用パッケージの反りを選別検査を行って、良品のみを検出しているので、選別工程が必要となると同時に歩留まりの低下をきたし、高周波用パッケージのコスト高となっている。
(2)接合体に発生した反りを常温中で強制的に反り修正を行うと、応力の解放がないままでの修正であると考えられるが、半導体素子の接合や、蓋体の接合の時の加熱によって修正前の反りの状態に戻ってしまい、半導体素子や、蓋体の接合不良が発生している。
本発明は、かかる事情に鑑みてなされたものであって、反りの発生を防止して、歩留まりを向上させ、安価で接合不良の発生がない高周波用パッケージの製造方法を提供することを目的とする。
【0006】
【課題を解決するための手段】
前記目的に沿う本発明に係る高周波用パッケージの製造方法は、銅タングステン系の複合金属材料からなる略長方形板状の放熱用金属板の上面とセラミックからなる枠状の絶縁体の下面を接合し、絶縁体の上面に外部接続端子を接合して形成する高周波用パッケージの製造方法において、放熱用金属板と絶縁体、及び絶縁体と外部接続端子を高温ろう材でろう付け接合して接合体を形成する工程と、接合体を高温ろう材の溶融温度以下で加熱しながら押圧して反りを矯正する工程を有する。これにより、接合体に発生した反りを容易に矯正するすることができ、修正後の反りの発生を防止して歩留まりを向上させて安価に高周波用パッケージを作製でき、高周波用パッケージに接合される部材の接合不良の発生がない高周波用パッケージの製造方法を提供できる。
【0007】
ここで、接合体の放熱用金属板の長手方向両端部が、円柱体側部形状からなる凹部を有する反りの矯正を行うための台板の凹部内に当接するように載置し、接合体の上部から放熱用金属板の下面が凹部に接触するまで加熱しながら押圧して反りを矯正するのがよい。これにより、接合体の曲げすぎや、曲げ不足による高周波用パッケージの反りの矯正不良を発生させることがない。また、曲げすぎによるセラミック製の絶縁体を破壊させることなく高周波用パッケージの反りを矯正することができる。
【0008】
【発明の実施の形態】
続いて、添付した図面を参照しつつ、本発明を具体化した実施の形態について説明し、本発明の理解に供する。
ここに、図1(A)、(B)はそれぞれ本発明の一実施の形態に係る高周波用パッケージの製造方法で作製された高周波用パッケージの平面図、正面図、図2は同高周波用パッケージの製造方法で作製された高周波用モジュール基板の斜視図、図3(A)、(B)はそれぞれ同高周波用パッケージの製造方法の説明図、図4(A)〜(C)はそれぞれ同高周波用パッケージの他の製造方法の説明図である。
【0009】
図1(A)、(B)に示すように、本発明の一実施の形態に係る高周波用パッケージの製造方法で作製された高周波用パッケージ10は、実装される半導体素子から発生する高温、且つ大量の熱を放熱するための略長方形板状の放熱用金属板11の上面に、セラミック製の枠状の絶縁体12を高温ろう材13でろう付け接合して有している。また、高周波用パッケージ10は、絶縁体12の上面に、半導体素子18(図2参照)と電気的に接続し、外部との電送を行うためのリードフレーム形状の外部接続端子14を高温ろう材13でろう付け接合して有している。そして、この放熱用金属板11と、絶縁体12、及び外部接続端子14とで、接合体15を形成している。更に、図2に示すように、高周波用パッケージ10には、半導体素子18がキャビティ部16にダイボンドされ、半導体素子18と外部接続端子14とをボンディングワイヤ19で接続した後、樹脂や、セラミックや、金属等からなる蓋体20を樹脂や、ガラス等の接着材21で接着して気密に封止して、高周波用モジュール基板22を形成している。なお、放熱用金属板11の長手方向の両端部には、高周波用モジュール基板22をボード等に取り付けるための固定用切り欠き部17を有している。
【0010】
次いで、本発明の一実施の形態に係る高周波用パッケージの製造方法を詳細に説明する。
高周波用パッケージ10を形成するための放熱用金属板11は、熱膨張係数をセラミックの熱膨張係数と近似させ、熱伝導率の高い高放熱特性を有する、例えばポーラス状のタングステンに銅を含浸させたりして作製する、銅タングステン(Cu−W)系の複合金属材料から形成されている。そして、切削加工や、粉末冶金等の手法を用いてボード等の取り付け部材にねじ止め固定するための固定用切り欠き部17を設けて、実質的に長方形状に形成されている。なお、因みに、Cu−Wの熱伝導率は、230W/m・k程度であり、半導体素子18からの発熱を効率よく放熱させることができる。
【0011】
枠状の絶縁体12を形成するためのセラミックは、セラミックの一例であるAlからなり、Al粉末にマグネシア、シリカ、カルシア等の焼結助剤を適当量加えた粉末に、ジオクチルフタレート等の可塑剤と、アクリル樹脂等のバインダー、及びトルエン、キシレン、アルコール類等の溶剤を加え、十分に混練し、脱泡して粘度2000〜40000cpsのスラリーを作製する。次いで、ドクターブレード法等によって、例えば、厚み0.25mmのロール状のシートを形成し、適当なサイズの矩形状に切断したセラミックグリーンシートを作製する。
【0012】
次に、1又は複数枚のセラミックグリーンシートには、窓枠状になるように中空部を打ち抜き加工すると共に、タングステンや、モリブデン等の高融点金属からなる金属導体ペーストを用いて、絶縁体12の下面側及び上面側となるようにスクリーン印刷して金属導体パターンを形成する。また、セラミックグリーンシートが複数枚の場合には、積層して積層体の下面側及び上面側が金属導体パターンとなるようにスクリーン印刷して形成する。そして、高融点金属とセラミックグリーンシートを還元雰囲気中で同時焼成して下面側及び上面側に金属導体パターンを有する枠状の絶縁体12を作製する。なお、下面側の金属導体パターンは、放熱用金属板11と枠状の全周にわたってろう付け接合するために絶縁体12の下面全周面に形成されている。また、因みに、Alの熱膨張係数は、6.7×10−6/k程度であり、Cu−Wの熱膨張係数が、6.5×10−6/k程度であるので、熱膨張係数が近似している。
【0013】
絶縁体12の上面に接合されるリードフレーム形状からなる外部接続端子14は、KV(Fe−Ni−Co系合金、商品名「Kovar(コバール)」)、42アロイ(Fe−Ni系合金)等のセラミックと熱膨張係数が近似する金属部材からなり、切削加工や、エッチング加工や、打ち抜き加工等で所定の形状に形成されている。なお、因みに、KVの熱膨張係数が、5.3×10−6/k程度であり、Alの熱膨張係数の、6.7×10−6/k程度とは、互いに近似している。
【0014】
次いで、放熱用金属板11と、絶縁板12、及び外部接続端子14を接合して形成する接合体15から高周波用パッケージ10を作製する方法を説明する。
先ず、放熱用金属板11の表面、絶縁体12の両面の金属導体パターンの表面、及び外部接続端子14の表面には、それぞれNiや、Ni合金等からなる第1Niめっきを施す。次に、放熱用金属板11の中央部上面に、例えば、BAg−8(Agが72%と、残部がCuからなる共晶合金)等のAg−Cuろうからなる高温ろう材13を介して絶縁体12の下面側を当接させて載置し、約780〜900℃で加熱してろう付け接合している。次に、絶縁体12の上面に、例えば、BAg−8等のAg−Cuろうからなる高温ろう材13を介して外部接続端子14の先端部の下面側を当接させて載置し、約780〜900℃で加熱してろう付け接合している。この放熱用金属板11と、絶縁体12の接合、及び絶縁体12と外部接続端子14の接合によって、接合体15を形成している。なお、接合体15の形成は、放熱用金属板11と、絶縁体12の接合、及び絶縁体12と外部接続端子14の接合を同時に行って形成することもできる。
【0015】
このろう付け接合によって形成された接合体15には、放熱用金属板11、絶縁体12、及び外部接続端子14のそれぞれの熱膨張係数の不一致によって、反りが発生する。従って、図3(A)、(B)に示すように、接合体15には、高温ろう材13の溶融温度以下の温度、すなわち約780℃未満の温度で加熱しながら押圧することで反りが矯正され、高周波用パッケージ10が作製されている。なお、矯正前の反りの形状は、高周波用パッケージ10が有する一般的な形状、及び接合体15を形成する放熱用金属板11、絶縁体12、外部接続端子14のそれぞれの熱膨張係数の差から、実質的に接合体15の上面側に凸形状となっているので、押圧を接合体15の上面側から行っている。また、押圧は、押圧を解除した時に発生するバックラッシュを考慮して接合体15の形状が若干凹形状になるまで行っている。
【0016】
次いで、図4(A)〜(C)を参照して、本発明の一実施の形態に係る高周波用パッケージ10の他の製造方法を説明する。なお、図4(A)、(B)はそれぞれ接合体15を押圧する前の平面図、正面図、図4(C)は接合体15を押圧した後の正面図である。
【0017】
図4(A)、(B)に示すように、上述の場合と同様にして放熱用金属板11と、絶縁体12の接合、及び絶縁体12と外部接続端子14の接合によって形成された接合体15は、接合体15の放熱用金属板11の長手方向端部の稜辺が、円柱体の側部形状のようにして曲率半径を備えた溝状の凹部24を有する台板23の凹部24内で当接するようにして載置する。
【0018】
次に、図4(C)に示すように、接合体15の上部から、例えば、キャビティ部16の表面を押圧できる断面視して凸形曲面形状等からなる押圧体を用いて、放熱用金属板11の下面が凹部24に接触するまで高温ろう材13の溶融温度以下の温度で加熱しながら押圧を行って高周波用パッケージ10を形成するのがよい。
【0019】
なお、台板23は、ステンレス等の金属部材から形成され、凹部24の曲率半径は、接合体15の大きさ、形状によって選択できるが、700〜800mm程度がよく、700mmを下まわると反りが矯正されすぎ、700mmを超えると反りの矯正が不足する。また、加熱温度は、接合体15の大きさ、形状や、高温ろう材の種類によって選択できるが、250〜400℃程度がよく250℃を下まわると高周波用パッケージ10を再加熱した時に反りの矯正が元に戻る割合が大きくなる。
【0020】
【実施例】
本発明者は、Cu−Wからなり、外形寸法41×10mm、厚み1.2mmの放熱用金属板と、Alからなり、外形寸法31×9.5mm、内形寸法27.5×6mm、厚み0.25mmの枠状の絶縁体、及び、KVからなり、外形寸法11.5×5mm、厚み0.15mmの4枚の外部接続端子を準備し、BAg−8からなるAg−Cuろうでろう付け接合して接合体を作製した。そして、曲率半径750mmの凹部を有する台板上で、(1)常温中で押圧して反りを矯正したもの、(2)300℃で加熱しながら3秒押圧して反りを矯正したものの高周波用パッケージのサンプルを各6個作製した。これらのサンプルについて、反りを矯正する前と、反りを矯正した後と、400℃5分間加熱した後の反りの発生度合いを測定した。なお、400℃5分間の加熱した後の反りの測定は、半導体素子を実装したり、実装後のキャビティ部を蓋体で封止する時の加熱を想定したものである。(1)の各サンプルの測定結果を折れ線グラフにして表1に、(2)の各サンプルの測定結果を折れ線グラフにして表2に示す。
【0021】
【表1】

Figure 2004014827
【0022】
【表2】
Figure 2004014827
【0023】
(1)の常温中で押圧して反りを矯正したものについては、400℃5分間加熱した後の反りが矯正する前の反りの値に戻っており、反りの矯正効果がなくなっている。これに反して、(2)の300℃で加熱しながら3秒押圧して反りを矯正したものについては、400℃5分間加熱した後も反りが矯正する前の反りに戻ることなく、反りの矯正効果を維持することができる。
【0024】
【発明の効果】
請求項1及びこれに従属する請求項2記載の高周波用パッケージの製造方法は、放熱用金属板と絶縁体、及び絶縁体と外部接続端子を高温ろう材でろう付け接合して接合体を形成する工程と、接合体を高温ろう材の溶融温度以下で加熱しながら押圧して反りを矯正する工程を有するので、接合体に発生した反りを容易に矯正するすることができ、修正後の反りの発生を防止して歩留まりを向上させて安価に高周波用パッケージを作製できる。また、再加熱工程があったとしても矯正した反りが元に戻ることなく、高周波用パッケージに接合される部材の接合不良の発生がない高周波用パッケージの製造方法を提供できる。
【0025】
特に、請求項2記載の高周波用パッケージの製造方法は、接合体の放熱用金属板の長手方向両端部が、円柱体側部形状からなる凹部を有する反りの矯正を行うための台板の凹部内に当接するように載置し、接合体の上部から放熱用金属板の下面が凹部に接触するまで加熱しながら押圧して反りを矯正するので、接合体の曲げすぎや、曲げ不足による高周波用パッケージの反りの矯正不良の発生がなく、また、曲げすぎによる絶縁体の破壊を防止して高周波用パッケージの反りを矯正することができる。
【図面の簡単な説明】
【図1】(A)、(B)はそれぞれ本発明の一実施の形態に係る高周波用パッケージの製造方法で作製された高周波用パッケージの平面図、正面図である。
【図2】同高周波用パッケージの製造方法で作製された高周波用モジュール基板の斜視図である。
【図3】(A)、(B)はそれぞれ同高周波用パッケージの製造方法の説明図である。
【図4】(A)〜(C)はそれぞれ同高周波用パッケージの他の製造方法の説明図である。
【図5】(A)、(B)はそれぞれ従来の高周波用パッケージの製造方法で作製された高周波用パッケージの平面図、正面図である。
【符号の説明】
10:高周波用パッケージ、11:放熱用金属板、12:絶縁体、13:高温ろう材、14:外部接続端子、15:接合体、16:キャビティ部、17:固定用切り欠き部、18:半導体素子、19:ボンディングワイヤ、20:蓋体、21:接着材、22:高周波用モジュール基板、23:台板、24:凹部[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for manufacturing a high-frequency package formed by bonding a heat-dissipating metal plate and an insulator, and an insulator and an external connection terminal.
[0002]
[Prior art]
The high-frequency package is used for mounting, for example, silicon used for an RF base station or the like, or a high-frequency, high-output semiconductor element such as a gallium arsenide field effect transistor. In this high-frequency package, the cavity for mounting the semiconductor element is formed on a substantially rectangular heat-dissipating metal plate having a high heat-dissipation characteristic so as not to deteriorate the electric characteristics of the semiconductor element in a high-frequency region. The semiconductor element mounting area thus formed is joined so as to be surrounded by a ceramic frame-shaped insulator. After the semiconductor element is mounted on the high-frequency package, the cavity is hermetically sealed with a lid joined to the upper surface of the insulator. The high-frequency signal is input / output via an external connection terminal joined between the upper surface of the insulator and the lid.
[0003]
If a semiconductor element that generates a large amount of heat from a semiconductor element, such as a power transistor module, is mounted on a high-frequency package by an ordinary method, the semiconductor device may not operate normally due to heat generation. Therefore, as a high-frequency package that satisfactorily dissipates heat generated during operation of a semiconductor element into the atmosphere, for example, a metal having a coefficient of thermal expansion close to that of ceramic and having excellent thermal conductivity A package formed by joining a frame-shaped insulator made of ceramic to a plate-shaped heat-dissipating metal plate made of
[0004]
An example of a conventional method for manufacturing the high-frequency package 50 will be described with reference to FIGS. A ceramic made of alumina (Al 2 O 3 ) or the like is placed on a plate-shaped heat-dissipating metal plate 51 made of a copper-tungsten (Cu-W) -based composite metal material having a thermal expansion coefficient similar to that of a ceramic and having good heat dissipation characteristics. A frame-shaped insulator 52 is placed on a metallized pattern formed on the back side of the insulator 52 via an Ag-Cu solder 53. Next, the heat-dissipating metal plate 51 and the insulator 52 are joined by brazing by heating in a heating furnace. Further, an external connection terminal 54 made of a metal member for connection to the outside via a metallized pattern formed on the front surface side is brazed to the insulator 52 with an Ag-Cu braze 53. Next, Ni plating and Au plating are applied to the metal surfaces of the heat dissipating metal plate 51, the insulator 52, and the external connection terminals 54. At both ends in the longitudinal direction of the heat dissipating metal plate 51, fixing notches 55 for attaching to a board or the like are provided.
[0005]
[Problems to be solved by the invention]
However, the conventional method for manufacturing a high-frequency package as described above has the following problems.
(1) Although the thermal expansion coefficients of the heat-dissipating metal plate and the external connection terminal are close to the thermal expansion coefficients of the insulator, it is difficult to completely match them, so a high-temperature brazing material such as Ag-Cu brazing material is used. Therefore, it is not possible to prevent the occurrence of stress in the joint when brazing is performed, and to prevent warping of the joined body formed by joining. Therefore, a warp exceeding a predetermined allowable range occurs, and the warpage of the manufactured high-frequency package is subjected to a screening inspection to detect only non-defective products, so that a screening process is required and the yield is lowered at the same time. Therefore, the cost of the high-frequency package is high.
(2) Forcibly correcting the warpage of the bonded body at room temperature is considered to be a correction without releasing the stress. However, it is considered that the warpage is corrected when the semiconductor element is bonded or the lid is bonded. The heating returns to the state of the warpage before the correction, and the bonding failure of the semiconductor element and the lid occurs.
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing a high-frequency package that prevents warpage, improves yield, and is inexpensive and does not generate defective bonding. I do.
[0006]
[Means for Solving the Problems]
A method for manufacturing a high-frequency package according to the present invention, which meets the above object, comprises joining an upper surface of a substantially rectangular plate-shaped heat-dissipating metal plate made of a copper-tungsten composite metal material and a lower surface of a frame-shaped insulator made of ceramic. A method for manufacturing a high-frequency package in which an external connection terminal is formed by bonding an external connection terminal to an upper surface of an insulator, wherein the heat-dissipation metal plate and the insulator, and the insulator and the external connection terminal are connected by brazing with a high-temperature brazing material. And a step of pressing the joined body while heating it below the melting temperature of the high-temperature brazing material to correct the warpage. Thereby, the warpage generated in the joined body can be easily corrected, the occurrence of the warpage after the correction can be prevented, the yield can be improved, and the high-frequency package can be manufactured at low cost, and the high-frequency package can be joined to the high-frequency package. It is possible to provide a method for manufacturing a high-frequency package free from occurrence of defective joining of members.
[0007]
Here, both ends in the longitudinal direction of the heat-dissipating metal plate of the joined body are placed so as to be in contact with the concave portion of the base plate for performing warp correction having a concave portion having a cylindrical side portion shape, and It is preferable to correct the warpage by pressing while heating until the lower surface of the heat-dissipating metal plate contacts the concave portion from the upper portion. This prevents the bonded body from being excessively bent or insufficiently corrected for warping of the high-frequency package due to insufficient bending. In addition, it is possible to correct the warpage of the high-frequency package without breaking the ceramic insulator due to excessive bending.
[0008]
BEST MODE FOR CARRYING OUT THE INVENTION
Next, embodiments of the present invention will be described with reference to the accompanying drawings to provide an understanding of the present invention.
1A and 1B are a plan view and a front view, respectively, of a high-frequency package manufactured by a method for manufacturing a high-frequency package according to an embodiment of the present invention, and FIG. FIGS. 3A and 3B are explanatory views of a method of manufacturing the high-frequency package, and FIGS. 4A to 4C are views illustrating the high-frequency module substrate manufactured by the method of FIGS. FIG. 7 is an explanatory view of another method of manufacturing a package for use.
[0009]
As shown in FIGS. 1A and 1B, a high-frequency package 10 manufactured by a method for manufacturing a high-frequency package according to one embodiment of the present invention has a high temperature generated from a semiconductor element to be mounted, and A ceramic frame-shaped insulator 12 is brazed and joined with a high-temperature brazing material 13 on the upper surface of a substantially rectangular plate-shaped heat-dissipating metal plate 11 for dissipating a large amount of heat. The high-frequency package 10 has a lead frame-shaped external connection terminal 14 electrically connected to a semiconductor element 18 (see FIG. 2) on the upper surface of the insulator 12 for transmitting electric power to the outside. 13 and brazed. The heat dissipating metal plate 11, the insulator 12, and the external connection terminal 14 form a joined body 15. Further, as shown in FIG. 2, in the high-frequency package 10, a semiconductor element 18 is die-bonded to the cavity portion 16, and the semiconductor element 18 and the external connection terminal 14 are connected by a bonding wire 19, and then a resin, ceramic, or the like is formed. A lid 20 made of metal or the like is bonded with an adhesive 21 such as resin or glass, and hermetically sealed to form a high-frequency module substrate 22. At both ends in the longitudinal direction of the heat-dissipating metal plate 11, fixing notches 17 for attaching the high-frequency module substrate 22 to a board or the like are provided.
[0010]
Next, a method for manufacturing the high-frequency package according to one embodiment of the present invention will be described in detail.
The heat-dissipating metal plate 11 for forming the high-frequency package 10 is made by impregnating copper into porous tungsten, for example, which has a coefficient of thermal expansion close to that of ceramic and has high heat-dissipation characteristics with high thermal conductivity. It is formed from a copper-tungsten (Cu-W) -based composite metal material which is produced by the following method. Then, a fixing notch 17 for screwing and fixing to a mounting member such as a board using a method such as cutting or powder metallurgy is provided, and is formed in a substantially rectangular shape. Incidentally, the thermal conductivity of Cu-W is about 230 W / mk, and the heat generated from the semiconductor element 18 can be efficiently radiated.
[0011]
The ceramic for forming the frame-shaped insulator 12 is made of Al 2 O 3, which is an example of ceramic, and is obtained by adding an appropriate amount of a sintering aid such as magnesia, silica, and calcia to Al 2 O 3 powder. , A plasticizer such as dioctyl phthalate, a binder such as an acrylic resin, and a solvent such as toluene, xylene, and alcohols are sufficiently kneaded and defoamed to prepare a slurry having a viscosity of 2000 to 40000 cps. Next, for example, a roll-shaped sheet having a thickness of 0.25 mm is formed by a doctor blade method or the like, and a ceramic green sheet cut into a rectangular shape having an appropriate size is manufactured.
[0012]
Next, a hollow portion is punched into one or more ceramic green sheets so as to form a window frame, and a metal conductor paste made of a high melting point metal such as tungsten or molybdenum is used. Is screen-printed so as to be on the lower surface side and the upper surface side of the metal conductor pattern. When there are a plurality of ceramic green sheets, they are laminated and screen printed so that the lower surface side and the upper surface side of the laminate become metal conductor patterns. Then, the refractory metal and the ceramic green sheet are simultaneously fired in a reducing atmosphere to produce a frame-shaped insulator 12 having a metal conductor pattern on the lower surface side and the upper surface side. In addition, the metal conductor pattern on the lower surface side is formed on the entire lower surface of the insulator 12 so as to be brazed to the metal plate 11 for heat radiation over the entire periphery of the frame. In addition, the thermal expansion coefficient of Al 2 O 3 is about 6.7 × 10 −6 / k, and the thermal expansion coefficient of Cu—W is about 6.5 × 10 −6 / k. Thermal expansion coefficients are similar.
[0013]
The external connection terminal 14 having a lead frame shape joined to the upper surface of the insulator 12 is made of KV (Fe—Ni—Co alloy, trade name “Kovar”), 42 alloy (Fe—Ni alloy), or the like. And a metal member having a coefficient of thermal expansion similar to that of the ceramics, and is formed into a predetermined shape by cutting, etching, punching, or the like. Incidentally, the coefficient of thermal expansion of KV is approximately 5.3 × 10 −6 / k, and the coefficient of thermal expansion of Al 2 O 3 is approximately 6.7 × 10 −6 / k. ing.
[0014]
Next, a method of manufacturing the high-frequency package 10 from the joined body 15 formed by joining the heat-dissipating metal plate 11, the insulating plate 12, and the external connection terminal 14 will be described.
First, a first Ni plating made of Ni, a Ni alloy, or the like is applied to the surface of the metal plate 11 for heat radiation, the surface of the metal conductor pattern on both surfaces of the insulator 12, and the surface of the external connection terminal 14, respectively. Next, on the upper surface of the central part of the heat-dissipating metal plate 11, for example, a high-temperature brazing material 13 made of Ag-Cu brazing such as BAg-8 (a eutectic alloy composed of 72% Ag and the balance of Cu) is used. The lower surface of the insulator 12 is placed in contact with the insulator 12, and the insulator 12 is heated at about 780 to 900 ° C. and brazed. Next, the lower surface of the distal end of the external connection terminal 14 is placed on the upper surface of the insulator 12 via a high-temperature brazing material 13 made of, for example, Ag-Cu brazing such as BAg-8. It is heated at 780 to 900 ° C. and brazed. The joined body 15 is formed by joining the heat-dissipating metal plate 11 to the insulator 12 and joining the insulator 12 to the external connection terminal 14. The bonding body 15 can also be formed by simultaneously bonding the heat-dissipating metal plate 11 and the insulator 12 and bonding the insulator 12 and the external connection terminal 14.
[0015]
In the joined body 15 formed by the brazing, warpage occurs due to the mismatch of the thermal expansion coefficients of the metal plate for heat radiation 11, the insulator 12, and the external connection terminal 14. Therefore, as shown in FIGS. 3A and 3B, the bonded body 15 is warped by being pressed at a temperature lower than the melting temperature of the high-temperature brazing material 13, that is, at a temperature lower than about 780 ° C. The straightened high-frequency package 10 is manufactured. The shape of the warpage before the correction is the general shape of the high-frequency package 10 and the difference between the thermal expansion coefficients of the heat-dissipating metal plate 11, the insulator 12, and the external connection terminal 14 that form the joint 15. Therefore, since the shape is substantially convex on the upper surface side of the joined body 15, the pressing is performed from the upper surface side of the joined body 15. The pressing is performed until the shape of the joined body 15 becomes slightly concave in consideration of the backlash generated when the pressing is released.
[0016]
Next, another method of manufacturing the high-frequency package 10 according to the embodiment of the present invention will be described with reference to FIGS. 4A and 4B are a plan view and a front view, respectively, before pressing the joined body 15, and FIG. 4C is a front view after pressing the joined body 15, respectively.
[0017]
As shown in FIGS. 4A and 4B, in the same manner as described above, the junction formed between the metal plate 11 for heat dissipation and the insulator 12 and the junction between the insulator 12 and the external connection terminal 14 are formed. The body 15 is a recess of a base plate 23 in which a ridge at a longitudinal end of the heat-dissipating metal plate 11 of the joint body 15 has a groove-shaped recess 24 having a radius of curvature like a side shape of a cylindrical body. 24 so as to be in contact with each other.
[0018]
Next, as shown in FIG. 4 (C), a metal body for heat dissipation is used from above the joined body 15, for example, by using a pressing body having a convex curved surface shape or the like in cross section capable of pressing the surface of the cavity portion 16. The high-frequency package 10 is preferably formed by pressing while heating at a temperature equal to or lower than the melting temperature of the high-temperature brazing material 13 until the lower surface of the plate 11 contacts the concave portion 24.
[0019]
The base plate 23 is formed of a metal member such as stainless steel, and the radius of curvature of the concave portion 24 can be selected depending on the size and shape of the joined body 15, but is preferably about 700 to 800 mm, and warpage occurs below 700 mm. If it is corrected too much, and if it exceeds 700 mm, the correction of the warp is insufficient. The heating temperature can be selected depending on the size and shape of the joined body 15 and the type of the high-temperature brazing material. However, the heating temperature is preferably about 250 to 400 ° C., and if the temperature falls below 250 ° C., the warping occurs when the high-frequency package 10 is reheated. The rate at which corrections revert is increased.
[0020]
【Example】
The present inventors have made Cu-W, Dimensions 41 × 10 mm, and the radiating metal plate having a thickness of 1.2 mm, made of Al 2 O 3, outer dimensions 31 × 9.5 mm, inner dimensions 27.5 × 6 mm, a frame-shaped insulator having a thickness of 0.25 mm, and four external connection terminals made of KV and having outer dimensions of 11.5 × 5 mm and a thickness of 0.15 mm are prepared, and Ag-Cu made of BAg-8 is prepared. A joined body was prepared by brazing and joining. Then, on a base plate having a concave portion with a radius of curvature of 750 mm, (1) pressing at room temperature to correct the warp, and (2) pressing at 3 seconds while heating at 300 ° C. to correct the warping, for high frequency Six samples of each package were prepared. With respect to these samples, the degree of warpage before the warp was corrected, after the warp was corrected, and after heating at 400 ° C. for 5 minutes was measured. The measurement of the warpage after heating at 400 ° C. for 5 minutes is based on the assumption that the semiconductor element is mounted or that the cavity after mounting is sealed with a lid. Table 1 shows the measurement result of each sample of (1) as a line graph, and Table 2 shows the measurement result of each sample of (2) as a line graph.
[0021]
[Table 1]
Figure 2004014827
[0022]
[Table 2]
Figure 2004014827
[0023]
In the case of (1) in which the warpage was corrected by pressing at room temperature, the warp after heating at 400 ° C. for 5 minutes returned to the value of the warp before the correction, and the effect of correcting the warp was lost. On the other hand, in the case of (2) in which the warpage was corrected by pressing for 3 seconds while heating at 300 ° C., the warpage did not return to that before the warp was corrected even after heating at 400 ° C. for 5 minutes. Corrective effect can be maintained.
[0024]
【The invention's effect】
According to the method for manufacturing a high-frequency package according to the first and second aspects of the present invention, a joined body is formed by brazing a metal plate for heat radiation and an insulator, and an insulator and an external connection terminal with a high-temperature brazing material. And a step of correcting the warpage by pressing the joined body while heating it at or below the melting temperature of the high-temperature brazing material, so that the warpage generated in the joined body can be easily corrected, and the corrected warpage can be easily obtained. The generation of high frequency can be prevented, the yield can be improved, and a high-frequency package can be manufactured at low cost. Further, even if there is a reheating step, it is possible to provide a method for manufacturing a high-frequency package in which the corrected warpage does not return to the original state and no joining failure of members joined to the high-frequency package occurs.
[0025]
In particular, the method for manufacturing a high-frequency package according to claim 2 is characterized in that both ends in the longitudinal direction of the heat-dissipating metal plate of the joined body are formed in the recesses of the base plate for performing warp correction having a recess having a cylindrical side shape. The package is placed so as to be in contact with the package, and it is pressed while heating from the upper part of the joined body until the lower surface of the metal plate for heat radiation contacts the concave part to correct the warpage. In addition, it is possible to correct the warpage of the high-frequency package by preventing occurrence of a defect in correcting the warpage of the package and preventing breakage of the insulator due to excessive bending.
[Brief description of the drawings]
FIGS. 1A and 1B are a plan view and a front view, respectively, of a high-frequency package manufactured by a method for manufacturing a high-frequency package according to an embodiment of the present invention.
FIG. 2 is a perspective view of a high-frequency module substrate manufactured by the method for manufacturing a high-frequency package.
FIGS. 3A and 3B are diagrams illustrating a method of manufacturing the high-frequency package.
FIGS. 4A to 4C are diagrams illustrating another method of manufacturing the high-frequency package.
FIGS. 5A and 5B are a plan view and a front view, respectively, of a high-frequency package manufactured by a conventional method for manufacturing a high-frequency package.
[Explanation of symbols]
10: High frequency package, 11: Heat dissipation metal plate, 12: Insulator, 13: High temperature brazing material, 14: External connection terminal, 15: Joint, 16: Cavity, 17: Notch for fixing, 18: Semiconductor element, 19: bonding wire, 20: lid, 21: adhesive, 22: high-frequency module substrate, 23: base plate, 24: recess

Claims (2)

銅タングステン系の複合金属材料からなる略長方形板状の放熱用金属板の上面とセラミックからなる枠状の絶縁体の下面を接合し、該絶縁体の上面に外部接続端子を接合して形成する高周波用パッケージの製造方法において、
前記放熱用金属板と前記絶縁体、及び該絶縁体と前記外部接続端子を高温ろう材でろう付け接合して接合体を形成する工程と、
前記接合体を前記高温ろう材の溶融温度以下で加熱しながら押圧して反りを矯正する工程を有することを特徴とする高周波用パッケージの製造方法。
The upper surface of a substantially rectangular plate-shaped heat-dissipating metal plate made of a copper-tungsten composite metal material is joined to the lower surface of a frame-shaped insulator made of ceramic, and an external connection terminal is joined to the upper surface of the insulator. In the method for manufacturing a high-frequency package,
A step of brazing and joining the heat-dissipating metal plate and the insulator, and the insulator and the external connection terminal with a high-temperature brazing material,
A method of manufacturing a high-frequency package, comprising a step of pressing the joined body while heating it at a temperature equal to or lower than the melting temperature of the high-temperature brazing material to correct the warpage.
請求項1記載の高周波用パッケージの製造方法において、前記接合体の前記放熱用金属板の長手方向両端部が、円柱体側部形状からなる凹部を有する反りの矯正を行うための台板の該凹部内に当接するように載置し、前記接合体の上部から前記放熱用金属板の下面が前記凹部に接触するまで加熱しながら押圧して反りを矯正することを特徴とする高周波用パッケージの製造方法。2. The method of manufacturing a high-frequency package according to claim 1, wherein the longitudinal ends of the heat-dissipating metal plate of the joined body have concave portions having a cylindrical side shape. Manufacturing a high-frequency package, wherein the package is placed so as to be in contact with the inside, and is pressed while heating from the upper part of the joined body until the lower surface of the metal plate for heat radiation contacts the concave part to correct the warp. Method.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008507132A (en) * 2004-07-15 2008-03-06 フリースケール セミコンダクター インコーポレイテッド Method and apparatus for assembling semiconductor components
US7632716B2 (en) 2003-06-09 2009-12-15 Sumitomo Metal (Smi) Electronics Devices, Inc. Package for high frequency usages and its manufacturing method
JP2011216533A (en) * 2010-03-31 2011-10-27 Dowa Metaltech Kk Metal ceramic joined circuit board and method of manufacturing the same
JP2014090048A (en) * 2012-10-30 2014-05-15 Nippon Steel & Sumikin Electronics Devices Inc Power module substrate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7632716B2 (en) 2003-06-09 2009-12-15 Sumitomo Metal (Smi) Electronics Devices, Inc. Package for high frequency usages and its manufacturing method
JP2008507132A (en) * 2004-07-15 2008-03-06 フリースケール セミコンダクター インコーポレイテッド Method and apparatus for assembling semiconductor components
JP4833972B2 (en) * 2004-07-15 2011-12-07 フリースケール セミコンダクター インコーポレイテッド Method for assembling semiconductor components
JP2011216533A (en) * 2010-03-31 2011-10-27 Dowa Metaltech Kk Metal ceramic joined circuit board and method of manufacturing the same
JP2014090048A (en) * 2012-10-30 2014-05-15 Nippon Steel & Sumikin Electronics Devices Inc Power module substrate

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