JP2008159975A - Package for housing semiconductor element, and method of manufacturing the same - Google Patents

Package for housing semiconductor element, and method of manufacturing the same Download PDF

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JP2008159975A
JP2008159975A JP2006348992A JP2006348992A JP2008159975A JP 2008159975 A JP2008159975 A JP 2008159975A JP 2006348992 A JP2006348992 A JP 2006348992A JP 2006348992 A JP2006348992 A JP 2006348992A JP 2008159975 A JP2008159975 A JP 2008159975A
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heat sink
semiconductor element
package
sink plate
housing
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Koichi Nakasu
浩一 中洲
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Sumitomo Metal SMI Electronics Device Inc
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Sumitomo Metal SMI Electronics Device Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires

Abstract

<P>PROBLEM TO BE SOLVED: To provide a package for housing a semiconductor element and a method of manufacturing the same, having superior heat radiation performance and electrical characteristics and proper dimensional accuracy, at a low cost. <P>SOLUTION: A package 10 for housing a semiconductor element consists of: an approximate rectangular shaped heat sink 11 made of a metallic plate having a high heat radiation performance; a window flame shaped insulating frame body 12 made of ceramics in the center part in a longitudinal direction of one main surface of the heat sink 11; and a junction structure 15 to which an external connection terminal 14 made of a metallic plate on an upper side of the insulating frame body 12 are jointed. In the package 10, a grinding surface 18 is provided over the whole surface of the other main surface of the heat sink 11 of the junction structure 15. The position of the grinding surface 18 intersects notch surfaces 19 and 19a, consisting of a C side and an R side preliminarily provided at both ridges of at least short-length direction of the other main surface of the heat sink 11. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、半導体素子が収納され、半導体素子からの発熱を放熱させるために基台にねじ止めや、接合されるヒートシンク板と、セラミック製の絶縁枠体を接合して形成される半導体素子収納用パッケージ及びその製造方法に関する。   The present invention is a semiconductor element housing in which a semiconductor element is housed and formed by joining a heat sink plate to be bonded to a base or a ceramic insulating frame to dissipate heat generated from the semiconductor element. The present invention relates to a package and a manufacturing method thereof.

従来から、半導体素子収納用パッケージには、シリコンや、ガリウム砒素電界効果トランジスタ等の高周波、高出力の半導体素子が実装され、例えば、RF(Radio Frequency)基地局用等のモジュールを形成するために用いられるものがある。高周波用の半導体素子は、作動時の発熱が大きいので、発生する熱を大気中に良好に放散させなければ、装置を正常に作動させることができなくなる恐れがある。そこで、高周波用の半導体素子を搭載させるための半導体素子収納用パッケージは、半導体素子を実装するためのキャビティ部が、半導体素子の高周波の領域での電気特性を悪化させないために、略長方形状をした高放熱特性を有する金属板からなるヒートシンク板上に形成された半導体素子実装領域を、セラミック製の窓枠形状をした絶縁枠体で囲繞するように接合して形成されている。この半導体素子収納用パッケージには、半導体素子がキャビティ部に搭載され、ボンディングワイヤ等で外部接続端子と電気的に導通状態として実装された後、絶縁体の上面に接合される蓋体でキャビティ部を気密に封止するようになっている。また、高周波信号は、絶縁体上面と蓋体との間に接合された外部接続端子を介して入出力されるようになっている。そして、半導体素子が封止された半導体素子収納用パッケージは、ヒートシンク板に放熱された熱を更に外部に放熱させるための基台に、ヒートシンク板の略長方形状の長手方向の両端部に形成されているねじ取付部にねじが取り付けられてねじ止めして固定されるようになっている。   Conventionally, high-frequency, high-power semiconductor elements such as silicon and gallium arsenide field effect transistors are mounted on a semiconductor element storage package, for example, to form a module for an RF (Radio Frequency) base station or the like. Some are used. Since high-frequency semiconductor elements generate a large amount of heat during operation, the device may not be able to operate normally unless the generated heat is dissipated well into the atmosphere. Therefore, a package for housing a semiconductor element for mounting a semiconductor element for high frequency has a substantially rectangular shape so that the cavity for mounting the semiconductor element does not deteriorate the electrical characteristics in the high frequency region of the semiconductor element. The semiconductor element mounting region formed on the heat sink plate made of a metal plate having a high heat dissipation characteristic is joined and surrounded by an insulating frame body having a ceramic window frame shape. In this semiconductor element storage package, the semiconductor element is mounted in the cavity portion, mounted in a conductive state with an external connection terminal by a bonding wire or the like, and then the cavity portion is bonded to the upper surface of the insulator. Is hermetically sealed. The high-frequency signal is input / output via an external connection terminal joined between the upper surface of the insulator and the lid. The semiconductor element storage package in which the semiconductor elements are sealed is formed on both ends of the substantially rectangular shape of the heat sink plate on the base for further radiating the heat radiated to the heat sink plate to the outside. A screw is attached to the screw mounting portion, and is fixed by screwing.

図5(A)、(B)に示すように、従来の高周波用の半導体素子を収納するための半導体素子収納用パッケージ50には、セラミックと熱膨張係数が近似し、しかも放熱特性がよい、例えば、銅タングステン(Cu−W)系の複合金属板の略長方形状からなるヒートシンク板51と、アルミナ(Al)等からなるセラミック製の窓枠形状からなる絶縁枠体52が用いられている。そして、半導体素子収納用パッケージ50は、ヒートシンク板51の長手方向の中央部に、絶縁枠体52がその裏面側に形成されたメタライズパターンにAg−Cuろう53を介して載置され、加熱炉で加熱されてろう付け接合されて形成されている。このろう付け接合に併せて、絶縁枠体52には、外部と接続するための金属部材からなる外部接続端子54が絶縁枠体52の表面側に形成されたメタライズパターンにAg−Cuろう53を介して載置され、加熱炉で加熱されてろう付け接合されている。更に、ヒートシンク板51と絶縁枠体52及び外部接続端子54の金属表面には、Niめっき及びAuめっきが施されている。なお、ヒートシンク板51の長手方向の両端部には、ヒートシンク板51からの熱を更に外部に放熱させるための基台55に取り付けてねじ56でねじ止めして固定するためのねじ取付部57が設けられている。 As shown in FIGS. 5A and 5B, the conventional semiconductor element housing package 50 for housing a high-frequency semiconductor element has a thermal expansion coefficient approximate to that of ceramic, and has good heat dissipation characteristics. For example, a heat sink plate 51 having a substantially rectangular shape of a copper tungsten (Cu—W) based composite metal plate and an insulating frame 52 having a ceramic window frame shape made of alumina (Al 2 O 3 ) or the like are used. ing. The semiconductor element storage package 50 is placed on the metallized pattern having the insulating frame 52 formed on the back side thereof at the center in the longitudinal direction of the heat sink plate 51 via the Ag-Cu brazing 53, and the heating furnace It is heated and brazed and joined. In conjunction with this brazing and joining, an external connection terminal 54 made of a metal member for connecting to the outside is provided on the insulating frame 52 with Ag—Cu brazing 53 formed on the metallized pattern formed on the surface side of the insulating frame 52. And is brazed and joined by heating in a heating furnace. Further, Ni plating and Au plating are applied to the metal surfaces of the heat sink plate 51, the insulating frame 52, and the external connection terminal 54. At both ends in the longitudinal direction of the heat sink plate 51, screw mounting portions 57 are attached to a base 55 for further dissipating the heat from the heat sink plate 51 to the outside and fixed with screws 56. Is provided.

従来の高周波用の半導体素子を収納するための半導体素子収納用パッケージには、ヒートシンク板と基台の間の放熱特性や、電気的特性を向上させることを目的に、ヒートシンク板と基台の間にインジウムシートを挟んでねじで締め付けているものが開示されている(例えば、特許文献1参照)。
また、高周波用の半導体素子を収納するための半導体素子収納用パッケージには、ヒートシンク板の長手方向の端部に突起を設けてねじで締め付けているものが開示されている(例えば、特許文献2参照)。
更には、高周波用の半導体素子を収納するための半導体素子収納用パッケージには、ヒートシンク板に絶縁枠体と外部接続端子を接合した後のヒートシンク板の下面を曲面凸形状とし、その製造方法に研削や、押圧で形成するのが開示されている(例えば、特許文献3参照)。
A conventional package for storing semiconductor elements for storing high-frequency semiconductor elements is provided between the heat sink plate and the base for the purpose of improving heat dissipation characteristics and electrical characteristics between the heat sink plate and the base. In other words, an indium sheet is sandwiched and tightened with a screw (for example, see Patent Document 1).
Further, a semiconductor element housing package for housing a high-frequency semiconductor element is disclosed in which a protrusion is provided at the longitudinal end of a heat sink plate and tightened with a screw (for example, Patent Document 2). reference).
Furthermore, in a package for housing semiconductor elements for housing high-frequency semiconductor elements, the lower surface of the heat sink plate after joining the insulating frame and the external connection terminal to the heat sink plate is formed into a curved convex shape. Forming by grinding or pressing is disclosed (for example, see Patent Document 3).

特許第3619734号公報Japanese Patent No. 3619734 特開平4−233752号公報Japanese Patent Laid-Open No. 4-237552 特開2004−363520号公報JP 2004-363520 A

しかしながら、前述したような従来の半導体素子収納用パッケージ及びその製造方法は、次のような問題がある。
(1)ヒートシンク板や、外部接続端子の熱膨張係数は、絶縁枠体の熱膨張係数に近似させてはいるが、完全に一致させることが難しいので、Ag−Cuろう等の高温ろう材でろう付け接合を行うときに接合部に応力が発生し、接合して形成した接合体に反りが発生するのを防止することができず、決められた許容範囲を超える反りが発生し、作製された半導体素子収納用パッケージの反りの選別検査を行って、許容範囲内のみを検出している。特に、ヒートシンク板の基台との接合面である底面の反りの形態が凹形状となる場合には、基台に取り付けた時に基台との間に空間が発生し、放熱特性や、電気的特性が低下するので、できるだけ平坦、又は若干凸形状のもののみを検出せざるを得ない。従って、選別工程が必要となると同時に歩留まりの低下をきたし、半導体素子収納用パッケージのコスト高となっている。また、ヒートシンク板は、底面が全体的に平坦、又は凸形状であっても、表面の小さなうねりを解消させることができないので、基台との密着性に限界があり、伝熱効率が低下し、放熱特性や、電気的特性の低下をきたすこととなっている。
(2)特許第3619734号公報で開示されるような半導体素子収納用パッケージは、ヒートシンク板と基台の間にインジウムシートを挟み込んでねじ止めするのにインジウムシートが高価であり、半導体素子収納用パッケージのコスト高となっている。また、インジウムシートのような介在物を組み立て段階で使用することは、シートの取り扱いが容易でなく、組み立て工程の時間が長くなり、半導体素子収納用パッケージのコスト高となっている。
(3)特開平4−233752号公報で開示されるような半導体素子収納用パッケージは、ヒートシンク板の長手方向の端部に突起を設け、基台にねじ止めする時にヒートシンク板の長手方向の端部に突起を設ける程のエリアが殆どなく、ヒートシンク板を基台に密接させる効果を引き出すことができない。
(4)特開2004−363520号公報で開示されるような半導体素子収納用パッケージの製造方法でヒートシンク板の下面を下側に凸状態、あるいは平坦状に研削する場合には、バリが端面より飛び出して発生し所定寸法より大きくなり、歩留の低下や、手直し作業の発生によって半導体素子収納用パッケージのコスト高となっている。特に、ヒートシンク板に高放熱特性を持たせるためにヒートシンク板がCuを含有する金属板となっている場合には、金属板の展性が高く研削時の研削方向にバリが発生し易くなっている。
本発明は、かかる事情に鑑みてなされたものであって、放熱特性や、電気的特性に優れた寸法精度のよい安価な半導体素子収納用パッケージ及びその製造方法を提供することを目的とする。
However, the conventional semiconductor element storage package and the manufacturing method thereof as described above have the following problems.
(1) Although the thermal expansion coefficient of the heat sink plate and the external connection terminal is approximated to the thermal expansion coefficient of the insulating frame, it is difficult to completely match it. When brazing and joining, stress is generated in the joint, and it is impossible to prevent warpage from occurring in the joined body formed by joining, and warpage exceeding the specified allowable range occurs and is produced. In addition, the inspection of the warpage of the package for housing the semiconductor element is performed to detect only the allowable range. In particular, when the shape of the warp of the bottom surface, which is the joint surface with the base of the heat sink plate, is a concave shape, a space is generated between the base and the base when it is attached to the base. Since the characteristics deteriorate, it is necessary to detect only a flat or slightly convex shape as much as possible. Therefore, the sorting step is required and at the same time the yield is lowered, and the cost of the package for housing semiconductor elements is increased. In addition, even if the bottom surface of the heat sink plate is generally flat or convex, it is impossible to eliminate small undulations on the surface, so there is a limit to the adhesion with the base, and the heat transfer efficiency is reduced. Heat dissipation characteristics and electrical characteristics will be degraded.
(2) A package for housing a semiconductor element as disclosed in Japanese Patent No. 3619734 is expensive because an indium sheet is expensive to insert and screw an indium sheet between a heat sink plate and a base. The cost of the package is high. Further, using an inclusion such as an indium sheet in the assembly stage makes it difficult to handle the sheet, lengthens the assembly process, and increases the cost of the package for housing a semiconductor element.
(3) A package for housing a semiconductor element as disclosed in Japanese Patent Application Laid-Open No. Hei 4-233752 is provided with a protrusion on the end of the heat sink plate in the longitudinal direction and the end of the heat sink plate in the longitudinal direction when screwed to the base. There is almost no area to the extent that the projection is provided on the part, and the effect of bringing the heat sink plate into close contact with the base cannot be brought out.
(4) When the lower surface of the heat sink plate is protruded downward or flatly ground by the manufacturing method of a package for housing a semiconductor element as disclosed in Japanese Patent Application Laid-Open No. 2004-363520, the burr is formed from the end surface. It is generated by popping out and becomes larger than a predetermined size, and the cost of the semiconductor element storage package is increased due to the decrease in yield and the occurrence of reworking work. In particular, when the heat sink plate is a metal plate containing Cu in order to give the heat sink plate high heat dissipation properties, the malleability of the metal plate is high and burrs are likely to occur in the grinding direction during grinding. Yes.
The present invention has been made in view of such circumstances, and an object of the present invention is to provide an inexpensive package for housing a semiconductor element that is excellent in heat dissipation characteristics and electrical characteristics and has high dimensional accuracy, and a method for manufacturing the same.

前記目的に沿う本発明に係る半導体素子収納用パッケージは、高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、絶縁枠体の上面に金属板からなる外部接続端子が接合される接合体からなる半導体素子収納用パッケージにおいて、接合体のヒートシンク板の他方の主面の全面に研削面を有し、研削面の位置がヒートシンク板の他方の主面の少なくとも短手方向両稜部に予め設けられるC面、又はR面からなる切り欠き面と交叉して有する。   A package for housing a semiconductor element according to the present invention that meets the above-mentioned object is a substantially rectangular heat sink plate made of a metal plate having high heat dissipation characteristics, and a window made of ceramic at the center in the longitudinal direction of one main surface of the heat sink plate. In a semiconductor element storage package comprising a frame-shaped insulating frame and a bonded body in which an external connection terminal made of a metal plate is bonded to the upper surface of the insulating frame, the entire surface of the other main surface of the heat sink plate of the bonded body is ground. And a grinding surface is provided so as to intersect with a notch surface formed of a C surface or an R surface provided in advance on at least both lateral ridges of the other main surface of the heat sink plate.

前記目的に沿う本発明に係る半導体素子収納用パッケージの製造方法は、高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、絶縁枠体の上面に金属板からなる外部接続端子を接合して接合体を形成する半導体素子収納用パッケージの製造方法において、接合体を形成する前に、ヒートシンク板の他方の主面の少なくとも短手方向両稜部にC面、又はR面からなる切り欠き面に面取り加工を施す工程と、接合体を形成した後に、ヒートシンク板の他方の主面を長手方向に沿って往復に研削加工を施し、研削深さをC面、又はR面からなる切り欠き面の大きさより小さくすると共に、ヒートシンク板の他方の主面の全面に研削面を形成する工程を有する。   The method for manufacturing a package for housing a semiconductor device according to the present invention in accordance with the above object includes a substantially rectangular heat sink plate made of a metal plate having high heat dissipation characteristics, and a ceramic at the longitudinal center of one main surface of the heat sink plate. In a manufacturing method of a package for housing a semiconductor element in which a window frame-shaped insulating frame body and an external connection terminal made of a metal plate are bonded to the upper surface of the insulating frame body to form a bonded body, before forming the bonded body A process of chamfering a cut surface formed of a C surface or an R surface on at least both lateral ridges of the other main surface of the heat sink plate, and after forming the joined body, the other main surface of the heat sink plate Is reciprocated along the longitudinal direction to make the grinding depth smaller than the size of the cut-out surface consisting of the C-plane or R-plane, and the ground surface is formed on the entire other main surface of the heat sink plate. Comprising the step of.

請求項1記載の半導体素子収納用パッケージは、高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、絶縁枠体の上面に金属板からなる外部接続端子が接合される接合体のヒートシンク板の他方の主面の全面に研削面を有し、研削面の位置がヒートシンク板の他方の主面の少なくとも短手方向両稜部に予め設けられるC面、又はR面からなる切り欠き面と交叉して有するので、接合体を形成する時の反りやうねりを持ったヒートシンク板の他方の主面に研削面を有し、平坦性が高く、基台との密着性が優れ、放熱特性や、電気的特性に優れた安価なパッケージとして提供できる。また、ヒートシンク板には、少なくとも短手方向両稜部におけるC付け面、又はR付け面による稜部の斜め状態部に研削面があるので、C面、又はR面からなる切り欠き面でのバリ発生を防止する半導体素子収納用パッケージを提供できる。更に、ヒートシンク板は、C面、又はR面からなる切り欠き面によって長手方向の研削面における外形寸法が端面間の外形寸法より小さく、例え、バリの発生があったとしても、C面、又はR面からなる切り欠き面の断面視する斜め状態部内に収まるので、端面間の外形寸法を超えることなく寸法精度に優れる半導体素子収納用パッケージを提供できる。   The semiconductor element storage package according to claim 1 is a substantially rectangular heat sink plate made of a metal plate having a high heat dissipation characteristic, and a window frame shape made of ceramic at the center in the longitudinal direction of one main surface of the heat sink plate. An insulating frame and a grounding surface on the entire surface of the other main surface of the heat sink plate of the joined body in which an external connection terminal made of a metal plate is joined to the upper surface of the insulating frame, and the position of the grinding surface is the other side of the heat sink plate The other side of the heat sink plate having warpage and undulation when forming a joined body because it has a notch surface formed of a C surface or an R surface provided in advance at least on both ridges in the short direction of the main surface. The main surface has a ground surface, has high flatness, excellent adhesion to the base, and can be provided as an inexpensive package excellent in heat dissipation characteristics and electrical characteristics. In addition, since the heat sink plate has a grinding surface at least on the C-attached surface at both ridges in the short-side direction, or on the oblique state portion of the ridge portion by the R-attached surface, the notch surface consisting of the C surface or the R surface It is possible to provide a package for housing a semiconductor element that prevents generation of burrs. Further, the heat sink plate has a cut-out surface made of the C surface or the R surface so that the outer dimension of the grinding surface in the longitudinal direction is smaller than the outer dimension between the end surfaces, for example, even if burrs are generated, Since it fits in the oblique state portion viewed from the cross section of the cut-out surface made of the R surface, a semiconductor element housing package having excellent dimensional accuracy can be provided without exceeding the outer dimension between the end surfaces.

請求項2記載の半導体素子収納用パッケージの製造方法は、高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、絶縁枠体の上面に金属板からなる外部接続端子を接合して接合体を形成する前に、ヒートシンク板の他方の主面の少なくとも短手方向両稜部にC面、又はR面からなる切り欠き面に面取り加工を施す工程と、接合体を形成した後に、ヒートシンク板の他方の主面を長手方向に沿って往復に研削加工を施し、研削深さをC面、又はR面からなる切り欠き面の大きさより小さくすると共に、ヒートシンク板の他方の主面の全面に研削面を形成する工程を有するので、接合体を形成する時のセラミックと金属板の熱膨張係数の差から発生する反りやうねりを接合体形成後の他方の主面に全面研削面を設けることで、ヒートシンク板の他方の主面を平坦性を高くして基台との密着性に優れる面とすることができ、放熱特性や、電気的特性に優れる安価な半導体素子収納用パッケージの製造方法を提供することができる。また、ヒートシンク板には、少なくとも短手方向両稜部におけるC面、又はR面からなる切り欠き面による稜部の断面視して斜め状態部に向かって往復に研削加工を施すことで、バリ発生を防止する半導体素子収納用パッケージの製造方法を提供できる。更に、例え、研削加工を施してバリの発生があったとしても、バリは、C面、又はR面からなる切り欠き面によって長手方向の研削面における外形寸法が端面間の外形寸法より小さく、C面、又はR面からなる切り欠き面の断面視して斜め状態部内に収まり、端面間の外形寸法を超えることなく寸法精度に優れ、高歩留で安価な放熱特性や、電気的特性のよい半導体素子収納用パッケージの製造方法を提供することができる。   A manufacturing method of a package for housing a semiconductor element according to claim 2, wherein a heat sink plate having a substantially rectangular shape made of a metal plate having a high heat dissipation characteristic, and a window made of ceramic at a central portion in the longitudinal direction of one main surface of the heat sink plate. Before forming a joined body by joining a frame-shaped insulating frame and an external connection terminal made of a metal plate to the upper surface of the insulating frame, C is formed at both ridges on the other main surface of the heat sink plate. A chamfering process is performed on the cut surface of the surface or the R surface, and after forming the joined body, the other main surface of the heat sink plate is reciprocally ground along the longitudinal direction to obtain a grinding depth of C And a step of forming a ground surface on the entire surface of the other main surface of the heat sink plate, so that the heat of the ceramic and the metal plate when forming the joined body is included. Expansion coefficient By providing a fully ground surface on the other main surface after forming the joined body, the surface of the heat sink plate having higher flatness and excellent adhesion to the base due to warpage and undulation generated from the difference Therefore, it is possible to provide an inexpensive method for manufacturing a package for housing a semiconductor element, which has excellent heat dissipation characteristics and electrical characteristics. In addition, the heat sink plate is subjected to grinding by reciprocally grinding toward the oblique state portion in a cross-sectional view of the ridge portion by the cut surface formed by the C surface or the R surface at both ridge portions in the short direction. It is possible to provide a method for manufacturing a package for housing a semiconductor element that prevents generation. Furthermore, even if burrs are generated by performing grinding, for example, the external dimensions of the grinding surface in the longitudinal direction are smaller than the external dimensions between the end faces due to the cut surface formed by the C surface or the R surface. The cross-sectional view of the cut-out surface consisting of the C-plane or R-plane fits in the oblique state part, has excellent dimensional accuracy without exceeding the outer dimension between the end faces, has high yield and low cost heat dissipation characteristics, and electrical characteristics A method for manufacturing a good package for housing semiconductor elements can be provided.

続いて、添付した図面を参照しつつ、本発明を具体化した実施の形態について説明し、本発明の理解に供する。
ここに、図1(A)、(B)はそれぞれ本発明の一実施の形態に係る半導体素子収納用パッケージの平面図、A−A’線縦断面図、図2(A)、(B)はそれぞれ同半導体素子収納用パッケージのヒートシンク板の短手方向両稜部の説明図、図3(A)、(B)はそれぞれ同半導体素子収納用パッケージに半導体素子が実装されて基台に取り付けられる説明図、図4(A)〜(D)はそれぞれ同半導体素子収納用パッケージの製造方法の説明図である。
Next, embodiments of the present invention will be described with reference to the accompanying drawings to provide an understanding of the present invention.
1A and 1B are a plan view, a longitudinal sectional view taken along line AA ′, and FIGS. 2A and 2B, respectively, of a package for housing a semiconductor element according to an embodiment of the present invention. Is an explanatory view of both ridges in the short direction of the heat sink plate of the semiconductor element storage package, and FIGS. 3A and 3B are mounted on the base with the semiconductor element mounted on the semiconductor element storage package, respectively. FIGS. 4A to 4D are explanatory views of the method for manufacturing the semiconductor element storage package.

図1(A)、(B)に示すように、本発明の一実施の形態に係る半導体素子収納用パッケージ10は、実装されるシリコンや、ガリウム砒素電界効果トランジスタ等の高周波、高出力の半導体素子から発生する高温、且つ大量の熱を放熱するための高放熱特性を有し、セラミックと熱膨張係数をできるだけ近似させた略長方形状の金属板からなるヒートシンク板11を有している。また、半導体素子収納用パッケージ10は、ヒートシンク板11の一方の主面に、セラミック製の窓枠形状からなる絶縁枠体12の裏面側を、高温ろう材13でろう付け接合して有している。更に、半導体素子収納用パッケージ10は、絶縁枠体12の表面側に、外部と電気的に導通状態とするための金属板からなるリードフレーム形状の外部接続端子14を高温ろう材13でろう付け接合して有している。そして、半導体素子収納用パッケージ10は、ヒートシンク板11と、絶縁枠体12、及び外部接続端子14との接合体15として形成されている。この接合体15からなる半導体素子収納用パッケージ10には、ヒートシンク板11の一方の主面を半導体素子20(図3(A)参照)の搭載面とし、絶縁枠体12の内周側壁面を半導体素子20の囲繞面とする半導体素子20を収納するためのキャビティ部16が形成されている。また、この半導体素子収納用パッケージ10には、ヒートシンク板11の長手方向の両端部に基台25(図3(B)参照)にねじ26(図3(A)、(B)参照)でねじ止めして取り付けるためのねじ取付部17を有している。   As shown in FIGS. 1A and 1B, a semiconductor element housing package 10 according to an embodiment of the present invention is a high-frequency, high-power semiconductor such as silicon or gallium arsenide field-effect transistor to be mounted. The heat sink plate 11 has a high heat dissipation characteristic for dissipating a high temperature and a large amount of heat generated from the element, and is made of a substantially rectangular metal plate whose thermal expansion coefficient is approximated as much as possible. The semiconductor element storage package 10 has a heat sink plate 11 on one main surface with the back side of an insulating frame 12 made of a ceramic window frame shape brazed with a high temperature brazing material 13. Yes. Further, the semiconductor element storage package 10 is brazed with a high-temperature brazing material 13 on the surface side of the insulating frame 12 with a lead frame-shaped external connection terminal 14 made of a metal plate for electrical connection with the outside. It has joined. The semiconductor element storage package 10 is formed as a joined body 15 of the heat sink plate 11, the insulating frame body 12, and the external connection terminal 14. In the semiconductor element storage package 10 formed of the joined body 15, one main surface of the heat sink plate 11 is used as a mounting surface of the semiconductor element 20 (see FIG. 3A), and the inner peripheral side wall surface of the insulating frame 12 is used. A cavity portion 16 for accommodating the semiconductor element 20 serving as the surrounding surface of the semiconductor element 20 is formed. Further, in the semiconductor element storage package 10, screws 26 (see FIGS. 3A and 3B) are screwed onto the base 25 (see FIG. 3B) at both ends of the heat sink plate 11 in the longitudinal direction. It has a screw mounting portion 17 for stopping and mounting.

上記の半導体素子収納用パッケージ10は、接合体15のヒートシンク板11の底面側である他方の主面の全面にわたって研削され、全面が平坦からなる研削面18を有している。ここで、図2(A)に示すように、ヒートシンク板11には、この研削面18を形成する前に予め、底面側である他方の主面の少なくとも略長方形状の長手方向の両端部である短手方向の両稜部に設けられるC面からなる切り欠き面19を有している。そして、半導体素子収納用パッケージ10は、上記の研削面18の位置がC面の寸法aと研削深さbとの関係をa>b>0となるようにして研削されて切り欠き面19と交叉するように有している。あるいは、図2(B)に示すように、ヒートシンク板11には、この研削面18を形成する前に予め、底面側である他方の主面の少なくとも略長方形状の長手方向の両端部である短手方向の両稜部に設けられるR面からなる切り欠き面19aを有している。そして、半導体素子収納用パッケージ10は、上記の研削面18の位置がR面の寸法aと研削深さbとの関係をa>b>0となるようにして研削されて切り欠き面19aと交叉するように有している。   The package 10 for housing a semiconductor element has a ground surface 18 that is ground over the entire surface of the other main surface on the bottom surface side of the heat sink plate 11 of the joined body 15 and the entire surface is flat. Here, as shown in FIG. 2 (A), the heat sink plate 11 has at least both ends of the other major surface on the bottom surface side in the longitudinal direction in advance before the grinding surface 18 is formed. It has the notch surface 19 which consists of C surface provided in the both ridges of a short direction. The package 10 for housing a semiconductor element is ground so that the relationship between the grinding surface 18 and the dimension a of the C surface and the grinding depth b satisfies a> b> 0. Have to cross. Alternatively, as shown in FIG. 2 (B), the heat sink plate 11 has at least substantially rectangular longitudinal ends of the other main surface on the bottom surface side in advance before the grinding surface 18 is formed. It has a notch surface 19a made of an R surface provided at both ridges in the short direction. The package 10 for housing a semiconductor element is ground so that the relationship between the dimension a of the R surface and the grinding depth b is a> b> 0, and the cut surface 19a Have to cross.

図3(A)、(B)に示すように、上記の半導体素子収納用パッケージ10は、キャビティ部16に半導体素子20がダイボンドされ、半導体素子20と外部接続端子14とをボンディングワイヤ21で接続された後、樹脂や、セラミックや、金属等からなる蓋体22を樹脂や、ガラス等の接着材23で接着してキャビティ部16内が気密に封止されて、高周波用モジュール基板24を形成している。この高周波用モジュール基板24は、半導体素子20からの発熱をヒートシンク板11に放熱し、更に、外部に放熱させるための基台25に、ヒートシンク板11に設けられているねじ取付部17にねじ26を挿通させてねじ止めして固定される。   As shown in FIGS. 3A and 3B, in the semiconductor element housing package 10, the semiconductor element 20 is die-bonded to the cavity portion 16, and the semiconductor element 20 and the external connection terminal 14 are connected by the bonding wire 21. After that, the lid body 22 made of resin, ceramic, metal or the like is bonded with an adhesive 23 such as resin or glass, and the cavity portion 16 is hermetically sealed to form the high-frequency module substrate 24. is doing. The high-frequency module substrate 24 radiates heat generated from the semiconductor element 20 to the heat sink plate 11, and further to the base 25 for radiating the heat to the outside, and screws 26 to screw mounting portions 17 provided on the heat sink plate 11. Is fixed by screwing.

次いで、図4(A)〜(D)を参照しながら、本発明の一実施の形態に係る半導体素子収納用パッケージ10の製造方法を説明する。なお、図4(A)〜(D)では切り欠き面19、19aの内、代表してC面の切り欠き面19で形成される形態の図で示し、R面の切り欠き面19aで形成される形態については省略している。
図4(A)に示すように、半導体素子収納用パッケージ10を形成するためのヒートシンク板11は、高放熱特性、即ち、できるだけ熱伝導率が優れ、熱膨張係数をできるだけセラミックの熱膨張係数と近似させる必要がある。そこで、このヒートシンク板11には、例えば、粉末状のタングステン(W)をプレス成形し、焼成して形成した略長方形状のポーラス状のWに銅(Cu)を含浸させたりして作製される複合金属板からなるCu−W金属板が用いられている。この他に、ヒートシンク板11には、例えば、Cu−Moの圧延や、プレス加工した金属板の両面にCu板を貼り合わせた接合板を打ち抜きプレス成形して略長方形状に作製される接合金属板からなるCu/Cu−Mo/Cu金属板等が用いられている。また、上記のヒートシンク板11には、後述する絶縁枠体12(図4(B)参照)が接合される側の一方の主面と反対の面である他方の主面の少なくとも略長方形状の長手方向の両端部である短手方向の両稜部にC面からなる面取り加工で切り欠き面19を形成している。更に、ヒートシンク板11には、長手方向の両端部に、ねじ止め固定するためのねじ取付部17(図3(A)参照)を形成している。これらの切り欠き面19や、ねじ取付部17は、上述のプレス成形時や、打ち抜きプレス成形時に同時に形成することができるが、後から切削加工等で形成することもできる。
Next, a method for manufacturing the semiconductor element housing package 10 according to the embodiment of the present invention will be described with reference to FIGS. 4 (A) to 4 (D), the cut-out surfaces 19 and 19a are typically represented by a C-plane cut-out surface 19 and formed by an R-plane cut-out surface 19a. The form to be performed is omitted.
As shown in FIG. 4A, the heat sink plate 11 for forming the semiconductor element housing package 10 has high heat dissipation characteristics, that is, excellent thermal conductivity as much as possible, and the thermal expansion coefficient as high as that of ceramic. It needs to be approximated. Therefore, the heat sink plate 11 is produced by, for example, impregnating copper (Cu) into a substantially rectangular porous W formed by press-molding powdery tungsten (W) and firing. A Cu-W metal plate made of a composite metal plate is used. In addition, for the heat sink plate 11, for example, a bonding metal produced in a substantially rectangular shape by rolling a Cu-Mo or punching and pressing a bonding plate in which a Cu plate is bonded to both sides of a pressed metal plate. A Cu / Cu—Mo / Cu metal plate made of a plate is used. Further, the heat sink plate 11 has at least a substantially rectangular shape on the other main surface, which is the surface opposite to the one main surface on the side to which an insulating frame 12 (see FIG. 4B) to be described later is joined. A notch surface 19 is formed by chamfering processing consisting of a C surface at both ridges in the short direction, which are both ends in the longitudinal direction. Further, the heat sink plate 11 is formed with screw mounting portions 17 (see FIG. 3A) for fixing with screws at both ends in the longitudinal direction. The notch surface 19 and the screw mounting portion 17 can be formed at the same time as the above-described press molding or punching press molding, but can also be formed later by cutting or the like.

図4(B)に示すように、ヒートシンク板11の一方の主面の長手方向の中央部には、例えば、アルミナ(Al)や、窒化アルミニウム(AlN)等のセラミックからなる窓枠形状の絶縁枠体12を接合している。更に、絶縁枠体12の上面には、絶縁枠体12を形成するセラミックと熱膨張係数が近似する、例えば、KV(Fe−Ni−Co系合金、商品名「Kovar(コバール)」)、42アロイ(Fe−Ni系合金)等の金属部材からなる外部接続端子14を接合して接合体15を形成している。上記の外部接続端子14は、金属部材を切削加工や、エッチング加工や、打ち抜き加工等で所定の形状に形成することで作製している。なお、因みに、絶縁枠体12がAlからなる場合のAlの熱膨張係数は、6.7×10−6/k程度であり、ヒートシンク板11がCu−Wからなる場合のCu−Wの熱膨張係数が、6.5×10−6/k程度であって、近似はしているが一致させることは難しい。また、因みに、外部接続端子14がKVからなる場合のKVの熱膨張係数は、5.3×10−6/k程度であり、Alからなる場合の絶縁枠体12の熱膨張係数である、6.7×10−6/k程度とは、互いに近似はしているが一致させることは難しい。従って、接合体15には、それぞれの熱膨張係数の差によって、反りや、うねりが発生することとなる。 As shown in FIG. 4B, a window frame made of ceramic such as alumina (Al 2 O 3 ) or aluminum nitride (AlN) is provided in the central portion in the longitudinal direction of one main surface of the heat sink plate 11. The insulating frame 12 having a shape is joined. Further, the upper surface of the insulating frame 12 has a thermal expansion coefficient similar to that of the ceramic forming the insulating frame 12, for example, KV (Fe—Ni—Co alloy, trade name “Kovar”), 42 An external connection terminal 14 made of a metal member such as alloy (Fe—Ni alloy) is joined to form a joined body 15. The external connection terminal 14 is manufactured by forming a metal member into a predetermined shape by cutting, etching, punching, or the like. Incidentally, the thermal expansion coefficient of Al 2 O 3 when the insulating frame 12 is made of Al 2 O 3 is about 6.7 × 10 −6 / k, and the heat sink plate 11 is made of Cu—W. The thermal expansion coefficient of Cu-W is about 6.5 × 10 −6 / k, and although it is approximated, it is difficult to match. In addition, the thermal expansion coefficient of KV when the external connection terminal 14 is made of KV is about 5.3 × 10 −6 / k, and the thermal expansion coefficient of the insulating frame 12 when made of Al 2 O 3. Is approximately 6.7 × 10 −6 / k, but they are close to each other but difficult to match. Therefore, warpage and undulation occur in the bonded body 15 due to the difference in thermal expansion coefficient between them.

ここで、絶縁枠体12が、例えば、Alからなるセラミックで形成される場合について簡単に説明する。Alからなる絶縁枠体12を形成するためには、先ず、Al粉末にマグネシア、シリカ、カルシア等の焼結助剤を適当量加えた粉末に、ジオクチルフタレート等の可塑剤と、アクリル樹脂等のバインダー、及びトルエン、キシレン、アルコール類等の溶剤を加え、十分に混練し、脱泡して粘度2000〜40000cpsのスラリーを作製している。次いで、スラリーからは、ドクターブレード法等によって、例えば、厚み0.25mmのロール状のシートを形成し、適当なサイズの矩形状に切断したセラミックグリーンシートを作製している。次に、このセラミックグリーンシートの1又は複数枚には、窓枠形状のリング状になるように中空部を打ち抜き加工すると共に、タングステンや、モリブデン等の高融点金属からなる金属導体ペーストを用いて下面側、及び上面側にスクリーン印刷して金属導体印刷パターンを形成する。また、セラミックグリーンシートが複数枚の場合には、積層して積層体の上面側、及び下面側に金属導体印刷パターンを形成する。そして、高融点金属とセラミックグリーンシートを還元雰囲気中で同時焼成して両表面に金属導体パターンを有する絶縁枠体12を作製する。なお、下面側の金属導体パターンは、ヒートシンク板11と窓枠形状の全周にわたってろう付け接合するために全周面に形成している。 Here, a brief description will be given of a case where the insulating frame 12 is formed of ceramic made of, for example, Al 2 O 3 . Al in order to form the 2 O 3 insulating frame 12 made of, first, magnesia Al 2 O 3 powder, silica, an appropriate amount was added powder a sintering aid such as calcia, dioctyl phthalate plasticizer Then, a binder such as an acrylic resin and a solvent such as toluene, xylene, and alcohols are added, kneaded sufficiently, and defoamed to prepare a slurry having a viscosity of 2000 to 40000 cps. Next, from the slurry, for example, a roll-like sheet having a thickness of 0.25 mm is formed by a doctor blade method or the like, and a ceramic green sheet cut into a rectangular shape of an appropriate size is produced. Next, one or more of the ceramic green sheets are punched into a hollow shape so as to form a window frame-shaped ring, and a metal conductor paste made of a refractory metal such as tungsten or molybdenum is used. A metal conductor printing pattern is formed by screen printing on the lower surface side and the upper surface side. Further, when there are a plurality of ceramic green sheets, they are laminated to form a metal conductor print pattern on the upper surface side and lower surface side of the multilayer body. Then, the refractory metal and the ceramic green sheet are simultaneously fired in a reducing atmosphere to produce an insulating frame 12 having metal conductor patterns on both surfaces. Note that the metal conductor pattern on the lower surface side is formed on the entire peripheral surface in order to braze and bond to the heat sink plate 11 over the entire periphery of the window frame shape.

次に、ヒートシンク板11と、絶縁枠体12、及び外部接続端子14を接合して形成する接合体15の作製方法を簡単に説明する。先ず、ヒートシンク板11の全表面、絶縁枠体12の両面の金属導体パターンの表面、及び外部接続端子14の全表面には、それぞれNiや、Ni合金等からなるNiめっきを施し、Niめっき被膜を形成する。そして、ヒートシンク板11の一方の主面の中央部に、例えば、BAg−8(Agが72%と、残部がCuからなる共晶合金)等のAg−Cuろうからなる高温ろう材13を介して絶縁枠体12の下面側を当接させて載置し、約780〜900℃で加熱してろう付け接合している。更に、絶縁枠体12の上面側に、例えば、BAg−8等のAg−Cuろうからなる高温ろう材13を介して外部接続端子14の先端部の下面側を当接させて載置し、約780〜900℃で加熱してろう付け接合している。このヒートシンク板11と、絶縁枠体12の接合、及び絶縁枠体12と外部接続端子14の接合によって、接合体15を形成している。なお、接合体15は、ヒートシンク板11と、絶縁枠体12の接合、及び絶縁枠体12と外部接続端子14の接合を同時に行って形成することもできる。   Next, a method for manufacturing the joined body 15 formed by joining the heat sink plate 11, the insulating frame body 12, and the external connection terminal 14 will be briefly described. First, the entire surface of the heat sink plate 11, the surfaces of the metal conductor patterns on both sides of the insulating frame 12, and the entire surface of the external connection terminal 14 are each subjected to Ni plating made of Ni, Ni alloy, etc. Form. Then, a high-temperature brazing material 13 made of Ag—Cu brazing material such as BAg-8 (Agutectic alloy consisting of 72% Ag and the balance Cu) is interposed in the central portion of one main surface of the heat sink plate 11. Then, the lower surface side of the insulating frame 12 is placed in contact with each other and heated at about 780 to 900 ° C. for brazing and joining. Furthermore, on the upper surface side of the insulating frame 12, for example, the lower surface side of the distal end portion of the external connection terminal 14 is brought into contact with and placed through a high-temperature brazing material 13 made of Ag—Cu brazing such as BAg-8, It is heated and brazed at about 780 to 900 ° C. A joined body 15 is formed by joining the heat sink plate 11 and the insulating frame body 12 and joining the insulating frame body 12 and the external connection terminal 14. Note that the joined body 15 can also be formed by simultaneously joining the heat sink plate 11 and the insulating frame body 12 and joining the insulating frame body 12 and the external connection terminal 14 together.

図4(C)に示すように、接合体15には、ヒートシンク板11の下面側である他方の主面を略長方形状の長手方向に沿って、ダイヤモンド砥粒付きのグラインダー27を高速で回転させながら往復に移動させる等で研削加工を行っている。そして、研削深さbは、C面からなる切り欠き面19の大きさであるC面の寸法aより小さく、即ち、b<aとすると共に、ヒートシンク板11の他方の主面のあらゆる部分で0<bとなるように研削して全面に研削面18を形成している。そして、接合体15には、外表面に露出する全金属表面上には、Niめっき、更に、Niめっき上にAuめっきが施されることで、半導体素子収納用パッケージ10を作製している。従って、図4(D)に示すように、この半導体素子収納用パッケージ10は、接合体15のヒートシンク板11の他方の主面の研削面18が切り欠き面19と交叉した状態となっている。上記の製造方法で作製される研磨面18には、C面からなる切り欠き面19によってバリ、即ち研磨による出っ張りの発生を防止することができので、ヒートシンク板11の長手方向の寸法を所定の寸法に維持することができる。また、ヒートシンク板11の長手方向の寸法は、例え、研磨面18にバリの発生があったとしても、バリがC面からなる切り欠き面19内に収まる程度の小さい物であるので、長手方向の寸法を所定の寸法に維持することができる。   As shown in FIG. 4C, the grinder 27 with diamond abrasive grains is rotated at high speed along the longitudinal direction of the other main surface, which is the lower surface side of the heat sink plate 11, in the joined body 15. Grinding is performed by moving it back and forth. The grinding depth b is smaller than the dimension a of the C surface, which is the size of the notch surface 19 made of the C surface, that is, b <a, and at any part of the other main surface of the heat sink plate 11. The ground surface 18 is formed on the entire surface by grinding so that 0 <b. The bonded body 15 is plated with Ni on all metal surfaces exposed on the outer surface, and further with Au plating on the Ni plating, thereby producing the semiconductor element housing package 10. Therefore, as shown in FIG. 4D, in this semiconductor element housing package 10, the ground surface 18 of the other main surface of the heat sink plate 11 of the joined body 15 is in a state of intersecting with the notch surface 19. . The polishing surface 18 produced by the above-described manufacturing method can prevent the occurrence of burrs, that is, protrusions due to polishing, by the cut-out surface 19 formed of the C surface. The dimensions can be maintained. Further, the dimension of the heat sink plate 11 in the longitudinal direction is such that even if burrs are generated on the polished surface 18, the burrs are small enough to fit within the cut-out surface 19 formed of the C surface. Can be maintained at a predetermined size.

本発明の半導体素子収納用パッケージは、シリコンや、ガリウム砒素電界効果トランジスタ等の高周波、高出力の半導体素子を実装し、例えば、RF(Radio Frequency)基地局用等のために用いることができる。また、上記のような半導体素子を実装して高性能な高周波モジュール基板として使用するための半導体素子収納用パッケージの製造方法として用いることができる。   The package for housing a semiconductor element of the present invention mounts a high-frequency, high-power semiconductor element such as silicon or a gallium arsenide field effect transistor, and can be used, for example, for an RF (Radio Frequency) base station. Further, it can be used as a method for manufacturing a package for housing a semiconductor element for mounting the semiconductor element as described above and using it as a high-performance high-frequency module substrate.

(A)、(B)はそれぞれ本発明の一実施の形態に係る半導体素子収納用パッケージの平面図、A−A’線縦断面図である。FIGS. 4A and 4B are a plan view and a longitudinal sectional view taken along line A-A ′ of a package for housing a semiconductor element according to an embodiment of the present invention, respectively. FIGS. (A)、(B)はそれぞれ同半導体素子収納用パッケージのヒートシンク板の短手方向両稜部の説明図である。(A), (B) is explanatory drawing of the ridge part of the transversal direction of the heat sink board of the package for semiconductor element accommodation, respectively. (A)、(B)はそれぞれ同半導体素子収納用パッケージに半導体素子が実装されて基台に取り付けられる説明図である。(A), (B) is explanatory drawing by which a semiconductor element is mounted in the same semiconductor element storage package, respectively, and is attached to a base. (A)〜(D)はそれぞれ同半導体素子収納用パッケージの製造方法の説明図である。(A)-(D) is explanatory drawing of the manufacturing method of the package for the said semiconductor element accommodation, respectively. (A)、(B)はそれぞれ従来の半導体素子収納用パッケージの説明図である。(A), (B) is explanatory drawing of the package for the conventional semiconductor element accommodation, respectively.

符号の説明Explanation of symbols

10:半導体素子収納用パッケージ、11:ヒートシンク板、12:絶縁枠体、13:高温ろう材、14:外部接続端子、15:接合体、16:キャビティ部、17:ねじ取付部、18:研削面、19、19a:切り欠き面、20:半導体素子、21:ボンディングワイヤ、22:蓋体、23:接着材、24:高周波モジュール基板、25:基台、26:ねじ、27:グラインダー   10: package for housing semiconductor elements, 11: heat sink plate, 12: insulating frame, 13: high-temperature brazing material, 14: external connection terminal, 15: joined body, 16: cavity portion, 17: screw mounting portion, 18: grinding Surface, 19, 19a: Notched surface, 20: Semiconductor element, 21: Bonding wire, 22: Lid, 23: Adhesive, 24: High-frequency module substrate, 25: Base, 26: Screw, 27: Grinder

Claims (2)

高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、該ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、該絶縁枠体の上面に金属板からなる外部接続端子が接合される接合体からなる半導体素子収納用パッケージにおいて、
前記接合体の前記ヒートシンク板の他方の主面の全面に研削面を有し、該研削面の位置が前記ヒートシンク板の他方の主面の少なくとも短手方向両稜部に予め設けられるC面、又はR面からなる切り欠き面と交叉して有することを特徴とする半導体素子収納用パッケージ。
A substantially rectangular heat sink plate made of a metal plate having high heat dissipation characteristics, a window frame-shaped insulating frame made of ceramic at the center in the longitudinal direction of one main surface of the heat sink plate, and an upper surface of the insulating frame In a package for housing a semiconductor element composed of a joined body to which an external connection terminal made of a metal plate is joined,
A C surface that has a ground surface on the entire surface of the other main surface of the heat sink plate of the joined body, and the position of the ground surface is provided in advance on at least both lateral ridges of the other main surface of the heat sink plate; Or a package for housing a semiconductor element, wherein the package is crossed with a cut-out surface formed of an R surface.
高放熱特性を有する金属板からなる略長方形状のヒートシンク板と、該ヒートシンク板の一方の主面の長手方向の中央部にセラミックからなる窓枠形状の絶縁枠体と、該絶縁枠体の上面に金属板からなる外部接続端子を接合して接合体を形成する半導体素子収納用パッケージの製造方法において、
前記接合体を形成する前に、前記ヒートシンク板の他方の主面の少なくとも短手方向両稜部にC面、又はR面からなる切り欠き面に面取り加工を施す工程と、
前記接合体を形成した後に、前記ヒートシンク板の他方の主面を長手方向に沿って往復に研削加工を施し、研削深さを前記C面、又はR面からなる切り欠き面の大きさより小さくすると共に、前記ヒートシンク板の他方の主面の全面に研削面を形成する工程を有することを特徴とする半導体素子収納用パッケージの製造方法。
A substantially rectangular heat sink plate made of a metal plate having high heat dissipation characteristics, a window frame-shaped insulating frame made of ceramic at the center in the longitudinal direction of one main surface of the heat sink plate, and an upper surface of the insulating frame In a manufacturing method of a package for housing a semiconductor element, in which an external connection terminal made of a metal plate is joined to form a joined body,
Before forming the joined body, a step of chamfering a cut surface formed of a C surface or an R surface on at least both lateral ridges of the other main surface of the heat sink plate; and
After the joined body is formed, the other main surface of the heat sink plate is reciprocally ground along the longitudinal direction so that the grinding depth is smaller than the size of the notch surface formed of the C surface or the R surface. And a method of manufacturing a package for housing a semiconductor element, comprising the step of forming a ground surface on the entire other main surface of the heat sink plate.
JP2006348992A 2006-12-26 2006-12-26 Package for housing semiconductor element, and method of manufacturing the same Pending JP2008159975A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014175369A (en) * 2013-03-06 2014-09-22 Toshiba Corp Package for semiconductor device, manufacturing method therefor, and semiconductor device
JP2016162836A (en) * 2015-02-27 2016-09-05 パナソニックIpマネジメント株式会社 Package for mounting electronic component, electronic device and electronic module

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014175369A (en) * 2013-03-06 2014-09-22 Toshiba Corp Package for semiconductor device, manufacturing method therefor, and semiconductor device
JP2016162836A (en) * 2015-02-27 2016-09-05 パナソニックIpマネジメント株式会社 Package for mounting electronic component, electronic device and electronic module

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