JP2004006815A - 半導体基板材料をコーティングする方法 - Google Patents

半導体基板材料をコーティングする方法 Download PDF

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Publication number
JP2004006815A
JP2004006815A JP2003111311A JP2003111311A JP2004006815A JP 2004006815 A JP2004006815 A JP 2004006815A JP 2003111311 A JP2003111311 A JP 2003111311A JP 2003111311 A JP2003111311 A JP 2003111311A JP 2004006815 A JP2004006815 A JP 2004006815A
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JP
Japan
Prior art keywords
coating
semiconductor substrate
mixture
adhesion promoter
coating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003111311A
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English (en)
Japanese (ja)
Other versions
JP2004006815A5 (https=
Inventor
Albert Hua Jeans
アルバート・フア・ジーンズ
Ping Mei
ピン・メイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of JP2004006815A publication Critical patent/JP2004006815A/ja
Publication of JP2004006815A5 publication Critical patent/JP2004006815A5/ja
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003111311A 2002-04-26 2003-04-16 半導体基板材料をコーティングする方法 Withdrawn JP2004006815A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/133,724 US6762113B2 (en) 2002-04-26 2002-04-26 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter

Publications (2)

Publication Number Publication Date
JP2004006815A true JP2004006815A (ja) 2004-01-08
JP2004006815A5 JP2004006815A5 (https=) 2006-04-20

Family

ID=28791024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003111311A Withdrawn JP2004006815A (ja) 2002-04-26 2003-04-16 半導体基板材料をコーティングする方法

Country Status (6)

Country Link
US (2) US6762113B2 (https=)
EP (1) EP1357585A3 (https=)
JP (1) JP2004006815A (https=)
KR (1) KR20030084743A (https=)
CN (1) CN1453822A (https=)
TW (1) TW200305621A (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6762113B2 (en) * 2002-04-26 2004-07-13 Hewlett-Packard Development Company, L.P. Method for coating a semiconductor substrate with a mixture containing an adhesion promoter
WO2005036645A1 (ja) * 2003-10-14 2005-04-21 Matsushita Electric Industrial Co., Ltd. トランジスタ集積回路装置及びその製造方法
US7635919B1 (en) 2005-05-26 2009-12-22 Rockwell Collins, Inc. Low modulus stress buffer coating in microelectronic devices
US20070298268A1 (en) * 2006-06-27 2007-12-27 Gelcore Llc Encapsulated optoelectronic device
JP4297943B2 (ja) * 2007-01-26 2009-07-15 中外炉工業株式会社 板状材の塗工方法
CN102906596B (zh) 2010-05-24 2015-09-16 皇家飞利浦电子股份有限公司 包括多层荧光带闪烁体并具有能切换的光谱灵敏度的ct探测器
US8753460B2 (en) 2011-01-28 2014-06-17 International Business Machines Corporation Reduction of edge chipping during wafer handling
DE102011114865B4 (de) 2011-07-29 2023-03-02 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements
US9746361B2 (en) * 2012-04-11 2017-08-29 University Of Virginia Patent Foundation Gaseous flow sensor and related method thereof
DE102016113162A1 (de) * 2015-07-28 2017-02-02 Schott Ag Bedienblende für ein Haushaltsgerät mit zumindest einer Benutzerschnittstelle, Haushaltsgerät und Verfahren zur Herstellung der Bedienblende mit Benutzerschnittstelle
CN108649192B (zh) * 2018-04-08 2019-08-16 河南大学 一种基于接触角测试制备电极材料表面均匀修饰层的方法
EP4350759A1 (en) 2022-10-06 2024-04-10 Nexperia B.V. A semiconductor device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4183839A (en) 1976-04-08 1980-01-15 John V. Long Polyimide resin-forming composition
DE3107633A1 (de) 1981-02-27 1982-09-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung duenner polyimidschichten"
US4604644A (en) * 1985-01-28 1986-08-05 International Business Machines Corporation Solder interconnection structure for joining semiconductor devices to substrates that have improved fatigue life, and process for making
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
US5024922A (en) * 1988-11-07 1991-06-18 Moss Mary G Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake
US5133840A (en) 1990-05-15 1992-07-28 International Business Machines Corporation Surface midification of a polyimide
DE4119444A1 (de) * 1991-06-13 1992-12-17 Wolff Walsrode Ag Beschichtungssystem fuer wasserquellbare materialien
US5742075A (en) * 1994-10-07 1998-04-21 Iowa State University Research Foundation, Inc. Amorphous silicon on insulator VLSI circuit structures
US5635240A (en) * 1995-06-19 1997-06-03 Dow Corning Corporation Electronic coating materials using mixed polymers
US5965679A (en) 1996-09-10 1999-10-12 The Dow Chemical Company Polyphenylene oligomers and polymers
US6300162B1 (en) 2000-05-08 2001-10-09 Rockwell Collins Method of applying a protective layer to a microelectronic component
US6762113B2 (en) * 2002-04-26 2004-07-13 Hewlett-Packard Development Company, L.P. Method for coating a semiconductor substrate with a mixture containing an adhesion promoter

Also Published As

Publication number Publication date
US7071548B2 (en) 2006-07-04
TW200305621A (en) 2003-11-01
US6762113B2 (en) 2004-07-13
EP1357585A2 (en) 2003-10-29
CN1453822A (zh) 2003-11-05
KR20030084743A (ko) 2003-11-01
US20040097097A1 (en) 2004-05-20
EP1357585A3 (en) 2005-04-20
US20030203621A1 (en) 2003-10-30

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