JP2003508935A5 - - Google Patents

Download PDF

Info

Publication number
JP2003508935A5
JP2003508935A5 JP2001522153A JP2001522153A JP2003508935A5 JP 2003508935 A5 JP2003508935 A5 JP 2003508935A5 JP 2001522153 A JP2001522153 A JP 2001522153A JP 2001522153 A JP2001522153 A JP 2001522153A JP 2003508935 A5 JP2003508935 A5 JP 2003508935A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001522153A
Other languages
Japanese (ja)
Other versions
JP4768942B2 (ja
JP2003508935A (ja
Filing date
Publication date
Priority claimed from US09/393,176 external-priority patent/US6556881B1/en
Application filed filed Critical
Publication of JP2003508935A publication Critical patent/JP2003508935A/ja
Publication of JP2003508935A5 publication Critical patent/JP2003508935A5/ja
Application granted granted Critical
Publication of JP4768942B2 publication Critical patent/JP4768942B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001522153A 1999-09-09 2000-05-19 ほぼリアルタイムの欠陥検出をapcフレームワークに統合するための方法および装置 Expired - Fee Related JP4768942B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/393,176 1999-09-09
US09/393,176 US6556881B1 (en) 1999-09-09 1999-09-09 Method and apparatus for integrating near real-time fault detection in an APC framework
PCT/US2000/013724 WO2001018623A1 (en) 1999-09-09 2000-05-19 Real-time fault detection

Publications (3)

Publication Number Publication Date
JP2003508935A JP2003508935A (ja) 2003-03-04
JP2003508935A5 true JP2003508935A5 (enExample) 2007-06-07
JP4768942B2 JP4768942B2 (ja) 2011-09-07

Family

ID=23553601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001522153A Expired - Fee Related JP4768942B2 (ja) 1999-09-09 2000-05-19 ほぼリアルタイムの欠陥検出をapcフレームワークに統合するための方法および装置

Country Status (6)

Country Link
US (1) US6556881B1 (enExample)
EP (1) EP1218807B1 (enExample)
JP (1) JP4768942B2 (enExample)
KR (1) KR100626859B1 (enExample)
DE (1) DE60009324T2 (enExample)
WO (1) WO2001018623A1 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7069101B1 (en) * 1999-07-29 2006-06-27 Applied Materials, Inc. Computer integrated manufacturing techniques
US6697691B1 (en) * 2000-01-03 2004-02-24 Advanced Micro Devices, Inc. Method and apparatus for fault model analysis in manufacturing tools
US6725402B1 (en) * 2000-07-31 2004-04-20 Advanced Micro Devices, Inc. Method and apparatus for fault detection of a processing tool and control thereof using an advanced process control (APC) framework
US7188142B2 (en) 2000-11-30 2007-03-06 Applied Materials, Inc. Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility
US7082345B2 (en) * 2001-06-19 2006-07-25 Applied Materials, Inc. Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities
US7047099B2 (en) * 2001-06-19 2006-05-16 Applied Materials Inc. Integrating tool, module, and fab level control
US7101799B2 (en) 2001-06-19 2006-09-05 Applied Materials, Inc. Feedforward and feedback control for conditioning of chemical mechanical polishing pad
US7201936B2 (en) 2001-06-19 2007-04-10 Applied Materials, Inc. Method of feedback control of sub-atmospheric chemical vapor deposition processes
US7698012B2 (en) * 2001-06-19 2010-04-13 Applied Materials, Inc. Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
US7160739B2 (en) 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
US6913938B2 (en) 2001-06-19 2005-07-05 Applied Materials, Inc. Feedback control of plasma-enhanced chemical vapor deposition processes
US6910947B2 (en) * 2001-06-19 2005-06-28 Applied Materials, Inc. Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life
US20020192966A1 (en) * 2001-06-19 2002-12-19 Shanmugasundram Arulkumar P. In situ sensor based control of semiconductor processing procedure
US7337019B2 (en) * 2001-07-16 2008-02-26 Applied Materials, Inc. Integration of fault detection with run-to-run control
US6950716B2 (en) * 2001-08-13 2005-09-27 Applied Materials, Inc. Dynamic control of wafer processing paths in semiconductor manufacturing processes
US6984198B2 (en) * 2001-08-14 2006-01-10 Applied Materials, Inc. Experiment management system, method and medium
US20030037090A1 (en) * 2001-08-14 2003-02-20 Koh Horne L. Tool services layer for providing tool service functions in conjunction with tool functions
US6732006B2 (en) 2002-02-06 2004-05-04 Asm International Nv Method and system to process semiconductor wafers
US8180587B2 (en) * 2002-03-08 2012-05-15 Globalfoundries Inc. System for brokering fault detection data
US7225047B2 (en) 2002-03-19 2007-05-29 Applied Materials, Inc. Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements
US7668702B2 (en) * 2002-07-19 2010-02-23 Applied Materials, Inc. Method, system and medium for controlling manufacturing process using adaptive models based on empirical data
CN100351725C (zh) * 2002-08-01 2007-11-28 应用材料有限公司 用于在先进工艺控制系统中处理歪曲的度量数据的方法、系统和介质
US20040063224A1 (en) * 2002-09-18 2004-04-01 Applied Materials, Inc. Feedback control of a chemical mechanical polishing process for multi-layered films
WO2004046835A2 (en) 2002-11-15 2004-06-03 Applied Materials, Inc. Method, system and medium for controlling manufacture process having multivariate input parameters
US6912433B1 (en) * 2002-12-18 2005-06-28 Advanced Mirco Devices, Inc. Determining a next tool state based on fault detection information
US8359494B2 (en) 2002-12-18 2013-01-22 Globalfoundries Inc. Parallel fault detection
TWI284846B (en) * 2002-12-24 2007-08-01 Powerchip Semiconductor Corp Semiconductor automation system for a daily check and method thereof
US7333871B2 (en) 2003-01-21 2008-02-19 Applied Materials, Inc. Automated design and execution of experiments with integrated model creation for semiconductor manufacturing tools
US7205228B2 (en) * 2003-06-03 2007-04-17 Applied Materials, Inc. Selective metal encapsulation schemes
US7354332B2 (en) 2003-08-04 2008-04-08 Applied Materials, Inc. Technique for process-qualifying a semiconductor manufacturing tool using metrology data
US7138897B2 (en) * 2003-10-15 2006-11-21 Schlumberger Technology Corporation Induction measurements with reduced borehole effects
US7356377B2 (en) 2004-01-29 2008-04-08 Applied Materials, Inc. System, method, and medium for monitoring performance of an advanced process control system
US6980873B2 (en) 2004-04-23 2005-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for real-time fault detection, classification, and correction in a semiconductor manufacturing environment
US7437404B2 (en) * 2004-05-20 2008-10-14 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving equipment communication in semiconductor manufacturing equipment
US7096085B2 (en) 2004-05-28 2006-08-22 Applied Materials Process control by distinguishing a white noise component of a process variance
US6961626B1 (en) 2004-05-28 2005-11-01 Applied Materials, Inc Dynamic offset and feedback threshold
US7680556B2 (en) * 2004-11-15 2010-03-16 Tech Semiconductor Singapore Pte. Ltd. Method for data collection during manufacturing processes
US7477960B2 (en) * 2005-02-16 2009-01-13 Tokyo Electron Limited Fault detection and classification (FDC) using a run-to-run controller
KR100699856B1 (ko) * 2005-07-29 2007-03-27 삼성전자주식회사 반도체소자를 제조하는 공정의 제어시스템 및 이를 이용한제어방법
US8276159B2 (en) * 2009-09-23 2012-09-25 Microsoft Corporation Message communication of sensor and other data
CN103630852B (zh) * 2013-12-17 2016-05-18 奇瑞汽车股份有限公司 一种智能前照灯系统故障处理方法及装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4849088A (enExample) * 1971-10-22 1973-07-11
DE3043827A1 (de) * 1980-11-20 1982-06-03 Gildemeister Ag, 4800 Bielefeld Verfahren und vorrichtung zum ueberwachen der bearbeitungsbedinungen an einer werkzeugmaschine
JPH0745489A (ja) * 1993-08-02 1995-02-14 Hitachi Ltd 半導体製造システム及びネットワークアダプタ
US5526293A (en) 1993-12-17 1996-06-11 Texas Instruments Inc. System and method for controlling semiconductor wafer processing
US5563798A (en) 1994-04-05 1996-10-08 Applied Materials, Inc. Wafer positioning system
JPH08203867A (ja) * 1995-01-23 1996-08-09 Hitachi Ltd ワークの処理方法および処理装置
DE19616827C1 (de) * 1996-04-26 1998-01-08 Siemens Ag Verfahren und Applikationseinrichtung zur Anzeige und Alarmierung von Meßwerten an Kommunikationsendgeräten
US5726912A (en) * 1996-09-06 1998-03-10 Honeywell Iac Control system monitor
US5859964A (en) 1996-10-25 1999-01-12 Advanced Micro Devices, Inc. System and method for performing real time data acquisition, process modeling and fault detection of wafer fabrication processes
JPH10141870A (ja) * 1996-11-05 1998-05-29 Kokusai Electric Co Ltd 処理炉の温度監視装置
US5847529A (en) 1997-04-18 1998-12-08 Taiwan Semiconductor Manufacturing Co. Ltd. Robot protection system
AU9501998A (en) 1997-09-23 1999-04-12 On-Line Technologies, Inc. Method and apparatus for fault detection and control
US6263255B1 (en) * 1998-05-18 2001-07-17 Advanced Micro Devices, Inc. Advanced process control for semiconductor manufacturing
US6195621B1 (en) * 1999-02-09 2001-02-27 Roger L. Bottomfield Non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components

Similar Documents

Publication Publication Date Title
BE2017C009I2 (enExample)
BE2016C018I2 (enExample)
BE2013C060I2 (enExample)
BE2012C026I2 (enExample)
BE2010C009I2 (enExample)
BE2010C008I2 (enExample)
BE2010C018I2 (enExample)
BRPI0113420B8 (enExample)
BE2011C041I2 (enExample)
BRPI0110940B8 (enExample)
JP2002090655A5 (enExample)
CN300955183S (zh) 连接件
BRPI0000763B8 (enExample)
CL2006000179A1 (enExample)
CN3135640S (enExample)
AU2000274567A8 (enExample)
AU2000278679A8 (enExample)
AU2000280296A8 (enExample)
AU2000280319A8 (enExample)
AU2001273056A2 (enExample)
CN3139852S (enExample)
AU2000264849A8 (enExample)
BY6855C1 (enExample)
BY7030C1 (enExample)
AU2000256023A8 (enExample)