JP2003273359A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003273359A5 JP2003273359A5 JP2002072032A JP2002072032A JP2003273359A5 JP 2003273359 A5 JP2003273359 A5 JP 2003273359A5 JP 2002072032 A JP2002072032 A JP 2002072032A JP 2002072032 A JP2002072032 A JP 2002072032A JP 2003273359 A5 JP2003273359 A5 JP 2003273359A5
- Authority
- JP
- Japan
- Prior art keywords
- conductivity type
- layer
- base layer
- type base
- barrier layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 claims 13
- 239000004065 semiconductor Substances 0.000 claims 8
- 230000015556 catabolic process Effects 0.000 claims 5
- 230000002093 peripheral effect Effects 0.000 claims 3
- 239000012535 impurity Substances 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002072032A JP3973934B2 (ja) | 2002-03-15 | 2002-03-15 | 高耐圧半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002072032A JP3973934B2 (ja) | 2002-03-15 | 2002-03-15 | 高耐圧半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003273359A JP2003273359A (ja) | 2003-09-26 |
| JP2003273359A5 true JP2003273359A5 (https=) | 2005-06-30 |
| JP3973934B2 JP3973934B2 (ja) | 2007-09-12 |
Family
ID=29202140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002072032A Expired - Fee Related JP3973934B2 (ja) | 2002-03-15 | 2002-03-15 | 高耐圧半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3973934B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070034941A1 (en) * | 2005-08-15 | 2007-02-15 | International Rectifier Corp. | Deep N diffusion for trench IGBT |
| JP2007266133A (ja) * | 2006-03-27 | 2007-10-11 | Toyota Central Res & Dev Lab Inc | 半導体装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1247293B (it) * | 1990-05-09 | 1994-12-12 | Int Rectifier Corp | Dispositivo transistore di potenza presentante una regione ultra-profonda, a maggior concentrazione |
| JPH0529628A (ja) * | 1991-07-19 | 1993-02-05 | Fuji Electric Co Ltd | 絶縁ゲート型バイポーラトランジスタ |
| JP3288218B2 (ja) * | 1995-03-14 | 2002-06-04 | 三菱電機株式会社 | 絶縁ゲート型半導体装置およびその製造方法 |
| JP3872827B2 (ja) * | 1995-04-11 | 2007-01-24 | 株式会社東芝 | 高耐圧半導体素子 |
| JP3738127B2 (ja) * | 1998-02-26 | 2006-01-25 | 新電元工業株式会社 | 高耐圧半導体デバイス |
| JP2002016252A (ja) * | 2000-06-27 | 2002-01-18 | Toshiba Corp | 絶縁ゲート型半導体素子 |
| JP2003174164A (ja) * | 2001-12-07 | 2003-06-20 | Shindengen Electric Mfg Co Ltd | 縦型mos半導体装置及びその製造方法 |
-
2002
- 2002-03-15 JP JP2002072032A patent/JP3973934B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6825565B2 (en) | Semiconductor device | |
| JP3751463B2 (ja) | 高耐圧半導体素子 | |
| JP5048273B2 (ja) | 絶縁ゲート型半導体装置 | |
| JP5376365B2 (ja) | 半導体装置 | |
| JP6561611B2 (ja) | 半導体装置 | |
| JP2006524432A5 (https=) | ||
| WO2013161753A1 (ja) | 半導体装置および半導体装置の製造方法 | |
| JP2019009308A5 (https=) | ||
| JP2020136472A (ja) | 半導体装置 | |
| JP2003174169A (ja) | 半導体装置 | |
| KR20160016518A (ko) | 반도체 장치 | |
| JP5694285B2 (ja) | 半導体装置 | |
| JP2020088155A5 (https=) | ||
| JP2022139077A5 (https=) | ||
| CN113614883B (zh) | 半导体装置 | |
| US10892359B2 (en) | Semiconductor device | |
| JP2003273359A5 (https=) | ||
| JP4264316B2 (ja) | 半導体装置とその製造方法 | |
| JP2002343967A (ja) | 半導体装置 | |
| JPWO2023189754A5 (https=) | ||
| JP2008016562A (ja) | 半導体装置 | |
| JP2024022285A5 (https=) | ||
| JP2022139078A5 (https=) | ||
| JP7201004B2 (ja) | 半導体装置 | |
| JP2016225644A (ja) | 半導体装置 |