JP2003266400A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003266400A5 JP2003266400A5 JP2002363162A JP2002363162A JP2003266400A5 JP 2003266400 A5 JP2003266400 A5 JP 2003266400A5 JP 2002363162 A JP2002363162 A JP 2002363162A JP 2002363162 A JP2002363162 A JP 2002363162A JP 2003266400 A5 JP2003266400 A5 JP 2003266400A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- aluminum
- silicon oxide
- oxide structure
- structure according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- 239000011148 porous material Substances 0.000 description 5
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052710 silicon Chemical group 0.000 description 3
- 239000010703 silicon Chemical group 0.000 description 3
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002363162A JP2003266400A (ja) | 2002-12-13 | 2002-12-13 | シリコン酸化物ナノ構造体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002363162A JP2003266400A (ja) | 2002-12-13 | 2002-12-13 | シリコン酸化物ナノ構造体の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002073113 Division | 2002-03-15 | 2002-03-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003266400A JP2003266400A (ja) | 2003-09-24 |
| JP2003266400A5 true JP2003266400A5 (enExample) | 2006-12-28 |
Family
ID=29208286
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002363162A Withdrawn JP2003266400A (ja) | 2002-12-13 | 2002-12-13 | シリコン酸化物ナノ構造体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003266400A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4865200B2 (ja) * | 2003-08-07 | 2012-02-01 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
| US7524370B1 (en) | 2004-11-26 | 2009-04-28 | Fujikura Ltd. | Nanostructure and manufacturing method for same |
| JP4971612B2 (ja) * | 2005-03-25 | 2012-07-11 | キヤノン株式会社 | 構造体、その製造方法、及び該構造体を用いたデバイス |
| KR101410826B1 (ko) * | 2012-07-03 | 2014-06-23 | 한국전기연구원 | 나노구조와 미세구조가 혼재하는 초발수 표면 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2684201B2 (ja) * | 1987-11-26 | 1997-12-03 | 日立マクセル株式会社 | 磁気記録媒体 |
| JP3135110B2 (ja) * | 1995-11-29 | 2001-02-13 | 工業技術院長 | 多孔質セラミックス膜とその製造方法 |
| JP2000327491A (ja) * | 1999-05-11 | 2000-11-28 | Hitachi Maxell Ltd | 無機化合物薄膜、磁気記録媒体および磁気記録装置 |
| JP3387897B2 (ja) * | 1999-08-30 | 2003-03-17 | キヤノン株式会社 | 構造体の製造方法、並びに該製造方法により製造される構造体及び該構造体を用いた構造体デバイス |
| WO2001071394A1 (fr) * | 2000-03-21 | 2001-09-27 | Asahi Glass Company, Limited | Article antireflet et procédé de production |
-
2002
- 2002-12-13 JP JP2002363162A patent/JP2003266400A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1715085A3 (en) | Method for producing anodized structure | |
| EP1580305A3 (en) | Fine structural body surface and method of producing the same | |
| EP1643546A3 (en) | Method for manufacturing a nanostructure | |
| Yu et al. | Terminated nanotubes: Evidence against the dissolution equilibrium theory | |
| Tsuchiya et al. | Self-organized porous and tubular oxide layers on TiAl alloys | |
| WO2008014977A3 (en) | A method of manufacturing a self-ordered porous structure of aluminium oxide, a nanoporous article and a nano object | |
| JP2005538921A5 (enExample) | ||
| AU5632301A (en) | Stamping tool, method for structuring a surface of a workpiece and use of an anodized surface layer | |
| JP2011251869A5 (enExample) | ||
| JP2003512992A (ja) | ナノメートル寸法の粒子を組み込んだメソ構造物質 | |
| JP2003535027A5 (ja) | 歯科補綴物及びその製造方法 | |
| EP1696053A4 (en) | METHOD FOR MANUFACTURING NANORESEAL ELECTRODES AND PHOTOELECTRIC CONVERTER USING SUCH ELECTRODES | |
| BRPI0412509A (pt) | processo para a preparação de pós de metal, liga e composto | |
| CN1325698C (zh) | 有序多孔阳极氧化铝模板的制备方法 | |
| CN103539173A (zh) | 一种高热稳定有序介孔氧化铝材料及其制备方法 | |
| JP2003266400A5 (enExample) | ||
| CN101831682A (zh) | 非对称二次阳极氧化制备高度有序氧化铝模板的方法 | |
| EP2862627A3 (en) | Activated EU-2 zeolite and use thereof in hydroisomerization processes | |
| Chang et al. | Hydrothermal synthesis of aluminum oxy-hydroxide nanorod and nanotube arrays | |
| EP1642745A3 (en) | Aluminum support for planographic printing plate, its manufacturing process, and planographic printing plate material | |
| JP2009019269A (ja) | マグネシウム合金部材およびその製造方法ならびに輸送機器 | |
| JP2006291278A (ja) | 耐食性に優れたマグネシウム金属材料及びその製造法 | |
| JP2002539098A5 (enExample) | ||
| Lv et al. | The technical support of nanoart: anodization process | |
| CN202413626U (zh) | 铝合金迎宾踏板 |